PATTERN STRUCTURE AND METHOD OF MANUFACTURING THE PATTERN STRUCTURE
    23.
    发明申请
    PATTERN STRUCTURE AND METHOD OF MANUFACTURING THE PATTERN STRUCTURE 有权
    图案结构及其制作方法

    公开(公告)号:US20160054498A1

    公开(公告)日:2016-02-25

    申请号:US14733234

    申请日:2015-06-08

    CPC classification number: G02B5/3058 B29D11/00644 B29K2101/10 G03F7/0002

    Abstract: A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the pattern structure units, and a flattening layer disposed on the second surface of each of the plurality of pattern structure units, where the flattening layer connects the pattern structure units with each other, and a vertical step difference exists between second surfaces of the pattern structure units.

    Abstract translation: 图案结构包括基本上在同一平面上布置的多个图案结构单元,其中每个图案结构单元具有彼此相对的第一表面和第二表面,并且在第一表面上限定微结构 每个图案结构单元和布置在多个图案结构单元的每个的第二表面上的平坦化层,其中平坦化层将图案结构单元彼此连接,并且在第二表面之间存在垂直的阶差 图案结构单位。

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