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公开(公告)号：US20150050602A1
公开(公告)日：2015-02-19
申请号：US14363512
申请日：2012-10-03
Inventor： Sommawan Khumpuang , Shiro Hara
CPC classification number: G03F7/162 , B05C5/02 , B05C11/08 , B05C11/1005 , G03F7/3021
Abstract: An optimal development method and an apparatus of a resist formed on a half-inch size wafer. The development method is a development method of a resist formed on a wafer with a wafer size for manufacturing a number of minimized units of semiconductor devices. The method includes a first step, a second step, a third step, and a fourth step. The first step drops developer until a thickness of developer becomes maximum on the wafer whose rotation is stopped. The second step performs development while rotating the wafer. The third step supplies the developer about a half of the amount of developer of the first step on the wafer whose rotation is stopped. The fourth step performs development at a development period longer than the second step while rotating the wafer.
Abstract translation: 在半英寸大小的晶片上形成的最佳的显影方法和抗蚀剂的装置。 显影方法是形成在具有用于制造多个半导体器件的最小化单元的晶片尺寸的晶片上的抗蚀剂的显影方法。 该方法包括第一步骤，第二步骤，第三步骤和第四步骤。 第一步骤降低显影剂，直到显影剂的厚度在旋转停止的晶片上达到最大值。 第二步在旋转晶片的同时进行开发。 第三步向显影器提供约一半的旋转停止的晶片上的第一步显影剂量。 在旋转晶片的同时，第四步骤在比第二步长的显影时段进行显影。
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公开(公告)号：US11686479B2
公开(公告)日：2023-06-27
申请号：US17210361
申请日：2021-03-23
Inventor： Shiro Hara , Hitoshi Maekawa , Sommawan Khumpuang , Takashi Yajima , Yuuki Ishida
IPC: F24F3/167 , F24F3/04 , F24F11/49 , F24F11/74 , F24F110/30 , F24F110/40
CPC classification number: F24F3/167 , F24F3/04 , F24F11/49 , F24F11/74 , F24F2110/30 , F24F2110/40
Abstract: An encapsulated cleanroom system comprising a processing chamber and a storage section in which the processing chamber is stored, wherein, during operation, the pressure in the storage section is lower or higher than the pressures in the processing chamber and exterior space. The system can simultaneously prevent the entry of outside gases into its processing chamber and the leakage of the gases inside the processing chamber to the exterior space.
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公开(公告)号：US10431446B2
公开(公告)日：2019-10-01
申请号：US15037886
申请日：2014-12-01
Inventor： Shiro Hara , Sommawan Khumpuang , Shinichi Ikeda , Akihiro Goto , Hiroshi Amano
Abstract: A wafer cleaner and a method therefor that efficiently cleans a wafer with a little amount of a cleaning liquid and efficiently performs a heating wet cleaning processing. The present invention includes a stage where a wafer is placed, a rotary driving unit that rotates the stage in a circumferential direction, a liquid discharge nozzle disposed facing the wafer placed on the stage and supplies a cleaning liquid on the wafer placed on the stage, and a control unit that causes the liquid discharge nozzle to supply a space between the wafer placed on the stage and the liquid discharge nozzle with a predetermined amount of the cleaning liquid to fill the space. The present invention also includes a lamp disposed on a position facing the wafer placed on the stage to heat at least an interface portion of the wafer and a cleaning liquid.
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Patent Agency Ranking
公开(公告)号：US10186489B2
公开(公告)日：2019-01-22
申请号：US14913176
申请日：2014-07-24
Inventor： Shiro Hara , Sommawan Khumpuang , Shinichi Ikeda
IPC: H01L23/544 , G01B11/14 , H01L29/04 , H01L21/67
Abstract: To provide a crystal orientation mark which can be formed easily and inexpensively, and which enables to perform high precision alignment and allows information other than crystal orientation to be included, even for a small diameter process substrate. A crystal orientation mark is drawn on the surface of the process substrate. The crystal orientation mark includes a marking region for crystal orientation detection, and a marking region for information. The marking region for crystal orientation detection is provided at two locations in an outer edge portion of the process substrate to be used for the alignment of the process substrate. The marking region for information is provided on a straight-line region connecting the marking regions for crystal orientation detection at the two locations, and includes a pattern for demonstrating predetermined information relating to the process substrate.
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公开(公告)号：US09563136B2
公开(公告)日：2017-02-07
申请号：US14363376
申请日：2012-10-03
Inventor： Shiro Hara
IPC: G03D17/00 , G03F7/20 , H01L21/67 , H01L21/677 , G21F7/00
CPC classification number: G03F7/7075 , G21F7/00 , H01L21/6719 , H01L21/67751 , H01L21/67772 , H01L21/67775
Abstract: Arranging an application apparatus, an exposure apparatus, a developing apparatus, and similar apparatus together within a large yellow room makes it difficult to change a layout in association with a change of a recipe and to streamline a layout area and similar parameter. A yellow room system includes: a plurality of portable unit process apparatuses 50 that each have the same standardized outer shape and include a yellow room configured to shield a exposure light to a photosensitive material formed on a workpiece; conveyance containers 11 and 25 that convey the workpiece between the unit process apparatuses and itself is formed as the yellow room; and a light-shielding coupling structure that couples the unit process apparatus, which is formed on a docking port 56 disposed in the upper portion of a front chamber 80 of the unit process apparatus 50, and the conveyance containers together.
