Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
    21.
    发明申请
    Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method 审中-公开
    位置测量方法,位置控制方法,测量方法,加载方法,曝光方法和曝光装置以及装置制造方法

    公开(公告)号:US20070216893A1

    公开(公告)日:2007-09-20

    申请号:US11730915

    申请日:2007-04-04

    IPC分类号: G03B27/58

    摘要: A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

    摘要翻译: 通过对准系统检测可拆卸地安装在移动体上的预定形状的板的一部分,同时通过设置移动体的移动坐标系的测量单元测量移动体的位置,并且基于检测 结果和与检测结果对应的测量单元的测量结果,获得板的外周边缘的位置信息。 因此,即使在移动体上没有对准标记来进行位置测量,也可以基于由测量单元设定的移动坐标系来控制板的位置,即移动体的位置,基于 板的外周缘的位置信息。

    Magnetic coating formulations
    22.
    发明授权
    Magnetic coating formulations 失效
    磁性涂层配方

    公开(公告)号:US5330669A

    公开(公告)日:1994-07-19

    申请号:US41016

    申请日:1993-03-31

    摘要: A polyurethane resin is synthesized from a reaction mixture of at least one phosphorus compound, an epoxy compound, a polyisocyanate, a polyfunctional hydroxy compound, and optionally a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000 to about 200,000 number average molecular weight of the polyurethane resin. The weight average molecular weight of the polyurethane resin is from about 10,000 to about 250,000. A magnetic coating formulation is comprised of principally of magnetic particles and a binder. A magnetic recording media comprises a laminate as in the form of a magnetic layer composed principally of magnetic particles and a binder wherein at least a portion of the binder is the polyurethane resin. The substrate of the magnetic recording medium is a suitable polymer such as polyester, and the like. The utilization of the polyurethane resin containing a phosphorus compound therein results in excellent dispersion of the magnetic particles as well as exceptional durability.

    摘要翻译: 由至少一种磷化合物,环氧化合物,多异氰酸酯,多官能羟基化合物和任选的扩链剂的反应混合物合成聚氨酯树脂。 聚氨酯树脂含有一种磷酸基或一个来源于磷酸的残留基,每3,000〜200,000数均分子量的聚氨酯树脂。 聚氨酯树脂的重均分子量为约10,000至约250,000。 磁性涂层制剂主要由磁性颗粒和粘合剂组成。 磁记录介质包括主要由磁性颗粒和粘合剂组成的磁性层形式的层压体,其中粘合剂的至少一部分是聚氨酯树脂。 磁记录介质的基材是合适的聚合物,例如聚酯等。 含有磷化合物的聚氨酯树脂的利用导致磁性颗粒的优异分散性以及出色的耐久性。

    Magnetic recording medium comprising a polyurethane resin coating
residual groups derived from specified phosphorous containing compounds
    23.
    发明授权
    Magnetic recording medium comprising a polyurethane resin coating residual groups derived from specified phosphorous containing compounds 失效
    包含聚氨酯树脂的磁记录介质涂覆衍生自特定含磷化合物的残基

    公开(公告)号:US5158830A

    公开(公告)日:1992-10-27

    申请号:US684534

    申请日:1991-05-09

    摘要: A magnetic coating formulation is composed principally of magnetic particles and a binder. At least a portion of the binder is a polyurethane resin synthesized from a reactant mixture of specific phosphorus compound, epoxy compound, isocyanate compound and polyfunctional hydroxy compounds. The reactant mixture may optionally contain a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000-200,000 number average molecular weight of the polyurethane resin, and has a number average molecular weight of 4,000-150,000. A magnetic recording medium with a magnetic coating layer formed from the magnetic coating formulation is also disclosed. The magnetic coating layer features not only excellent dispersion of magnetic particles, in other words, excellent magnetic characteristics but also superb durability.

