公开(公告)号：US20190070709A1

公开(公告)日：2019-03-07

申请号：US15693837

申请日：2017-09-01

Applicant: Seagate Technology LLC

Inventor： Mihaela Ruxandra Baurceanu ,  Chea Phann ,  Kevin Lamber Mayer ,  Ricky Ray Anderson ,  Andrew David Habermas

IPC: B24B53/017 ,  B24B37/20

Abstract: The present disclosure includes one or more resilient members for use in an apparatus used to form lapping plates. The resilient members can permit processing members such as charging elements and shaving blades to conform to irregularities in surface topography of lapping plate platens.

公开(公告)号：US20180361427A1

公开(公告)日：2018-12-20

申请号：US16059627

申请日：2018-08-09

Applicant: Seagate Technology LLC

Inventor： Daniel Richard Buettner ,  Andrew David Habermas ,  Daniel Sullivan ,  Joseph M. Stephan

IPC: B05D3/06 ,  G11B5/60 ,  G11B5/31 ,  B29C59/02 ,  B33Y80/00 ,  B33Y10/00 ,  B05D7/00 ,  B05D3/12

CPC classification number: B05D3/067 ,  B05D3/12 ,  B05D7/54 ,  B29C59/02 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/0002 ,  G11B5/3106 ,  G11B5/3163 ,  G11B5/6005 ,  G11B5/6082 ,  Y10T29/49041

Abstract: The present disclosure includes methods of forming air bearing surfaces having multi-tier structures using nanoimprint technology and/or 3D printing technology. In some embodiments, a single stage of milling can be used to transfer a multi-tier photoresist pattern into a substrate (e.g., an AlTiC substrate).

公开(公告)号：US10058890B1

公开(公告)日：2018-08-28

申请号：US15354718

申请日：2016-11-17

Applicant: Seagate Technology LLC

Inventor： Daniel Richard Buettner ,  Andrew David Habermas ,  Daniel Sullivan ,  Joseph M. Stephan

IPC: G11B5/60 ,  B05D3/06 ,  B05D3/12 ,  B33Y10/00 ,  B33Y80/00 ,  B05D7/00 ,  B29C59/02 ,  G11B5/31

CPC classification number: B05D3/067 ,  B05D3/12 ,  B05D7/54 ,  B29C59/02 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/0002 ,  G11B5/3106 ,  G11B5/3163 ,  G11B5/6005 ,  G11B5/6082 ,  Y10T29/49041

Abstract: The present disclosure includes methods of forming air bearing surfaces having multi-tier structures using nanoimprint technology and/or 3D printing technology. In some embodiments, a single stage of milling can be used to transfer a multi-tier photoresist pattern into a substrate (e.g., an AlTiC substrate).

公开(公告)号：US20180001439A1

公开(公告)日：2018-01-04

申请号：US15198566

申请日：2016-06-30

Applicant: Seagate Technology LLC

Inventor： Chea Phann ,  Ricky Ray Anderson ,  Kevin Lambert Mayer ,  Mihaela Ruxandra Baurceanu ,  Andrew David Habermas ,  Raymond Leroy Moudry ,  Joel William Hoehn

IPC: B24B37/12 ,  B24B37/005

Abstract: The present disclosure includes barrier devices for use in an apparatus used to form lapping plates. The barrier devices can contain liquid on the surface of the lapping plate platen. The present disclosure also involves related methods.

公开(公告)号：US20140254338A1

公开(公告)日：2014-09-11

申请号：US13791130

申请日：2013-03-08

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Andrew David Habermas ,  Dongsung Hong ,  Daniel Boyd Sullivan

IPC: G11B5/31 ,  G11B13/04

CPC classification number: G11B5/3163 ,  B82Y10/00 ,  G11B5/3116 ,  G11B5/314 ,  Y10S977/887

Abstract: Nanoimprint lithography can be used in a variety of ways to improve resolution, pattern fidelity and symmetry of microelectronic structures for thin film head manufacturing. For example, write poles, readers, and near-field transducers can be manufactured with tighter tolerances that improve the performance of the microelectronic structures. Further, entire bars of thin film heads can be manufactured simultaneously using nanoimprint lithography, which reduces or eliminated alignment errors between neighboring thin film heads in a bar of thin film heads.

Abstract translation: 纳米压印光刻可以以各种方式用于提高薄膜头制造的微电子结构的分辨率，图案保真度和对称性。 例如，写极点，读取器和近场换能器可以用更严格的公差制造，从而改善微电子结构的性能。 此外，可以使用纳米压印光刻法同时制造薄膜头的整个条，这减少或消除了薄膜头中的相邻薄膜头之间的对准误差。