公开(公告)号：US20060274292A1

公开(公告)日：2006-12-07

申请号：US11495767

申请日：2006-07-31

Applicant: Noriyasu Hasegawa ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Shigeru Terashima

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70883 ,  G03F7/70908

Abstract: An exposure apparatus for exposing a substrate to exposure light via a pattern of a mask. The apparatus includes a stage configured to hold one of the substrate and the mask, and to move, a projection optical system configured to project the pattern onto the substrate, a defining member facing the stage and configured to define a space, between the stage and the projection optical system, through which the exposure light passes and which is to be filled with fluid, a first stream mechanism having a first supply port in the defining member and configured to stream the fluid through the space from the first supply port, an exhaust mechanism having an exhaust port in the defining member and configured to exhaust fluid in the space from the exhaust port, and a second stream mechanism having a second supply port different from the first supply port. The second supply port is arranged to surround the space at a lower portion of the defining member, and configured to stream fluid from the second supply port against the stage to seal the space.

Abstract translation: 一种曝光装置，用于经由掩模图案使基板曝光于曝光光。 该装置包括一个被配置为保持基板和掩模中的一个并且移动的台，配置成将图案投影到基板上的投影光学系统，面向台的限定构件，并且被配置为在台架和 投射光学系统，曝光光通过该透镜并且被填充流体;第一流机构，其具有在限定构件中的第一供应口，并且构造成使流体从第一供应口流过空间;排气 所述机构在所述限定部件中具有排气口，并且构造成从所述排气口排出所述空间中的流体;以及第二流体机构，其具有与所述第一供给口不同的第二供给口。 第二供应口被布置成围绕限定构件的下部周围的空间，并且构造成将来自第二供应口的流体压靠在台上以密封空间。

公开(公告)号：US06750946B2

公开(公告)日：2004-06-15

申请号：US09897930

申请日：2001-07-05

Applicant: Yutaka Tanaka ,  Shigeru Terashima ,  Shinichi Hara

Inventor： Yutaka Tanaka ,  Shigeru Terashima ,  Shinichi Hara

IPC: G03B2752

CPC classification number: H01L21/67196 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70866 ,  H01L21/67017 ,  H01L21/67201 ,  Y10T29/41

Abstract: A substrate processing system has a first processing device which processes a substrate with a first process in a first gas atmosphere within a process chamber and a transfer device that transfers a substrate in a second gas atmosphere within a clean booth, the transfer device transferring a substrate which has been processed with a second process by a second processing device or a substrate which is to be processed by that second processing device. A load-lock chamber has a substrate transfer path between the first processing device and the transfer device and there is a gas supply device which supplies the first gas from the process chamber to the load-lock chamber when the substrate is transferred between the load-lock chamber and a first processing device, and supplies the second gas from the clean booth to the load-lock chamber when the substrate is transferred between the load-lock chamber and the transfer device.

Abstract translation: 基板处理系统具有第一处理装置，其处理处理室内的第一气体气氛中的第一处理的基板和在清洁室内将第二气体气氛中的基板转印的转印装置，所述转印装置将基板 其通过第二处理装置或将被该第二处理装置处理的基板的第二处理进行处理。 负载锁定室具有在第一处理装置和转印装置之间的基板传送路径，并且存在一个气体供应装置，当基板在载荷传递装置之间传送时，将第一气体从处理室供应到装载锁定室， 锁定室和第一处理装置，并且当衬底在负载锁定室和转移装置之间传送时，将来自清洁室的第二气体供应到负载锁定室。

公开(公告)号：US06721032B2

公开(公告)日：2004-04-13

申请号：US10207248

申请日：2002-07-30

Applicant: Noriyasu Hasegawa ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Shigeru Terashima

IPC: G03B2752

CPC classification number: G03F7/70933 ,  G03B27/52 ,  G03F7/70191 ,  G03F7/70358 ,  G03F7/70558

Abstract: An exposure apparatus includes an illumination optical system which illuminates a pattern formed on a mask with light from a light source, a movable mask stage for holding the mask, a projection optical system which guides light from a pattern of the mask to a wafer, a movable wafer stage for holding the wafer, a shielding member which forms an optical path space including an optical path of exposure light and a space surrounding the optical path space at, of a space through which the exposure light passes, at least one portion between the illumination optical system and the mask stage, between the mask stage and the projection optical system, or between the protection optical system and the wafer stage, a first gas supply device for supplying an inert gas to the optical path space, a chamber surrounding the wafer stage, the projection optical system and the shielding member, and a reduction device for reducing a change in total light quantity of the exposure light reaching the wafer that is caused by movement of at least one of the mask stage and the wafer stage.

Abstract translation: 曝光装置包括照明光学系统，其利用来自光源的光照射掩模上形成的图案，用于保持掩模的可移动掩模台，将光从掩模的图案引导到晶片的投影光学系统， 用于保持晶片的可移动晶片台，形成包括曝光光的光路的光路空间和围绕曝光光通过的空间周围的光路空间的空间的屏蔽部件，其中， 照明光学系统和掩模台之间，在掩模台和投影光学系统之间，或保护光学系统和晶片台之间，用于向光路空间供应惰性气体的第一气体供应装置，围绕晶片的腔室 投影光学系统和屏蔽构件，以及用于减少到达晶片t的曝光的总光量变化的还原装置 帽子由掩模台和晶片台中的至少一个的移动引起。

公开(公告)号：US06721031B2

公开(公告)日：2004-04-13

申请号：US10167692

申请日：2002-06-13

Applicant: Noriyasu Hasegawa ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Shigeru Terashima

IPC: G03B2752

CPC classification number: G03F7/70933 ,  G03B27/52

Abstract: This invention shortens a time required to purge, with inert gas, gas in a space (optical path space) through which exposure light passes, such as a space between a projection optical system and a substrate. The exposure apparatus includes a wafer stage (102), a projection optical system (101), and an air supply portion (112) which supplies inert gas at a nonuniform flow velocity to an optical path space (113) through which exposure light passes between the wafer stage (102) and the projection optical system (101). A downward flow of inert gas is formed.

