公开(公告)号：US08524163B2

公开(公告)日：2013-09-03

申请号：US12508276

申请日：2009-07-23

申请人： Noboru Wada ,  Masaki Kuzumoto ,  Yasutaka Inanaga

发明人： Noboru Wada ,  Masaki Kuzumoto ,  Yasutaka Inanaga

IPC分类号： B01J19/08

摘要： An ozone generating apparatus is provided which includes a pair of electrodes for producing a discharge by the application of an ac voltage therebetween, and at least one dielectric provided between the pair of electrodes. A source gas containing oxygen is provided into a discharge space in which the discharge is produced to generate ozone by the action of the discharge. A surface lying between at least one of the pair of electrodes and the discharge space and in contact with the discharge has a surface resistivity of 104Ω to 1011Ω. The source gas provided into the discharge space includes ultrapure oxygen having a purity of not less than 99.9%.

公开(公告)号：US08328998B2

公开(公告)日：2012-12-11

申请号：US12685358

申请日：2010-01-11

申请人： Noboru Wada ,  Masaki Kuzumoto ,  Yasutaka Inanaga

发明人： Noboru Wada ,  Masaki Kuzumoto ,  Yasutaka Inanaga

IPC分类号： B01J19/08

CPC分类号： C01B13/11 ,  C01B2201/12 ,  C01B2201/22 ,  C01B2201/34 ,  C01B2201/64

摘要： An ozone generating apparatus is provided which includes a pair of electrodes for producing a discharge by the application of an ac voltage therebetween, and at least one dielectric provided between the pair of electrodes. A source gas containing oxygen is provided into a discharge space in which the discharge is produced to generate ozone by the action of the discharge. A surface lying between at least one of the pair of electrodes and the discharge space and in contact with the discharge has a surface resistivity of 104Ω to 1011Ω. The source gas provided into the discharge space includes ultrapure oxygen having a purity of not less than 99.9%.

摘要翻译： 提供一种臭氧发生装置，其包括一对用于通过施加交流电压产生放电的电极和设置在所述一对电极之间的至少一个电介质。 含有氧的源气体被提供到放电空间中，在放电空间中产生放电，以通过放电的作用产生臭氧。 位于一对电极中的至少一个与放电空间之间并与放电接触的表面具有104和OHgr的表面电阻率; 至1011＆OHgr。 设置在放电空间中的源气体包括纯度不低于99.9％的超纯氧。

公开(公告)号：US07965372B2

公开(公告)日：2011-06-21

申请号：US10134508

申请日：2002-04-30

申请人： Seiji Noda ,  Masaki Kuzumoto ,  Izumi Oya ,  Makoto Miyamoto

发明人： Seiji Noda ,  Masaki Kuzumoto ,  Izumi Oya ,  Makoto Miyamoto

IPC分类号： G03B27/32 ,  G03B27/52

CPC分类号： G03F7/427 ,  G03F7/42

摘要： A photoresist film removing apparatus includes a reacting chamber, an ozonizer producing a gas supplied to the reacting chamber, and an exhaust system that exhausts the gas from the reacting chamber. A source of a photoresist film-remover is located opposite a stage carrying a substrate covered with photoresist. Photoresist film-remover and the gas are supplied to the substrate through apertures. An electric field may be generated between the source of the photoresist film-remover and the substrate. Alternatively, a centrally located feed tube supplies only one of the gas and the photoresist film-remover through a single aperture and a reservoir discharges the other through apertures. The reservoir surrounds and is sealed to the feed tube. The apparatus may include a container holding a liquid photoresist film-remover and a mixture of the gas and remover is supplied from outside the reacting chamber to the substrate.

