公开(公告)号：US20070062167A1

公开(公告)日：2007-03-22

申请号：US11519681

申请日：2006-09-12

Applicant: W. Olander ,  Joseph Sweeney ,  Luping Wang

Inventor： W. Olander ,  Joseph Sweeney ,  Luping Wang

IPC: B01D50/00

CPC classification number: C23C14/48 ,  B01D53/74 ,  C23C14/564 ,  Y10S438/905 ,  Y10S438/909

Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

Abstract translation: 一种半导体制造工艺设备，其中需要使用其中的排气用于其操作，这种设施包括洁净室和灰色房间部件，洁净室在其中具有至少一个半导体制造工具，并且其中排气流过干净的区域 房间。 该设施包括排气处理设备，其布置成（i）在其流过所述洁净室的所述区域之后接收排气，（ii）产生经处理的排气，以及（iii）将经处理的排气再循环到环境空气环境 在设施中，例如，到设施的灰色房间。

公开(公告)号：US07105037B2

公开(公告)日：2006-09-12

申请号：US10672051

申请日：2003-09-26

Applicant: W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

Inventor： W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

IPC: F24F3/16

CPC classification number: C23C14/48 ,  B01D53/74 ,  C23C14/564 ,  Y10S438/905 ,  Y10S438/909

Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

公开(公告)号：US20060174944A1

公开(公告)日：2006-08-10

申请号：US11360732

申请日：2006-02-23

Applicant: W. Olander ,  Matthew Donatucci ,  Luping Wang ,  Michael Wodjenski

Inventor： W. Olander ,  Matthew Donatucci ,  Luping Wang ,  Michael Wodjenski

IPC: F16K3/36

CPC classification number: F17C13/04 ,  F17C5/00 ,  F17C2201/0109 ,  F17C2201/0119 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2205/0111 ,  F17C2205/0176 ,  F17C2205/0326 ,  F17C2205/0332 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0391 ,  F17C2205/0394 ,  F17C2221/012 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/037 ,  F17C2221/05 ,  F17C2223/0123 ,  F17C2223/036 ,  F17C2225/0123 ,  F17C2225/033 ,  F17C2225/035 ,  F17C2225/038 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2250/032 ,  F17C2250/043 ,  F17C2260/036 ,  F17C2260/044 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0324 ,  Y10T137/0419 ,  Y10T137/2569 ,  Y10T137/4259 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/7762 ,  Y10T137/7793 ,  Y10T137/8158 ,  Y10T137/87249

Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.

公开(公告)号：US06857447B2

公开(公告)日：2005-02-22

申请号：US10166242

申请日：2002-06-10

Applicant: W. Karl Olander ,  Matthew B. Donatucci ,  Luping Wang ,  Michael J. Wodjenski

Inventor： W. Karl Olander ,  Matthew B. Donatucci ,  Luping Wang ,  Michael J. Wodjenski

IPC: F17C7/00 ,  F17C5/00 ,  B08B9/027 ,  B08B5/00 ,  G05B11/01 ,  G06F15/00

CPC classification number: F17C13/04 ,  F17C5/00 ,  F17C2201/0109 ,  F17C2201/0119 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2205/0111 ,  F17C2205/0176 ,  F17C2205/0326 ,  F17C2205/0332 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0391 ,  F17C2205/0394 ,  F17C2221/012 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/037 ,  F17C2221/05 ,  F17C2223/0123 ,  F17C2223/036 ,  F17C2225/0123 ,  F17C2225/033 ,  F17C2225/035 ,  F17C2225/038 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2250/032 ,  F17C2250/043 ,  F17C2260/036 ,  F17C2260/044 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0324 ,  Y10T137/0419 ,  Y10T137/2569 ,  Y10T137/4259 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/7762 ,  Y10T137/7793 ,  Y10T137/8158 ,  Y10T137/87249

Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.

