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公开(公告)号：US20060146304A1
公开(公告)日：2006-07-06
申请号：US11294860
申请日：2005-12-05
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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22.发明申请Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle 失效光刻设备，器件制造方法，掩模和表征掩模和/或防护薄膜的方法公开(公告)号：US20050140949A1
公开(公告)日：2005-06-30
申请号：US10835287
申请日：2004-04-30
申请人： Johannes Jasper , Marcel Baggen , Richard Bruls , Orlando Cicilia , Hendrikus Alphonsus Van Dijck , Gerardus Carolus Hofmans , Albert Johannes Jansen , Carlo Cornelis Luijten , Willem Pongers , Martijn Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Demarteau
发明人： Johannes Jasper , Marcel Baggen , Richard Bruls , Orlando Cicilia , Hendrikus Alphonsus Van Dijck , Gerardus Carolus Hofmans , Albert Johannes Jansen , Carlo Cornelis Luijten , Willem Pongers , Martijn Dominique Wehrens , Tammo Uitterdijk , Herman Boom , Marcel Johannes Louis Demarteau
CPC分类号： G03F7/70258 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70308 , G03F7/70983
摘要： A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
摘要翻译： 允许厚的防护薄膜具有非平坦形状，并且其形状的特征在于计算在曝光中应用的校正以补偿防护薄膜的光学效果。 防护薄膜组件可以在重力的影响下被安装成采用一维形状以使补偿更容易。
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公开(公告)号：US20110159441A1
公开(公告)日：2011-06-30
申请号：US13044325
申请日：2011-03-09
CPC分类号： G03F7/70341
摘要： A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
摘要翻译： 公开了一种浸没式光刻设备，其中一个或多个液体转向器位于由液体限制结构包围的空间中。 液体转向器的功能是妨碍形成一个或多个浸没液体的再循环区域，这可能导致浸没液体在空间中的折射率变化，从而造成误差。
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公开(公告)号：US07508489B2
公开(公告)日：2009-03-24
申请号：US11294860
申请日：2005-12-05
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane; disposing a substrate carrying a resist in a region of the image plane and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在物平面的区域中; 在所述图像平面的区域中配置携带抗蚀剂的基板，并使用所述投影曝光系统以调整的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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25.发明授权Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle 失效光刻设备，器件制造方法，掩模和表征掩模和/或防护薄膜的方法公开(公告)号：US07379154B2
公开(公告)日：2008-05-27
申请号：US10835287
申请日：2004-04-30
申请人： Richard Joseph Bruls , Orlando Serapio Cicilia , Hendrikus Alphonsus Ludovicus Van Dijck , Gerardus Carolus Johannus Hofmans , Tammo Uitterdijk
发明人： Richard Joseph Bruls , Orlando Serapio Cicilia , Hendrikus Alphonsus Ludovicus Van Dijck , Gerardus Carolus Johannus Hofmans , Tammo Uitterdijk
CPC分类号： G03F7/70258 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70308 , G03F7/70983
摘要： A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
摘要翻译： 允许厚的防护薄膜具有非平坦形状，并且其形状的特征在于计算在曝光中应用的校正以补偿防护薄膜的光学效果。 防护薄膜组件可以在重力的影响下被安装成采用一维形状以使补偿更容易。
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公开(公告)号：US20070211233A1
公开(公告)日：2007-09-13
申请号：US11373493
申请日：2006-03-13
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： Lithographic Apparatus, Control System and Device Manufacturing Method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译： 光刻设备，控制系统和设备制造方法公开了一种浸没式光刻设备，其具有测量系统或预测系统，用于分别测量和/或预测与浸液的温度波动相关的影响，以及用于 基于由测量系统和/或预测系统获得的测量和/或预测，分别控制与浸液的温度相关联的或另一效应。 还公开了一种相关的控制系统和设备制造方法。
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公开(公告)号：US08675173B2
公开(公告)日：2014-03-18
申请号：US13044325
申请日：2011-03-09
CPC分类号： G03F7/70341
摘要： A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
摘要翻译： 公开了一种浸没式光刻设备，其中一个或多个液体转向器位于由液体限制结构包围的空间中。 液体转向器的功能是妨碍形成一个或多个浸没液体的再循环区域，这可能导致浸没液体在空间中的折射率变化，从而造成误差。
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公开(公告)号：US08542342B2
公开(公告)日：2013-09-24
申请号：US12408577
申请日：2009-03-20
CPC分类号： G03B27/42 , G03F7/70258
摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.
摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。
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29.发明授权公开(公告)号：US07580113B2
公开(公告)日：2009-08-25
申请号：US11473323
申请日：2006-06-23
申请人： Wim Tjibbo Tel , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Tammo Uitterdijk , Johannes Wilhelmus De Klerk
发明人： Wim Tjibbo Tel , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Tammo Uitterdijk , Johannes Wilhelmus De Klerk
CPC分类号： G03B27/72 , G03B27/53 , G03F7/70125 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for exposure. Wave front aberrations of a projection system of a lithographic apparatus are measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on a spatial distribution of radiant intensity in a pupil of the projection system as present during exposing the radiation sensitive layer, and is limited to aberrations in projection lens pupil areas of relative high radiant flux.
摘要翻译： 提供了一种降低波前像差的方法，用于光刻处理，由此减少是基于所选择的要打印的图案和用于曝光的所选择的照明模式。 通过计算投影系统的光学元件的调整并将计算的调整应用于投影系统来测量和减少光刻设备的投影系统的波前像差。 调整的计算基于在曝光辐射敏感层期间在投影系统的光瞳中的辐射强度的空间分布的信息，并且限于相对高辐射通量的投影透镜瞳孔区域中的像差。
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公开(公告)号：US20080259296A1
公开(公告)日：2008-10-23
申请号：US12213543
申请日：2008-06-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70958
摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
摘要翻译： 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。
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