公开(公告)号：US06707537B2

公开(公告)日：2004-03-16

申请号：US10189279

申请日：2002-07-02

申请人： Nils Dieckmann ,  Jess Köhler ,  Johannes Wangler

发明人： Nils Dieckmann ,  Jess Köhler ,  Johannes Wangler

IPC分类号： G03B2754

CPC分类号： G03F7/70141 ,  G02B27/0037 ,  G02B27/4222 ,  G02B27/4294 ,  G03F7/70108

摘要： A projection exposure system, in particular for microlithography, serves to generate an image of an object disposed in an object plane in an image plane. For this purpose, use is made of a light source emitting projection light, illumination optics disposed in the beam path between the light source and the object plane and projection optics disposed in the beam path between the object plane and the image plane. Disposed in the vicinity of a field plane of the illumination optics is at least one optical element that changes the angular illumination distribution of the projection light passing through. The change, impressed by the optical element, in the angular illumination distribution is non-rotationally symmetrical with respect to the optical axis. The optical element can be disposed in various angular positions around an axis perpendicular to the field plane. Such an optical element makes it possible to modify the symmetry of the angular illumination distribution flexibly.

摘要翻译： 特别是用于微光刻的投影曝光系统用于在图像平面中产生设置在物平面中的物体的图像。 为此，使用发射投影光的光源，设置在光源和物平面之间的光束路径中的照明光学器件和布置在物平面和像平面之间的光束路径中的投影光学元件。 设置在照明光学器件的场平面附近的至少一个光学元件，其改变通过的投影光的角度照度分布。 角度照明分布中由光学元件照射的变化相对于光轴是非旋转对称的。 光学元件可以围绕垂直于场平面的轴设置在各种角度位置。 这样的光学元件使得可以灵活地改变角度照明分布的对称性。

公开(公告)号：US09274435B2

公开(公告)日：2016-03-01

申请号：US12415173

申请日：2009-03-31

申请人： Nils Dieckmann ,  Damian Fiolka

发明人： Nils Dieckmann ,  Damian Fiolka

IPC分类号： G03F7/20 ,  G02B27/28

CPC分类号： G03F7/70216 ,  G02B27/281 ,  G02B27/286 ,  G03F7/70091 ,  G03F7/70566

摘要： The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.

摘要翻译： 本公开涉及一种光学系统，例如微光刻投影曝光设备的照明系统或投影物镜，其包括具有偏振影响光学布置的光学系统，其允许提供期望的偏振分布的增强的灵活性。

公开(公告)号：US08488104B2

公开(公告)日：2013-07-16

申请号：US13107011

申请日：2011-05-13

申请人： Nils Dieckmann ,  Alexander Wolf ,  Christian Holland ,  Ulrich Loering ,  Franz Sorg

发明人： Nils Dieckmann ,  Alexander Wolf ,  Christian Holland ,  Ulrich Loering ,  Franz Sorg

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70941 ,  G02B27/0043

摘要： A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element. Each of the false light diaphragms is fashioned in such a way that the false light diaphragm screens at least a part of the edge region against radiation running outside the imaging beam path.

摘要翻译： 用于将布置在投影物镜的物平面中的物体成像为位于投影物镜的像平面中的物体的图像的投影物镜具有多个透明光学元件和用于将光学元件保持在规定位置的保持装置 投影物镜的成像光束路径。 每个光学元件具有位于成像光束路径中的光学有用区域和位于光学有用区域外部的边缘区域。 分配给光学元件的保持装置的至少一个保持元件作用在接触区域的边缘区域。 至少一个光学元件被分配有具有布置在光学元件的正上游的假光膜的膜片装置和直接布置在光学元件的下游的第二假光膜。 每个假光隔膜以这样的方式形成，使得假光隔膜将至少一部分边缘区域屏蔽到抵抗在成像光束路径外部运行的辐射。

公开(公告)号：US20120188527A1

公开(公告)日：2012-07-26

申请号：US13438179

申请日：2012-04-03

申请人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

发明人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

IPC分类号： G03B27/72

CPC分类号： G03F7/70191

摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

摘要翻译： 微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器）。 可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。 在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

公开(公告)号：US07593095B2

公开(公告)日：2009-09-22

申请号：US10590537

申请日：2005-02-22

申请人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

发明人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70583 ,  G03F7/70058

摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then Passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.