Abstract translation: 使用与气体歧管以选择性流动关系耦合的气体源分配气体的装置和方法。 气体歧管包括用于将气体排放到气体使用区域的流动回路，并且气体源包括在超大气压下容纳气体的压力调节气体源容器。 压力调节的气体源容器可以布置有在容器内或容器内的压力调节器，以及与容器流动关系的流量控制阀，使得从容器分配的气体在流过流量控制器之前流过调节器 阀，并进入气体歧管。 该装置和方法允许提高半导体工艺中使用的有毒或其他有害气体的储存和分配的安全性。

公开(公告)号：US06660063B2

公开(公告)日：2003-12-09

申请号：US10147145

申请日：2002-05-16

Applicant: Glenn M. Tom ,  James V. McManus ,  Luping Wang ,  W. Karl Olander

Inventor： Glenn M. Tom ,  James V. McManus ,  Luping Wang ,  W. Karl Olander

IPC: B01D5304

CPC classification number: B01D53/0415 ,  B01D53/0407 ,  B01D53/053 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/202 ,  B01D2258/0216 ,  B01D2259/40003 ,  B01D2259/4009 ,  B01D2259/40094 ,  B01D2259/40098 ,  B01D2259/4525 ,  B01D2259/455 ,  B01J20/20 ,  F17C7/00 ,  F17C11/00 ,  F17C13/04 ,  F17C13/045 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/058 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2227/044 ,  F17C2250/043 ,  F17C2270/0518 ,  F17D1/04

Abstract: A capacity increase and/or pressure decrease of gas in a gas storage and dispensing vessel is achieved by use of a physical adsorbent having sorptive affinity for the gas. Such approach enables conventional high pressure gas cylinders to be redeployed with contained sorbent, to achieve substantial enhancement of safety and capacity.

Abstract translation: 通过使用对气体具有吸附亲和力的物理吸附剂来实现气体储存和分配容器中的气体的容量增加和/或压力降低。 这种方法使传统的高压气瓶能够与所含的吸附剂重新部署，以实现安全性和容量的显着增强。

公开(公告)号：US06453924B1

公开(公告)日：2002-09-24

申请号：US09624478

申请日：2000-07-24

Applicant: Luping Wang ,  Terry A. Tabler ,  James A. Dietz

Inventor： Luping Wang ,  Terry A. Tabler ,  James A. Dietz

IPC: F17C1100

CPC classification number: F17D1/04 ,  F17C11/00 ,  F17C13/04 ,  F17C2205/0146 ,  F17C2205/0323 ,  F17C2205/0338 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2250/032 ,  F17C2250/0626 ,  F17C2250/0636 ,  F17C2265/01 ,  F17C2270/0518 ,  Y10T137/0318 ,  Y10T137/4807 ,  Y10T137/6416 ,  Y10T137/86187

Abstract: A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.

Abstract translation: 一种用于向诸如半导体制造工厂之类的处理设备供应气体的流体分配系统。 该系统包括通过流动回路耦合到局部吸附剂的供应容器的主要流体供应容器，从该液体供应容器将诸如低压压缩气体的流体从其分配到诸如半导体制造工具的流体消耗单元。 流体压力调节器设置在流动回路或主液体供应容器中，并且确保流到流体消耗单元的气体处于期望的压力。 该系统和相关方法特别适用于供应和利用液化压缩气体如三甲基硅烷，胂，膦和二氯硅烷。

公开(公告)号：US6101816A

公开(公告)日：2000-08-15

申请号：US67393

申请日：1998-04-28

Applicant: Luping Wang ,  Glenn M. Tom

Inventor： Luping Wang ,  Glenn M. Tom

IPC: C23C14/24 ,  C23C16/448 ,  F17C1/00 ,  F17C7/00 ,  F17C7/02 ,  F17C7/04 ,  F17C9/02 ,  F17C11/00 ,  F17C13/00 ,  F17C13/02 ,  F17C13/04 ,  H01L21/205 ,  H01L21/265 ,  H01L21/306

