公开(公告)号：US08848162B2

公开(公告)日：2014-09-30

申请号：US12901163

申请日：2010-10-08

申请人： Johannes Catharinus Hubertus Mulkens

发明人： Johannes Catharinus Hubertus Mulkens

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70916

摘要： A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.

摘要翻译： 描述了在浸没流体光刻设备中回收浸没流体的系统。 公开了一种循环路径，其包括多个平行路径，每个路径具有其自己的平行液体处理单元，其被优化以处理被引导通过其的流体。

公开(公告)号：US08724084B2

公开(公告)日：2014-05-13

申请号：US13189255

申请日：2011-07-22

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Mattijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Mattijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US08704998B2

公开(公告)日：2014-04-22

申请号：US13012303

申请日：2011-01-24

申请人： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

发明人： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

公开(公告)号：US08638418B2

公开(公告)日：2014-01-28

申请号：US12976174

申请日：2010-12-22

申请人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

发明人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US08629970B2

公开(公告)日：2014-01-14

申请号：US12355039

申请日：2009-01-16

申请人： Harry Sewell ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Louis John Markoya ,  Diane McCafferty

发明人： Harry Sewell ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Louis John Markoya ,  Diane McCafferty

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.

摘要翻译： 光刻设备包括投影系统，流体处理结构，计量装置和再循环控制装置。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上，该基板被支撑在基板台上。 流体处理结构被配置为向投影系统和衬底和/或衬底台之间的空间提供浸没流体。 测量装置被配置为监测浸没流体的参数。 回收控制装置调节浸没流体的路线，以便由流体处理结构重新使用，或者基于由计量装置指示的浸入流体的质量进行再修复。

公开(公告)号：US08542344B2

公开(公告)日：2013-09-24

申请号：US13285583

申请日：2011-10-31

申请人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

发明人： Christiaan Alexander Hoogendam ,  Bob Streefkerk ,  Johannes Catharinus Hubertus Mulkens ,  Erik Theodorus Maria Bijlaart ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Bernardus Antonius Slaghekke ,  Patricius Aloysius Jacobus Tinnemans ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。

公开(公告)号：US08472002B2

公开(公告)日：2013-06-25

申请号：US12698938

申请日：2010-02-02

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US08446568B2

公开(公告)日：2013-05-21

申请号：US12796482

申请日：2010-06-08

申请人： Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

发明人： Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC分类号： G03B27/58 ,  G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US08115899B2

公开(公告)日：2012-02-14

申请号：US11656560

申请日：2007-01-23

申请人： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

发明人： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 可以在衬底台中设置清洁装置，并且可以设置超声波发射器以产生超声波清洗液体。

公开(公告)号：US08027026B2

公开(公告)日：2011-09-27

申请号：US13016211

申请日：2011-01-28

申请人： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

发明人： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

IPC分类号： G03B27/54

CPC分类号： G03F7/70341

摘要： A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.

摘要翻译： 一种方法，包括使用混合器混合第一组分和第二组分以在供应到投影系统和基底之间的空间之前形成液体，使用测量装置测量液体的性质并使反馈可用于控制器， 基于反馈，通过控制用于形成液体的第一和/或第二部件的量，通过控制器控制液体的物理性质，将液体供应到投影系统和基板之间的空间，并且将投影 使用投影系统的图案化的光束束通过液体到达基板的目标部分。