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    Process for forming a patterned thin film structure on a substrate
    25.
    发明授权
    Process for forming a patterned thin film structure on a substrate 有权
    在衬底上形成图案化薄膜结构的工艺

    公开(公告)号：US08002948B2

    公开(公告)日：2011-08-23

    申请号：US11777083

    申请日：2007-07-12

    申请人： Jeanne E. Haubrich ,  Yi-Shung Chaug ,  Zarng-Arh George Wu ,  Rong-Chang Liang ,  Xiaojia Wang

    发明人： Jeanne E. Haubrich ,  Yi-Shung Chaug ,  Zarng-Arh George Wu ,  Rong-Chang Liang ,  Xiaojia Wang

    IPC分类号： B05D1/32 ,  B05D3/10 ,  B05D5/12 ,  H01L21/31 ,  H01L21/36 ,  B32B37/10 ,  B32B43/00

    CPC分类号： H05K3/048 ,  B05D1/325 ,  H05K2201/0209 ,  H05K2201/0212 ,  Y10T156/1111 ,  Y10T156/1116 ,  Y10T156/1121

    摘要： A process for forming a patterned thin film structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired thin film structures will be formed in the areas where the printed material is not present, i.e., a negative image of thin film structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired thin film structures will be formed in the areas where the printed material is present, i.e., a positive image of the thin film structure is printed. The thin film material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned thin film structures.

    摘要翻译： 公开了一种在衬底上形成图案化薄膜结构的工艺。 在衬底上印有诸如掩模涂层或油墨的材料的图案，该图案使得在一个实施例中，将在不存在印刷材料的区域中形成所需的薄膜结构， 即，印刷要形成的薄膜结构的负像。 在另一个实施例中，图案印刷有难以从衬底剥离的材料，并且所需的薄膜结构将形成在存在印刷材料的区域中，即，薄膜结构的正像是 印刷。 薄膜材料沉积在图案化的衬底上，并且不期望的区域被剥离，留下图案化的薄膜结构。