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公开(公告)号:US5985357A
公开(公告)日:1999-11-16
申请号:US013113
申请日:1998-01-26
申请人: Masakazu Sanada
发明人: Masakazu Sanada
CPC分类号: G03F7/162 , B05C11/08 , G03F7/3021
摘要: A method of supplying a treating solution based on a prestored processing program with a plurality of instructions including a supply start instruction and a supply stop instruction for performing a series of processes. The method includes the steps of executing the supply start instruction to supply the treating solution to a central region of a substrate, executing the supply stop instruction to stop supplying the treating solution when the treating solution has been supplied in a fixed quantity/and executing subsequent instructions in the processing program in response to an actual stoppage in delivering the treating solution following execution of the supply stop instruction.
摘要翻译: 一种基于预先存储的处理程序提供处理液的方法,该处理程序具有包括用于执行一系列处理的供应开始指令和供给停止指令的多个指令。 该方法包括以下步骤:执行供给开始指令以将处理溶液供给到基板的中心区域,执行供给停止指令,以在已经以固定量供给处理液并且执行后续处理时停止供给处理液 响应于在执行供应停止指令之后递送处理解决方案中的实际停止,处理程序中的指令。
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公开(公告)号:US5976620A
公开(公告)日:1999-11-02
申请号:US969273
申请日:1997-11-13
申请人: Masakazu Sanada , Minobu Matsunaga
发明人: Masakazu Sanada , Minobu Matsunaga
摘要: A method of applying a coating solution for forming a coating film of desired thickness. The coating solution begins to be supplied to a region centrally of a substrate. The spinning substrate is accelerated from a supplying rotational frequency to a higher, target rotational frequency before the coating solution is spread by the supplying rotational frequency to cover an entire surface of the substrate. Then, the supply of the coating solution is stopped. Subsequently, the substrate is spun with a film-forming rotational frequency lower than the target rotational frequency to form the coating film. The substrate is spun at high speed with the target rotational frequency for a variable period of time to adjust thickness of the coating film.
摘要翻译: 一种施加用于形成所需厚度的涂膜的涂布溶液的方法。 涂层溶液开始被提供到基底中央的区域。 在涂布溶液通过供给旋转频率扩展以覆盖基板的整个表面之前,将纺丝基材从供给旋转频率加速到较高的目标旋转频率。 然后,停止供给涂布溶液。 随后,以低于目标旋转频率的成膜旋转频率旋转基板以形成涂膜。 以目标旋转频率高速旋转基板一段可变的时间以调节涂膜的厚度。
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公开(公告)号:US08893647B2
公开(公告)日:2014-11-25
申请号:US13531206
申请日:2012-06-22
IPC分类号: B05C3/00 , B05C5/02 , B05B3/00 , B05C13/02 , B05C17/005
CPC分类号: B05C5/0212 , B05C17/00516
摘要: A tip section of a discharge nozzle 31 is shaped like a wedge, and projections 310 which further protrude are formed at the tip of the wedge. Lower surfaces 310b of the projections 310 define a substrate-facing-surface which is brought into proximity to the substrate, and discharge outlet bearing surfaces 310c, which gradually retract back from the substrate W, are formed as if to rise from the edges of the lower surfaces 310b. At adjacent positions within the discharge outlet bearing surface 310c which are adjacent to the substrate-facing-surface 310b, discharge outlets 311 for discharging an application liquid are opened. Areas around the discharge outlets 311 and a wall around a fluid feeding path 312 are integrated with each other.
