摘要:
A method for producing a solid electrolyte material region for a memory element of a solid electrolyte memory cell. A first material is formed in substantially pure form. A thermal treatment is carried out in the presence of at least one second material, and the chalcogenide material of the solid electrolyte material region thereby being produced.
摘要:
A switching element for reversible switching between an electrically insulating OFF state and an electrically conductive ON state, having two electrodes, namely a reactive electrode and an inert electrode, and also a solid electrolyte arranged between the two electrodes, which is characterized by the fact that the electrical conductivity of the solid electrolyte increases as the temperature thereof rises, but essentially no longer increases below a critical decomposition temperature of the solid electrolyte.
摘要:
A semiconductor memory device suitable for use in a memory cell array includes a solid electrolyte memory cell including: a first electrode device, a second electrode device, and a solid electrolyte material region between the first and second electrode devices. The solid electrolyte material region is materially cohesive, and the second electrode device is materially cohesive.
摘要:
A nonvolatile, resistively switching memory cell includes a layer arranged between a first electrode and a second electrode. The layer includes one or more chalcogenide compound(s) selected from the group consisting of CuInS, CuInSe, CdInS, CdInSe, ZnInS, MnInS, MnZnInS, ZnInSe, InS, InSSe and InSe, with alkali metal or alkaline-earth metal ions contained in the layer of the chalcogenide compound(s).
摘要:
A chalcogenide layer includes a composition of compounds having the formula MmX1-m, where M denotes one or more elements selected from the group consisting of group IVb elements of the periodic system, group Vb elements of the periodic system and transition metals, X denotes one or more elements selected from the group consisting of S, Se and Te, and m has a value of between 0 and 1. The chalcogenide layer further includes an oxygen or nitrogen content in the range from 0.001 atomic % to 75 atomic %.
摘要翻译:硫族化物层包括具有式M 1 X 1-m的化合物的组合物,其中M表示一种或多种选自下组的IVb族元素: 周期性系统,Vb族元素和过渡金属,X表示选自S,Se和Te中的一种或多种元素,m具有0和1之间的值。硫族化物层还包括氧 或氮含量在0.001原子%至75原子%的范围内。
摘要:
A method for producing a solid electrolyte material region for a memory element of a solid electrolyte memory cell. A first material is formed in substantially pure form. A thermal treatment is carried out in the presence of at least one second material, and the chalcogenide material of the solid electrolyte material region thereby being produced.
摘要:
The present invention relates to a switching element for reversible switching between an electrically insulating OFF state and an electrically conductive ON state, having two electrodes, namely a reactive electrode and an inert electrode, and also a solid electrolyte arranged between the two electrodes, which is characterized by the fact that the electrical conductivity of the solid electrolyte increases as the temperature thereof rises, but essentially no longer increases below a critical decomposition temperature of the solid electrolyte.
摘要:
A method for producing a solid electrolyte material region for a memory element of a solid electrolyte memory cell. A first material is formed in substantially pure form. A thermal treatment is carried out in the presence of at least one second material, and the chalcogenide material of the solid electrolyte material region thereby being produced.
摘要:
A method for producing a solid electrolyte material region for a memory element of a solid electrolyte memory cell. A first material is formed in substantially pure form. A thermal treatment is carried out in the presence of at least one second material, and the chalcogenide material of the solid electrolyte material region thereby being produced.
摘要:
A method for manufacturing an electrolyte material layer with a chalcogenide material incorporated or deposited therein for use in semiconductor memory devices, in particular resistively-switching memory devices or components. The method comprises the steps of producing a semiconductor substrate, depositing a binary chalcogenide layer onto the semiconductor substrate, depositing a sulphur-containing layer onto the binary chalcogenide layer, and creating a ternary chalcogenide layer comprising at least two different chalcogenide compounds ASexSy. One component A of the chalcogenide compounds ASexSy comprises materials of the IV elements main group, e.g., Ge, Si, or of a transition metal, preferably of the group consisting of Zn, Cd, Hg, or a combination thereof.