摘要翻译： 光致抗蚀剂膜去除装置包括反应室，产生供应到反应室的气体的臭氧发生器和从反应室排出气体的排气系统。 光致抗蚀剂膜去除剂的来源位于载有被光致抗蚀剂覆盖的基底的阶段上。 光致抗蚀剂去除剂和气体通过孔提供给基材。 可以在光致抗蚀剂去膜剂的源和基板之间产生电场。 或者，位于中心的进料管仅通过单个孔提供气体和光致抗蚀剂膜去除剂中的一个，并且储存器通过孔排出另一个。 储存器周围并密封到进料管。 该装置可以包括容纳液体光致抗蚀剂膜去除剂的容器，并且将气体和去除剂的混合物从反应室外部供应到基底。

公开(公告)号：US20090236042A1

公开(公告)日：2009-09-24

申请号：US11721356

申请日：2006-03-16

申请人： Noboru Wada ,  Masaki Kuzumoto ,  Hajime Nakatani ,  Hiroyuki Igehara ,  Norimitsu Esaki ,  Shingo Mine ,  Taichiro Tamida

发明人： Noboru Wada ,  Masaki Kuzumoto ,  Hajime Nakatani ,  Hiroyuki Igehara ,  Norimitsu Esaki ,  Shingo Mine ,  Taichiro Tamida

IPC分类号： C23C16/00 ,  B01J19/08 ,  B44C1/22 ,  C23F1/00

CPC分类号： H01T19/00 ,  C01B13/11 ,  C01B2201/12 ,  C01B2201/14 ,  C01B2201/22 ,  C01B2201/24 ,  C01B2201/32 ,  C01B2201/34 ,  C01B2201/60 ,  C01B2201/64 ,  C01B2201/76 ,  C01B2201/90 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2437

摘要： A silent discharge plasma apparatus includes a dielectric member, a pair of electrodes opposed to each other across the dielectric member and an alternating-current source applying an alternating-current voltage between the electrodes and causing a discharge. A gas is supplied to a discharge space, where discharge occurs, and a plasma is produced. At least one of the electrodes includes a conductive power feeding thin film on the dielectric member. When the dielectric member is destroyed and an arc discharge develops between the electrodes, the power feeding thin film is eliminated or oxidized, and the arc discharge is stopped.

摘要翻译： 无声放电等离子体装置包括电介质构件，在电介质构件之间彼此相对的一对电极和在电极之间施加交流电压并产生放电的交流电源。 向发生放电的放电空间供给气体，产生等离子体。 电极中的至少一个包括在电介质构件上的导电供电薄膜。 当电介质构件被破坏并且在电极之间产生电弧放电时，消除或氧化供电薄膜，停止电弧放电。

公开(公告)号：US5506858A

公开(公告)日：1996-04-09

申请号：US121347

申请日：1993-09-15

申请人： Yushi Takenaka ,  Masaki Kuzumoto ,  Kenji Yoshizawa ,  Takashi Yamamoto ,  Masato Matsubara ,  Junichi Nishimae ,  Koji Yasui ,  Akihiro Otani

发明人： Yushi Takenaka ,  Masaki Kuzumoto ,  Kenji Yoshizawa ,  Takashi Yamamoto ,  Masato Matsubara ,  Junichi Nishimae ,  Koji Yasui ,  Akihiro Otani

IPC分类号： B23K26/06 ,  H01S3/036 ,  H01S3/06 ,  H01S3/07 ,  H01S3/08 ,  H01S3/0975 ,  H01S3/098 ,  H01S3/13 ,  H01S3/23 ,  H01S3/139

CPC分类号： B23K26/0608 ,  B23K26/06 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/123 ,  H01S3/08059 ,  H01S3/036 ,  H01S3/076 ,  H01S3/08068 ,  H01S3/0975 ,  H01S3/2366

摘要： A laser system wherein, in order that a high-output and high-quality single mode of a cross sectional area larger than the beam diameter determined by the construction of a resonator can be obtained stably, although this has heretofore been impossible, there is used a coupling mirror provided with a partial reflection film and an antireflecting film, a laser beam mode is selected using the partial reflection film, a phase difference between laser beam portions caused by a difference in construction between the partial reflection film and the antireflecting film is compensated using a phase difference compensating apparatus, and there is formed an aperture whose diameter is set to a value of not larger than four times the diameter of the partial reflection film.