摘要翻译: 排出喷嘴31的尖端部分成形为楔形,并且在楔形物的尖端处形成进一步突出的突出部310。 突出部310的下表面310b限定了与衬底接近的面向衬底的表面,并且从衬底W逐渐缩回的排出出口支承表面310c形成为从 下表面310b。 在排出口承载面310c的与面向基板的表面310b相邻的相邻位置,打开用于排出涂布液的排出口311。 排出口311周围的区域和流体供给路径312周围的壁彼此一体化。
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公开(公告)号:US08734538B2
公开(公告)日:2014-05-27
申请号:US13572297
申请日:2012-08-10
申请人: Kenta Hiramatsu , Masakazu Sanada
发明人: Kenta Hiramatsu , Masakazu Sanada
CPC分类号: H01M4/139 , H01M4/0404 , Y10T29/49108 , Y10T29/49115 , Y10T29/49204
摘要: Preparation process of electrode for battery, comprising first application step for forming first linear part by relatively moving first nozzle which discharges first active material linearly with respect to current collector to form a plural of first linear parts on current collector, first drying step for drying first linear parts, second application step for forming second linear part between first linear parts by relatively moving second nozzle which discharges second active material with respect to current collector, and second drying step for drying first linear part and second linear part, wherein height H1 of first linear part and height H2 of second linear part satisfies the relational inequality (1): H1
摘要翻译: 电池用电极的制造方法,包括:第一施加步骤,通过相对移动的第一喷嘴形成第一线性部,所述第一喷嘴相对于集电体线性排放第一活性物质,以在集电体上形成多个第一直线部,第一干燥步骤, 直线部分,用于通过相对于集流体排出第二活性材料的相对移动的第二喷嘴形成第一直线部分之间的第二直线部分的第二施加步骤,以及用于干燥第一直线部分和第二直线部分的第二干燥步骤,其中第一直线部分的高度H1 第二线性部分的线性部分和高度H2满足关系不等式(1):H1
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公开(公告)号:US20110070479A1
公开(公告)日:2011-03-24
申请号:US12888070
申请日:2010-09-22
CPC分类号: H01M10/0585 , H01M10/0525 , H01M10/0565 , Y02E60/122 , Y02P70/54 , Y10T29/49108 , Y10T29/49115
摘要: A negative-electrode active material layer having an uneven pattern is formed on a surface of a copper foil as a negative-electrode current collector by applying an application liquid by a nozzle-scan coating method. Subsequently, an application liquid containing a polymer electrolyte material is applied by a spin coating method, thereby forming a solid electrolyte layer in conformity with the uneven pattern. Subsequently, an application liquid is applied by a doctor blade method, thereby forming a positive-electrode active material layer whose lower surface conforms to the unevenness and whose upper surface is substantially flat. A thin and high-performance all-solid-state battery can be produced by laminating an aluminum foil as a positive-electrode current collector before the application liquid is cured.
摘要翻译: 通过喷嘴扫描涂布法施加涂布液,在作为负极集电体的铜箔的表面上形成具有凹凸图案的负极活性物质层。 随后,通过旋涂法涂布含有聚合物电解质材料的涂布液,从而形成与不匀图案一致的固体电解质层。 随后,通过刮刀法施加涂布液,从而形成其下表面符合凹凸且其上表面基本平坦的正极活性物质层。 在施加液体固化之前,可以通过层压铝箔作为正极集电体来制造薄而高性能的全固态电池。
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公开(公告)号:US20070267047A1
公开(公告)日:2007-11-22
申请号:US11748654
申请日:2007-05-15
申请人: Shimpei Hori , Masakazu Sanada , Tomohiro Goto
发明人: Shimpei Hori , Masakazu Sanada , Tomohiro Goto
CPC分类号: B08B3/024 , H01L21/67051
摘要: The invention provides a method capable of suppressing liquid splash at the circumferential edge of a substrate, and preventing liquid droplets due to liquid splash from adhering to the substrate again when moving a discharge nozzle for scanning while discharging a cleaning solution from the discharge nozzle to the surface of the substrate to make spin drying of the substrate. When a substrate W is held in a horizontal posture by a spin chuck 10 and rotated about a vertical axis with a rotation motor 14, while discharging the cleaning solution onto the surface of the substrate from an outlet of a de-ionized water discharge nozzle 20, the rotation speed of the substrate is decreased in a process that the outlet of the discharge nozzle is traveled from a position opposed to a center of the substrate to a position opposed to the circumferential edge of the substrate.
摘要翻译: 本发明提供了一种能够抑制在基板的周缘处的液体飞溅的方法,并且当从排出喷嘴排出清洗溶液时,在移动用于扫描的排出喷嘴时,防止液体飞溅时的液滴再次粘附到基板上 使基板的表面进行旋转干燥。 当通过旋转卡盘10将基板W保持在水平姿态并且通过旋转马达14绕垂直轴线旋转时,在从去离子水排出喷嘴20的出口将清洗液排出到基板的表面上的同时, 在排出喷嘴的出口从与基板的中心相对的位置行进到与基板的周缘相对的位置的过程中,基板的旋转速度降低。
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公开(公告)号:US20060088791A1
公开(公告)日:2006-04-27
申请号:US11245347
申请日:2005-10-06
申请人: Masahiko Harumoto , Masakazu Sanada
发明人: Masahiko Harumoto , Masakazu Sanada
IPC分类号: H01L21/027
CPC分类号: G03F7/3021 , H01L21/6715
摘要: A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.