    摘要翻译: 磁性涂层制剂主要由磁性颗粒和粘合剂组成。 粘合剂的至少一部分是由特定磷化合物,环氧化合物,异氰酸酯化合物和多官能羟基化合物的反应物混合物合成的聚氨酯树脂。 反应物混合物可任选地含有扩链剂。 聚氨酯树脂含有一个磷酸基或一个来自磷酸的残留基,每3,000-200,000数均分子量的聚氨酯树脂,其数均分子量为4,000-150,000。 还公开了由磁性涂层制剂形成的具有磁性涂层的磁记录介质。 磁性涂层不仅具有磁性粒子的极好的分散性,也就是说,具有优异的磁特性,而且具有极好的耐久性。

    Exposure apparatus, exposure method, and method for producing device
    25.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置,曝光方法和制造装置的方法

    公开(公告)号:US09063438B2

    公开(公告)日:2015-06-23

    申请号:US13354899

    申请日:2012-01-20

    IPC分类号: G03F9/00 G03F7/20

    摘要: A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

    摘要翻译: 液浸曝光装置包括具有最后光学元件的投影系统,投影系统通过浸没液体将光束投射到基板上; 可动台,具有保持基板的保持架; 测量构件,设置在所述可移动台上,所述测量构件具有覆盖有透光材料的测量部分; 第一对准系统,通过该第一对准系统不通过浸没液体检测对准标记; 以及第二对准系统,其使用所述测量构件,通过所述浸没液体,光学地获得由所述投影系统投影的所述光束的第一位置信息。 为了获得第一位置信息,移动台被移动,使得测量构件在投影系统下方,并且投影系统和测量构件之间的间隙被浸没液体填充。

    Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
    26.
    发明授权
    Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method 有权
    位置测量方法,位置控制方法,测量方法,加载方法,曝光方法和曝光装置以及装置制造方法

    公开(公告)号:US08576379B2

    公开(公告)日:2013-11-05

    申请号:US12701014

    申请日:2010-02-05

    IPC分类号: G03B27/58 G03B27/52 G03B27/42

    摘要: A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

    摘要翻译: 通过对准系统检测可拆卸地安装在移动体上的预定形状的板的一部分,同时通过设置移动体的移动坐标系的测量单元测量移动体的位置,并且基于检测 结果和与检测结果对应的测量单元的测量结果,获得板的外周边缘的位置信息。 因此,即使在移动体上没有对准标记来进行位置测量,也可以基于由测量单元设定的移动坐标系来控制板的位置,即移动体的位置,基于 板的外周缘的位置信息。

    Exposure apparatus, exposure method, and method for producing device
    27.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置,曝光方法和制造装置的方法

    公开(公告)号:US08130361B2

    公开(公告)日:2012-03-06

    申请号:US11399537

    申请日:2006-04-07

    IPC分类号: G03B27/42 G03B27/52

    摘要: An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.

    摘要翻译: 一种曝光装置,包括:在保持基板的同时可移动的基板台;基板对准系统,其检测由基板台保持的基板上的对准标记(1),并检测设置在基板台上的基准标记(PFM);以及掩模 对准系统,其经由投影光学系统检测设置在基板台上的参考标记(MFM)。 通过使用衬底对准系统,无需液体检测衬底台上的参考标记(PFM),并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记(MFM)。 然后,获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系,从而在液浸曝光中精确地进行取向处理。

    Alignment method and apparatus therefor
    29.
    发明授权
    Alignment method and apparatus therefor 失效
    对准方法及其装置

    公开(公告)号:US06876946B2

    公开(公告)日:2005-04-05

    申请号:US10299819

    申请日:2002-11-20

    IPC分类号: G03F9/00 G03B27/42

    CPC分类号: G03F9/7003

    摘要: A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement of a plurality of shot areas on the substrate, and the parameters in the other set relate to the shot areas per se. The mask and the substrate are moved relatively in accordance with the determined parameters.

    摘要翻译: 将掩模的图案转移到基板上的拍摄区域的方法在单个模型方程式中确定两组参数。 两组之一中的参数涉及衬底上的多个照射区域的布置,而另一组中的参数涉及拍​​摄区域本身。 掩模和基板根据确定的参数相对移动。

    Micro devices manufacturing method utilizing concave and convex alignment mark patterns
    30.
    发明授权
    Micro devices manufacturing method utilizing concave and convex alignment mark patterns 失效
    微型器件制造方法利用凹凸对准标记图案

    公开(公告)号:US06641962B2

    公开(公告)日:2003-11-04

    申请号:US10375012

    申请日:2003-02-28

    IPC分类号: G03F900

    摘要: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

    摘要翻译: 根据本发明的曝光方法包括:在基板上形成包括凹凸图案的对准标记的第一步骤; 在所述对准标记和所述基板上的其他区域上形成涂层的第二步骤; 第三步,使所述外套变平; 以及在由所述第三步骤变平的所述涂层上施加感光材料并向其投射掩模图案的第四步骤。 对准标记由所述凹凸图案形成,所述凹凸图案以相对于具有不小于预定值的宽度的相邻凸部之间的预定值小的间距排列。