摘要:
A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.
摘要:
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.
摘要:
An apparatus 1 for fabricating a component-embedded board according to the present invention comprises: a detecting unit 11 for detecting, before the board 21 is covered with an insulating layer 23, the actual position of an electronic component 22 formed on the surface of the board 21; a holding unit 12 for calculating a displacement between the design position of the electronic component 22 and the actual position of the electronic component 22 on the surface of the board 21, and for holding the displacement as displacement data; and a correcting unit 13 for correcting, based on the displacement data, design data to be used for processing the board 21 after the board 21 is covered with the insulating layer 23.
摘要:
A pattern drawing apparatus for forming patterns, that have a mirror image relationship to each other with respect to a substrate, on both sides of the substrate forms the patterns on both sides of the substrate by drawing the patterns directly on both sides of the substrate in accordance with prescribed data by using a direct drawing means such as a maskless exposure means or an inkjet patterning means.
摘要:
A driving circuit comprises: a constant-current source which supplies a current to a photodiode so as to forward-bias the photodiode; detecting means for detecting the forward voltage of the photodiode; determining means for determining whether or not the forward voltage detected by the detecting means is smaller than a predetermined reference voltage; and control means for controlling the supply of current from a current source to a laser diode, wherein when the determining means determines that the forward voltage is smaller than the predetermined reference voltage, the control means controls the current source so as to stop the supply of current to the laser diode.
摘要:
A surface light source control apparatus for a direct exposure apparatus comprises a light-emission level determining means for determining the light-emission level of each point light source for each of a plurality of groups so that a uniform illuminance distribution is achieved at a position corresponding to an exposure surface of an exposure target when a projection device is set so as to reflect all light rays incident thereon toward the exposure surface, the plurality of groups being formed in advance by grouping the point light sources based on similarity in tendency in terms of illuminance distribution characteristics that the point light sources have at the position corresponding to the exposure surface, wherein the light-emission level determining means determines the light-emission level so that all the point light sources belonging to the same group have the same light-emission level.
摘要:
A drawing apparatus, for forming a desired drawing pattern by drawing the pattern directly on a drawing target surface using a drawing engine equipped with a plurality of drawing devices arranged along a direction of relative movement of the drawing target surface, the drawing engine being designed so that the design spacing of the thus arranged drawing devices is equal to a product of a unit pixel spacing in drawing data and an integer, comprises: correcting means for generating corrected drawing data by correcting the drawing data based on the difference between the design spacing and the actual spacing of the drawing devices; and supplying means for supplying the drawing engine with the corrected drawing data just necessary for direct drawing to a drawing block that the drawing engine can draw at a time on the drawing target surface, each time the drawing target substrate moves in relative fashion by a distance corresponding to an actual pixel spacing that is obtained by dividing the actual spacing of the drawing devices by that integer.
摘要:
A direct exposure system comprises: a data mask that is a data object including drawing data; and a control mask that is a data object including at least one logical layer in which information about exposure conditions applied according to regions on a substrate is specified, and performs a direct exposure process using integrated data generated by combining the data mask with the control mask.