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公开(公告)号:US06656277B2
公开(公告)日:2003-12-02
申请号:US10270885
申请日:2002-10-11
IPC分类号: B05C500
CPC分类号: H01L21/6715 , H01L21/67028
摘要: A developer supply nozzle moves from the side of a first edge of a substrate to the side of a second edge thereof opposite from the first edge to apply a developer across a major surface of the substrate. After a lapse of required development process time, a rinsing solution supply nozzle moves from the side of the first edge of the substrate to the side of the second edge thereof to apply a rinsing solution across the major surface of the substrate. Making the moving speed of the rinsing solution supply nozzle higher than the moving speed of the developer supply nozzle shortens actual developing time at a site (downstream relative to a scanning direction) where a development reaction is apt to accelerate under the influence of fluctuations of the developer caused by dropping of the rinsing solution.
摘要翻译: 显影剂供应喷嘴从基板的第一边缘的侧面移动到与第一边缘相对的第二边缘的侧面,以在显影剂的主表面上施加显影剂。 在经过所需的显影处理时间之后,冲洗溶液供应喷嘴从基板的第一边缘侧向其第二边缘侧移动,以在基板的主表面上施加冲洗溶液。 使冲洗溶液供给喷嘴的移动速度高于显影剂供给喷嘴的移动速度,缩短在显影反应容易加速的位置(扫描方向的下游)的实际显影时间, 显影剂由漂洗溶液的滴落引起。
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公开(公告)号:US06645880B1
公开(公告)日:2003-11-11
申请号:US10335302
申请日:2002-12-31
IPC分类号: H01L2131
CPC分类号: H01L21/6715 , G03F7/162
摘要: A substrate spinning step is executed for spinning a substrate in a plane parallel to a principal plane thereof at a first spinning speed of 100 rpm to 500 rpm. Then, a first applying step is executed for supplying a treating solution to a surface of the substrate by moving a nozzle from a position opposed to an edge of the substrate in a spin toward a position opposed to a spin center of the substrate while delivering the treating solution from the nozzle. Next, a second applying step is executed for supplying the treating solution to the surface of the substrate by stopping the nozzle at the position opposed to the spin center of the substrate in the spin while delivering the treating solution from the nozzle. Finally, a film thickness adjusting step is executed for stopping delivery of the treating solution from the nozzle, and spinning the substrate in the plane parallel to the principal plane thereof at a second spinning speed faster than the first spinning speed.
摘要翻译: 执行基板纺丝步骤,以100rpm至500rpm的第一纺丝速度在平行于其主平面的平面中纺丝基材。 然后,执行第一施加步骤,用于通过使喷嘴从与基板的边缘相反的位置在旋转中向与基板的自旋中心相对的位置移动而将处理溶液供给到基板的表面,同时输送 从喷嘴处理溶液。 接下来,执行第二施加步骤,通过在从喷嘴输送处理溶液的同时将喷嘴停止在与旋转基板的旋转中心相对的位置处,将处理液供给到基板的表面。 最后,进行膜厚调整工序,停止从喷嘴输送处理液,并以与第一纺丝速度相比更快的第二纺丝速度在与主面平行的面内旋转基板。
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公开(公告)号:US08920522B2
公开(公告)日:2014-12-30
申请号:US12888070
申请日:2010-09-22
IPC分类号: H01M10/0585 , H01M10/0525 , H01M10/0565
CPC分类号: H01M10/0585 , H01M10/0525 , H01M10/0565 , Y02E60/122 , Y02P70/54 , Y10T29/49108 , Y10T29/49115
摘要: A negative-electrode active material layer having an uneven pattern is formed on a surface of a copper foil as a negative-electrode current collector by applying an application liquid by a nozzle-scan coating method. Subsequently, an application liquid containing a polymer electrolyte material is applied by a spin coating method, thereby forming a solid electrolyte layer in conformity with the uneven pattern. Subsequently, an application liquid is applied by a doctor blade method, thereby forming a positive-electrode active material layer whose lower surface conforms to the unevenness and whose upper surface is substantially flat. A thin and high-performance all-solid-state battery can be produced by laminating an aluminum foil as a positive-electrode current collector before the application liquid is cured.
摘要翻译: 通过喷嘴扫描涂布法施加涂布液,在作为负极集电体的铜箔的表面上形成具有凹凸图案的负极活性物质层。 随后,通过旋涂法涂布含有聚合物电解质材料的涂布液,从而形成与不匀图案一致的固体电解质层。 随后,通过刮刀法施加涂布液,从而形成其下表面符合凹凸且其上表面基本平坦的正极活性物质层。 在施加液体固化之前,可以通过层压铝箔作为正极集电体来制造薄而高性能的全固态电池。
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