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公开(公告)号：US08269949B2
公开(公告)日：2012-09-18
申请号：US12563838
申请日：2009-09-21
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。
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公开(公告)号：US08564763B2
公开(公告)日：2013-10-22
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。
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公开(公告)号：US08416395B2
公开(公告)日：2013-04-09
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
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公开(公告)号：US20090279061A1
公开(公告)日：2009-11-12
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。
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5.发明授权公开(公告)号：US08970822B2
公开(公告)日：2015-03-03
申请号：US13586689
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
CPC分类号： G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
摘要翻译： 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。
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6.发明申请公开(公告)号：US20130094005A1
公开(公告)日：2013-04-18
申请号：US13586689
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis KUNNEN , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis KUNNEN , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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