CPC classification number: F17C7/02 ,  B01D53/0407 ,  B01D53/0415 ,  B01D53/053 ,  B01J20/20 ,  F17C1/00 ,  F17C11/00 ,  F17C11/005 ,  F17C13/02 ,  F17C13/025 ,  F17C13/04 ,  F17C13/045 ,  F17C7/00 ,  F17D1/04 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/202 ,  B01D2258/0216 ,  B01D2259/40003 ,  B01D2259/4009 ,  B01D2259/40094 ,  B01D2259/40098 ,  B01D2259/4525 ,  B01D2259/455 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/058 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2250/043 ,  F17C2270/0518 ,  Y02E60/321

Abstract: A fluid storage and dispensing system comprising a vessel for holding a fluid at a desired pressure. The vessel has a pressure regulator associated with a port of the vessel, and set at a predetermined pressure. A dispensing assembly, e.g, including a flow control means such as a valve, is arranged in gas/vapor flow communication with the regulator, whereby the opening of the valve effects dispensing of gas/vapor from the vessel. The fluid in the vessel may be constituted by a liquid which is confined in the vessel at a pressure in excess of its liquefaction pressure at prevailing temperature conditions, e.g., ambient (room) temperature. A phase separator such as a gas/vapor-permeable liquid-impermeable membrane, may be associated with the regulator, as a barrier to flow of liquid into the regulator, when the contained fluid in the vessel is in a liquid state.

Abstract translation: 一种流体存储和分配系统，包括用于将流体保持在期望压力的容器。 容器具有与容器的端口相关联的压力调节器，并且设定在预定压力。 例如包括诸如阀门的流量控制装置的分配组件布置成与调节器气体/蒸气流连通，由此阀的开口实现从容器分配气体/蒸气。 容器中的流体可以由在主要温度条件例如环境（室内）温度下以超过其液化压力的压力限制在容器中的液体构成。 当容器中的所含流体处于液体状态时，诸如气体/蒸气可透过液体不可渗透膜的相分离器可与调节器相关联，作为液体流入调节器的屏障。

公开(公告)号：US6089027A

公开(公告)日：2000-07-18

申请号：US300994

申请日：1999-04-28

Applicant: Luping Wang ,  Glenn M. Tom

Inventor： Luping Wang ,  Glenn M. Tom

IPC: C23C14/24 ,  C23C16/448 ,  F17C1/00 ,  F17C7/00 ,  F17C7/02 ,  F17C7/04 ,  F17C9/02 ,  F17C11/00 ,  F17C13/00 ,  F17C13/02 ,  F17C13/04 ,  H01L21/205 ,  H01L21/265 ,  H01L21/306

CPC classification number: F17C7/02 ,  B01D53/0407 ,  B01D53/0415 ,  B01D53/053 ,  B01J20/20 ,  F17C1/00 ,  F17C11/00 ,  F17C11/005 ,  F17C13/02 ,  F17C13/025 ,  F17C13/04 ,  F17C13/045 ,  F17C7/00 ,  F17D1/04 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/202 ,  B01D2258/0216 ,  B01D2259/40003 ,  B01D2259/4009 ,  B01D2259/40094 ,  B01D2259/40098 ,  B01D2259/4525 ,  B01D2259/455 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/058 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2250/043 ,  F17C2270/0518 ,  Y02E60/321

Abstract: A fluid storage and dispensing system comprising a vessel for holding a fluid at a desired pressure. The vessel has a pressure regulator, e.g., a single-stage or multi-stage regulator, associated with a port of the vessel, and set at a predetermined pressure. A dispensing assembly, e.g., including a flow control means such as a valve, is arranged in gas/vapor flow communication with the regulator, whereby the opening of the valve effects dispensing of gas/vapor from the vessel. The fluid in the vessel may be constituted by a liquid that is confined in the vessel at a pressure in excess of its liquefaction pressure at prevailing temperature conditions, e.g., ambient (room) temperature. In another aspect, the vessel contains a solid-phase sorbent material having sorbable gas adsorbed thereon, at a pressure in excess of 50 psig. The vessel may have a >1 inch NGT threaded neck opening, to accommodate the installation of an interior regulator.

