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25 条记录 (耗时 0.038 秒)

    Method of transferring a substrate, transfer system and lithographic projection apparatus
    22.
    发明授权
    Method of transferring a substrate, transfer system and lithographic projection apparatus 有权
    转印基板，转印系统和光刻投影装置的方法

    公开(公告)号：US08064045B2

    公开(公告)日：2011-11-22

    申请号：US12248284

    申请日：2008-10-09

    申请人： Jozef Augustinus Maria Alberti ,  Gerardus Petrus Matthijs Van Nunen ,  Frans Erik Groensmit ,  Rene Theodorus Petrus Compen

    发明人： Jozef Augustinus Maria Alberti ,  Gerardus Petrus Matthijs Van Nunen ,  Frans Erik Groensmit ,  Rene Theodorus Petrus Compen

    IPC分类号： G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70725 ,  G03F7/70633 ,  G03F7/70775 ,  G03F7/70783 ,  G03F9/7011

    摘要： The invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder in a lithographic projection apparatus by using a transfer unit on the basis of transfer data available thereto. The second substrate holder has a surface provided with a first plurality of burls. In the method, a memory encoded with burl position data and substrate position data is provided. Subsequently, a substrate is provided on the first substrate holder. The position error and orientation of the substrate is then measured. On the basis of the burl position data, substrate position data and orientation as measured orientation adjustment data are calculated. The orientation of the substrate is subsequently adjusted in accordance with the orientation adjustment data. The substrate is then transferred from the first substrate holder to the second substrate holder by the transfer unit and placed on the second substrate holder.

    摘要翻译： 本发明涉及一种通过使用转印单元基于可用的转印数据将基板从第一基板保持器转移到光刻投影设备中的第二基板保持器的方法。 第二基板保持器具有设置有第一多个毛刺的表面。 在该方法中，提供了编码有放大位置数据和衬底位置数据的存储器。 随后，在第一衬底保持器上设置衬底。 然后测量衬底的位置误差和取向。 基于钻头位置数据，计算作为测量取向调整数据的基板位置数据和取向。 随后根据取向调整数据调整基板的取向。 然后通过转印单元将衬底从第一衬底保持器转移到第二衬底保持器，并放置在第二衬底保持器上。