摘要翻译： 本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射 。 第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。 然后将两个部分光束共同地通向照明平面。 除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。 在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。 谐振器主体设置有具有不同局部相位分布的相位板。

公开(公告)号：US20090040496A1

公开(公告)日：2009-02-12

申请号：US12177715

申请日：2008-07-22

申请人： Toralf GRUNER ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf GRUNER ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US07408616B2

公开(公告)日：2008-08-05

申请号：US10949396

申请日：2004-09-27

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/42

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US20060290913A1

公开(公告)日：2006-12-28

申请号：US11475871

申请日：2006-06-28

申请人： Nils Dieckmann ,  Manfred Maul

发明人： Nils Dieckmann ,  Manfred Maul

IPC分类号： G03B27/42

CPC分类号： G03F7/70308 ,  G03F7/70566

摘要： In an exposure method for producing an image of a pattern, arranged in the object surface of a projection objective, in the image surface of the projection objective, the mask is illuminated with illumination radiation with the aid of the illumination system. The radiation varied by the mask and which enters the projection objective is thereby produced downstream of the mask. The projection objective is transirradiated with this radiation. An astigmatic variation of the radiation varied by the mask is effected in the region of at least one pupil surface of the projection objective, the astigmatic variation being designed such that an anisotropy of properties of the radiation striking the image surface that leads to direction-dependent contrast differences is at least partially compensated. The astigmatic variation can be achieved, for example, with the aid of an elliptical diaphragm or an elliptical transmission filter.

摘要翻译： 在布置在投影物镜的物体表面上的图形图像的曝光方法中，在投影物镜的图像表面中，借助于照明系统照射照射的掩模。 由掩模变化并进入投影物镜的辐射由此在掩模的下游产生。 投射物镜用这种辐射进行辐照。 由掩模变化的辐射的散光变化在投影物镜的至少一个瞳孔表面的区域中进行，散光变化被设计成使得射入图像表面的辐射的各向异性导致方向依赖 对比差异至少部分得到补偿。 像散变化可以例如借助椭圆形光阑或椭圆形透射滤光片来实现。

公开(公告)号：US06512780B1

公开(公告)日：2003-01-28

申请号：US09717560

申请日：2000-11-21

申请人： Nils Dieckmann

发明人： Nils Dieckmann

IPC分类号： H01S310

CPC分类号： G03F7/70141 ,  G02B27/648 ,  G03F7/709

摘要： A beam splitter (4) arranged in a laser beam (2) and at least two beam-deflecting devices (7) are provided in a system for at least far-reaching compensation of directional and positional fluctuations in the light beam (2) produced by a laser (1), in particular for micro lithographic illuminating devices. The beam splitter (4) guides a partial beam (2a) directly onto an illuminating reference surface (3) of the illuminating device, while a further partial beam (2b) is led back to the beam splitter (4) via a detour (5) in which the at least two beam-deflecting devices (6, 7) are located, and is subsequently likewise fed to the illuminating reference surface (3).

摘要翻译： 布置在激光束（2）中的分束器（4）和至少两个光束偏转装置（7）设置在用于至少深入地补偿所产生的光束（2）中的方向和位置波动的系统中 通过激光（1），特别是用于微光刻照明装置。 分束器（4）将部分光束（2a）直接引导到照明装置的照明参考表面（3）上，而另外的部分光束（2b）经由绕线（5）被引导回到分束器（4） ），其中所述至少两个光束偏转装置（6,7）位于，并且随后同样地被馈送到照明参考表面（3）。