摘要翻译： 一种激光系统，其中为了稳定地获得横截面积大于通过谐振器结构确定的光束直径的高输出和高质量的单一模式，尽管迄今为止已经不可能使用 设置有部分反射膜和抗反射膜的耦合镜，使用部分反射膜选择激光束模式，补偿由部分反射膜和抗反射膜之间的结构差引起的激光束部分之间的相位差 使用相位差补偿装置，形成直径设定为不大于部分反射膜直径的4倍的孔径。

公开(公告)号：US08920741B2

公开(公告)日：2014-12-30

申请号：US12508276

申请日：2009-07-23

申请人： Noboru Wada ,  Masaki Kuzumoto ,  Yasutaka Inanaga

发明人： Noboru Wada ,  Masaki Kuzumoto ,  Yasutaka Inanaga

IPC分类号： B01J19/08 ,  C01B13/11

CPC分类号： C01B13/11 ,  C01B2201/12 ,  C01B2201/22 ,  C01B2201/34 ,  C01B2201/64

摘要： An ozone generating apparatus is provided which includes a pair of electrodes for producing a discharge by the application of an ac voltage therebetween, and at least one dielectric provided between the pair of electrodes. A source gas containing oxygen is provided into a discharge space in which the discharge is produced to generate ozone by the action of the discharge. A surface lying between at least one of the pair of electrodes and the discharge space and in contact with the discharge has a surface resistivity of 104Ω to 1011Ω. The source gas provided into the discharge space includes ultrapure oxygen having a purity of not less than 99.9%.

摘要翻译： 提供一种臭氧发生装置，其包括一对用于通过施加交流电压产生放电的电极和设置在所述一对电极之间的至少一个电介质。 含有氧的源气体被提供到放电空间中，在放电空间中产生放电，以通过放电的作用产生臭氧。 位于一对电极中的至少一个与放电空间之间并与放电接触的表面具有104和OHgr的表面电阻率; 至1011＆OHgr。 设置在放电空间中的源气体包括纯度不低于99.9％的超纯氧。

公开(公告)号：US08444831B2

公开(公告)日：2013-05-21

申请号：US13348147

申请日：2012-01-11

申请人： Youichiro Tabata ,  Hajime Nakatani ,  Masaki Kuzumoto

发明人： Youichiro Tabata ,  Hajime Nakatani ,  Masaki Kuzumoto

IPC分类号： B01J19/08

CPC分类号： C01B13/11 ,  C01B2201/60 ,  C01B2201/66

摘要： A method of generating ozone by applying a silent discharge to oxygen as a first raw material gas, and an oxide compound gas, as a second raw material gas, in which excited light, excited and generated by a discharge in the oxygen and the oxide compound gas, dissociates the oxide compound gas, or excites the oxide compound gas, accelerating dissociation of the oxygen and generation of ozone. In this way, ozone generation efficiency is raised.

摘要翻译： 作为第一原料气体，通过对作为第一原料气体的氧进行静电放电而产生臭氧的方法和作为第二原料气体的氧化物化合物气体，其中通过在氧气和氧化物化合物中的放电而激发和产生的激发光 气体，解离氧化物复合气体，或激发氧化物化合物气体，促进氧的分解和产生臭氧。 这样就可以提高臭氧发生效率。

公开(公告)号：US07785406B2

公开(公告)日：2010-08-31

申请号：US11913246

申请日：2006-06-21

申请人： Kouji Ota ,  Yasutaka Inanaga ,  Yasuhiro Tanimura ,  Masaki Kuzumoto ,  Hajime Nakatani ,  Hideo Ichimura ,  Akio Masuda ,  Shigeki Maekawa ,  Masaharu Moriyasu

发明人： Kouji Ota ,  Yasutaka Inanaga ,  Yasuhiro Tanimura ,  Masaki Kuzumoto ,  Hajime Nakatani ,  Hideo Ichimura ,  Akio Masuda ,  Shigeki Maekawa ,  Masaharu Moriyasu

IPC分类号： B01D53/14

CPC分类号： B01D53/0407 ,  B01D53/32 ,  B01D2253/108 ,  B01D2257/708 ,  B01D2259/40083 ,  B01D2259/41 ,  B01J20/186 ,  B01J20/28045 ,  B01J20/3007 ,  B01J20/3408 ,  B01J20/3441 ,  B01J23/38 ,  Y02A50/235

摘要： It is intended to provide a volatile organic compound treatment apparatus having: an absorption treatment chamber in which absorption frames having absorbents for absorbing volatile organic compounds are aligned in a direction of a gas flow; an absorbent recovery treatment chamber that is provided with a discharge unit having a high voltage electrode, a ground electrode, and a dielectric; and a transfer mechanism for transferring the absorption frames present in an upstream of the gas flow to the absorbent recovery treatment chamber and transferring the absorption frames in the absorbent recovery treatment chamber to a downstream of the gas flow. The volatile organic compound treatment apparatus is capable of decomposing VOC without generating a large amount of harmful NOx and reduced in apparatus cost.