Abstract translation: 在大的黄色房间内将应用设备，曝光设备，显影设备和类似设备一起布置使得难以改变与配方改变相关联的布局并且简化布局区域和类似的参数。 黄色房间系统包括：多个便携式单元处理设备50，每个便携式单元处理设备50具有相同的标准化外部形状，并且包括被配置为将曝光光屏蔽到形成在工件上的感光材料的黄色房间; 在单元处理装置和本身之间传送工件的输送容器11和25形成为黄色房间; 以及将形成在设置在单元处理装置50的前室80的上部的对接端口56上的单元处理装置与输送容器连接在一起的遮光联接结构。
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公开(公告)号：US09513567B2
公开(公告)日：2016-12-06
申请号：US14363489
申请日：2012-12-04
Inventor： Shiro Hara , Sommawan Khumpuang , Yoshiki Inuzuka , Yasuaki Yokoyama
IPC: G03B27/58 , G03F7/20 , H01L21/677
CPC classification number: G03F7/70716 , G03F7/2051 , G03F7/70733 , H01L21/677 , H01L21/67733 , H01L21/67736 , H01L21/67796
Abstract: To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1 that exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying device 5 for conveying the wafer W and the mask M; an exposure stage 3f on which the wafer W conveyed by the conveying device 5 is installed; a mask holder 3b that is mounted to face the exposure stage 3f and on which the mask M conveyed by the conveying device 5 is installed; and an LED light source 8c mounted to face the exposure stage 3f via the mask holder 3b.
Abstract translation: 提供可以适当地管理非常小批量的生产和多产品生产的掩模对准器。 本发明是一种掩模对准器1，其通过掩模M使预定尺寸的晶片W曝光，并具有包括：用于输送晶片W和掩模M的输送装置5; 曝光台3f，其上安装由输送装置5输送的晶片W; 安装在面对曝光台3f并且由传送装置5输送的面罩M安装在其上的面罩座3b; 以及经由掩模保持器3b安装成面向曝光台3f的LED光源8c。
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27.发明授权Mounting structure of movable manufacturing device, fixing structure and movable manufacturing device 有权可移动制造装置的安装结构，固定结构和可移动制造装置公开(公告)号：US09254540B2
公开(公告)日：2016-02-09
申请号：US14292125
申请日：2014-05-30
Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY , DESIGN NETWORK CO., LTD.
Inventor： Shiro Hara , Shizuka Nakano , Hitoshi Maekawa , Shinji Futagawa , Takahiro Fukuda
CPC classification number: B23Q1/01 , B62B3/06 , B62B5/049 , B62B5/063 , B62B2203/28 , F16M11/20 , H01L21/67775
Abstract: Mounting structure to allow a production line made up of movable manufacturing devices to be rearranged quickly, safely, and reliably. The mounting structure according to the present invention includes a fixing structure installed on a floor and a leg portion installed on a bottom plate of the movable manufacturing device. The fixing structure comprises a floor side positioning member and a floor side coupling member while the leg portion comprises a leg side positioning member and a leg side coupling member. The floor side positioning member and the leg side positioning member positions the movable manufacturing device accurately by fitting each other when the device is placed at the specified location of the fixing structure. The floor side coupling member and the leg side coupling member fixes the movable manufacturing device located on the fixing structure by coupling each other.
Abstract translation: 安装结构使得由可移动制造装置组成的生产线能够快速，安全，可靠地重新排列。 根据本发明的安装结构包括安装在地板上的固定结构和安装在可移动制造装置的底板上的脚部。 固定结构包括地板侧定位构件和地板侧联接构件，而腿部包括腿侧定位构件和腿侧联接构件。 当装置放置在固定结构的指定位置时，地板侧定位构件和腿侧定位构件将可动制造装置准确地相互配合。 地板侧联接构件和腿侧联接构件通过彼此联接固定位于固定结构上的可移动制造装置。
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公开(公告)号：US20140338591A1
公开(公告)日：2014-11-20
申请号：US14362348
申请日：2012-11-30
Inventor： Shinichi Ikeda , Shiro Hara , Takanori Mikahara , Hitoshi Habuka , Sommawan Khumpuang
CPC classification number: C23C16/482 , C30B13/24 , F27B17/0025 , F27D2099/0026 , H01L21/67115 , Y10T117/108
Abstract: Provide a converging mirror-based furnace for heating a target by way of reflecting from a reflecting mirror unit the light emitted from a light source and then irradiating a target with the reflected light, wherein said target-heating converging-light furnace is such that: the reflecting mirror unit comprises a primary reflecting mirror and secondary reflecting mirror; the light emitted from the light source is reflected sequentially by the primary reflecting mirror and secondary reflecting mirror and then irradiated onto the target; and the light reflected by the secondary reflecting mirror and irradiated onto the target surface is not perpendicular to the target surface. Based on the above, a system that uses converged infrared light to provide heating can be made smaller while keeping its heating performance intact, even when the system uses a revolving ellipsoid.
Abstract translation: 提供一种会聚反射镜式炉，用于通过从反射镜单元反射从光源发射的光然后用反射光照射目标来加热目标，其中所述目标加热会聚光炉使得： 反射镜单元包括主反射镜和次反射镜; 从光源发射的光被主反射镜和次反射镜依次反射，然后照射到目标上; 并且由二次反射镜反射并被照射到目标表面上的光不与目标表面垂直。 基于上述，即使系统使用旋转椭圆体，也可以使使用会聚红外线来提供加热的系统更小，同时保持其加热性能不变。
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