Abstract translation: 一种流体存储和分配系统，包括用于将流体保持在期望压力的容器。 容器具有压力调节器，例如与容器的端口相关联并设定在预定压力下的单级或多级调节器。 例如，包括诸如阀的流量控制装置的分配组件布置成与调节器气体/蒸汽流连通，由此阀的打开实现了从容器分配气体/蒸气。 容器中的流体可以由在主要温度条件例如环境（室内）温度下在超过其液化压力的压力下限制在容器中的液体构成。 在另一方面，容器含有在其上吸附有可吸收气体的固态吸附剂材料，压力超过50psig。 该容器可具有> 1英寸NGT螺纹颈部开口，以适应内部调节器的安装。

公开(公告)号：US08562937B2

公开(公告)日：2013-10-22

申请号：US12158318

申请日：2006-12-19

Applicant: J. Donald Carruthers ,  Xueping Xu ,  Luping Wang

Inventor： J. Donald Carruthers ,  Xueping Xu ,  Luping Wang

IPC: D01F9/127 ,  D01F9/12

CPC classification number: B01J20/205 ,  B01J20/20 ,  B01J21/185 ,  B01J23/74 ,  B01J23/881 ,  B01J23/882 ,  B01J23/883 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  C01B2202/02 ,  C01B2202/08 ,  C01B2202/36 ,  Y02P20/582

Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.

Abstract translation: 一种用于制造碳纳米管的方法和装置，其中将基底与含有催化有效金属的含烃原料接触以将原料沉积在基底上，随后氧化沉积的原料以从基底中除去含碳和碳质的组分， 同时在其上保留催化有效的金属，并且将具有保留的催化有效金属的基材与碳源材料接触以在基材上生长碳纳米管。 可以用石油原料如炼油大气塔渣进行制造，以低成本大量生产碳纳米管。 还公开了一种复合材料，其包括在其孔中具有单壁碳纳米管的多孔材料。

公开(公告)号：US20110048063A1

公开(公告)日：2011-03-03

申请号：US12666208

申请日：2008-06-22

Applicant: J. Donald Carruthers ,  Karl Boggs ,  Luping Wang ,  Shaun Wilson ,  Jose I. Arno ,  Paul J. Marganski ,  Steven M. Bilodeau ,  Peng Zou ,  Brian Bobita ,  Joseph D. Sweeney ,  Douglas Edwards

Inventor： J. Donald Carruthers ,  Karl Boggs ,  Luping Wang ,  Shaun Wilson ,  Jose I. Arno ,  Paul J. Marganski ,  Steven M. Bilodeau ,  Peng Zou ,  Brian Bobita ,  Joseph D. Sweeney ,  Douglas Edwards

IPC: F25B15/00 ,  B01J20/00 ,  C09K5/00 ,  C01B31/08 ,  B01J20/26

CPC classification number: B01J20/26 ,  B01J20/20 ,  B01J20/28054 ,  B01J20/28092 ,  B01J20/30 ,  B01J20/305 ,  B01J20/3078 ,  B01J2220/445 ,  C09K5/047 ,  F25B17/08 ,  F25B27/007 ,  F25B35/04 ,  F25B37/00 ,  F25B2500/01

Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material is provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.

Abstract translation: 描述了吸附结构，其包括由吸附剂材料形成的至少一个吸附构件和与吸附构件的一部分接触设置的至少一个多孔构件，以允许气体进入和离开吸附构件的该部分。 这种吸附结构在吸附剂型制冷系统中有用。 描述了一种用于生产吸附材料的方法，其中提供具有第一密度的第一聚合物材料，并且提供具有第二密度的第二聚合物材料，其中第二聚合物材料与第一聚合物材料接触， 形成一个结构。 该结构被热解以形成多孔吸附材料，其包括对应于第一聚合物材料的第一区域和对应于第二聚合物材料的第二区域，其中孔径和孔分布中的至少一个在第一区域和第 第二个地区。