摘要翻译： 旨在提供一种挥发性有机化合物处理装置，其具有吸收处理室，吸收处理室中具有用于吸收挥发性有机化合物的吸收剂的吸收框沿气流方向排列; 吸收剂回收处理室，其设置有具有高压电极，接地电极和电介质的放电单元; 以及传送机构，用于将存在于气流的上游的吸收框传送到吸收剂回收处理室，并将吸收回收处理室中的吸收框转移到气流的下游。 挥发性有机化合物处理装置能够分解VOC而不产生大量的有害NOx并降低设备成本。

公开(公告)号：US20100108493A1

公开(公告)日：2010-05-06

申请号：US12685358

申请日：2010-01-11

申请人： Noboru WADA ,  Masaki Kuzumoto ,  Yasutaka Inanaga

发明人： Noboru WADA ,  Masaki Kuzumoto ,  Yasutaka Inanaga

IPC分类号： C01B13/11

CPC分类号： C01B13/11 ,  C01B2201/12 ,  C01B2201/22 ,  C01B2201/34 ,  C01B2201/64

摘要： An ozone generating apparatus is provided which includes a pair of electrodes for producing a discharge by the application of an ac voltage therebetween, and at least one dielectric provided between the pair of electrodes. A source gas containing oxygen is provided into a discharge space in which the discharge is produced to generate ozone by the action of the discharge. A surface lying between at least one of the pair of electrodes and the discharge space and in contact with the discharge has a surface resistivity of 104 Ω to 1011 Ω. The source gas provided into the discharge space includes ultrapure oxygen having a purity of not less than 99.9%.

摘要翻译： 提供一种臭氧发生装置，其包括一对用于通过施加交流电压产生放电的电极和设置在所述一对电极之间的至少一个电介质。 含有氧的源气体被提供到放电空间中，在放电空间中产生放电，以通过放电的作用产生臭氧。 位于一对电极中的至少一个与放电空间之间并与放电接触的表面具有104和OHgr的表面电阻率; 至1011＆OHgr。 设置在放电空间中的源气体包括纯度不低于99.9％的超纯氧。

公开(公告)号：US06955178B1

公开(公告)日：2005-10-18

申请号：US10626517

申请日：2003-07-25

申请人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

发明人： Masaki Kuzumoto ,  Seiji Noda ,  Izumi Oya ,  Makoto Miyamoto ,  Hideo Horibe ,  Tatsuo Kataoka ,  Tetsuji Oishi

IPC分类号： B08B7/00 ,  C23G5/00 ,  G03F7/42 ,  H01L21/00 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  B08B5/00 ,  H01L21/461

CPC分类号： H01L21/6708 ,  B08B7/00 ,  G03F7/422 ,  Y10S134/902

摘要： A substrate treatment apparatus includes a substrate heating device for maintaining a substrate at a temperature higher than room temperature, a wetting device for producing a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution, and a supply device for supplying the wet ozone-containing gas from the wetting device to a work object on a surface of the substrate. The supply device includes a gas disperser including apertures aligned in rows in a width direction of the work object. The apertures in adjacent rows are not aligned with each other in a direction perpendicular to the rows. At least one of the gas disperser and the substrate is movable in a direction perpendicular to the rows. A gas conduit connects the wetting device to the supply device. A wet ozone-containing gas heating device heats the wet ozone-containing gas to a temperature at least equal to the temperature of the substrate.

摘要翻译： 一种基板处理装置，具备：将基板保持在比室温以上的温度下的基板加热装置，通过用处理液润湿含臭氧的气体来生产含湿臭氧的气体的润湿装置，以及供给装置 来自润湿装置的湿臭氧的气体到基板表面上的工件。 供给装置包括气体分散器，其包括在工作对象的宽度方向上成行排列的孔。 相邻行中的孔在垂直于行的方向上彼此不对齐。 气体分散器和基板中的至少一个可以在垂直于行的方向上移动。 气体管道将润湿装置连接到供应装置。 含湿臭氧的气体加热装置将含湿臭氧的气体加热至至少等于基板温度的温度。