Abstract translation: 本发明缩短了曝光光通过的空间（光路空间）中的惰性气体吹扫所需的时间，例如投影光学系统和基板之间的空间。 曝光装置包括晶片台（102），投影光学系统（101）和空气供应部分（112），其以不均匀的流速提供惰性气体到曝光光线通过的光路空间（113） 晶片台（102）和投影光学系统（101）。 形成向下的惰性气体流。

公开(公告)号：US06463119B1

公开(公告)日：2002-10-08

申请号：US09589812

申请日：2000-06-09

Applicant: Shigeru Terashima ,  Takeshi Miyachi ,  Yutaka Watanabe ,  Kazuyuki Kasumi

Inventor： Shigeru Terashima ,  Takeshi Miyachi ,  Yutaka Watanabe ,  Kazuyuki Kasumi

IPC: G21K500

CPC classification number: G03F7/70066

Abstract: An exposure apparatus for exposing a photosensitive substrate to a pattern on a mask within an exposure view angle to transfer the pattern onto the photosensitive substrate using X-ray as exposure radiation, wherein exposure light on the mask is limited by a light blocking plate for blocking the exposure radiation, thus accomplishing efficient manufacturing of the semiconductor devices.

Abstract translation: 一种曝光装置，用于将感光基片曝光于曝光视角下的掩模上的图案，以使用X射线作为曝光辐射将图案转印到感光基片上，其中掩模上的曝光光被遮光板遮挡 曝光辐射，从而实现半导体器件的高效制造。

公开(公告)号：US06225637B1

公开(公告)日：2001-05-01

申请号：US08954520

申请日：1997-10-20

Applicant: Shigeru Terashima ,  Masato Muraki ,  Masahiko Okunuki ,  Akira Miyake ,  Shin Matsui

Inventor： Shigeru Terashima ,  Masato Muraki ,  Masahiko Okunuki ,  Akira Miyake ,  Shin Matsui

IPC: H01J37302

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/045 ,  H01J2237/31767

Abstract: An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer via a reduction electron optical system, irradiates collimated electron beams toward an aperture board having an arcuated aperture sandwiched between two arcs having, as the center, the axis of the reduction electron optical system, and exposes the wafer with electron beams having an arcuated sectional shape that have been transmitted through the aperture.

Abstract translation: 一种用于通过还原电子光学系统将由电子束形成的图像投影到晶片上的电子束曝光装置，将准直的电子束照射到具有弧形孔的孔板，该弧形孔夹在两个弧之间，该弧之间以中心为中心 电子光学系统，并且使具有已经透过该孔的弧形截面形状的电子束曝光晶片。

公开(公告)号：US5600698A

公开(公告)日：1997-02-04

申请号：US416097

申请日：1995-04-04

Applicant: Shigeru Terashima ,  Takeshi Miyachi

Inventor： Shigeru Terashima ,  Takeshi Miyachi

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70058 ,  G03F9/70

Abstract: An exposure apparatus for transferring a pattern of a mask onto a substrate, includes a regulating an member for regulating exposure beam from a light source, and an alignment optical system for projecting an alignment beam to an alignment mark of the mask, to perform alignment between the mask and the substrate. The regulating member is arranged to pass the alignment light therethrough. The distance E from the regulating member to the mask satisfies the relationE.gtoreq.(f+m)/2(tan.theta.+tan.gamma.,)where, as viewed from a direction of formation of an edge of the regulating member, .theta. is the angle defined between an optical axis of the alignment beam and an optical axis of the exposure beam, f is the beam width of a portion of the alignment beam passing through the regulating member, .gamma. is the maximum of a divergence angle, in an exposure region, of the exposure beam, and m is the width of the alignment mark.

Abstract translation: 用于将掩模的图案转印到基板上的曝光装置包括调节用于调节来自光源的曝光光束的部件和用于将对准光束投射到掩模的对准标记的对准光学系统，以执行对准 掩模和基材。 调节构件布置成使对准光通过其中。 从限制构件到掩模的距离E满足关系式E> / =（f + m）/ 2（tanθ+tanγγ），其中，从调节构件的边缘的形成方向观察，θ是 在对准光束的光轴和曝光光束的光轴之间限定的角度f是通过调节部件的对准光束的一部分的光束宽度，伽马是曝光中的发散角的最大值 区域，m是对准标记的宽度。

公开(公告)号：US08563950B2

公开(公告)日：2013-10-22

申请号：US13353571

申请日：2012-01-19

Applicant: Takahiro Nakayama ,  Shigeru Terashima

Inventor： Takahiro Nakayama ,  Shigeru Terashima

IPC: H01J37/317 ,  G03F7/20 ,  H01L31/18 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70841 ,  G03F7/70925 ,  H01J37/3174 ,  H01J2237/022

Abstract: An energy beam drawing apparatus includes a member, positioned between an energy beam source and a substrate, on which a deposit is deposited and a removing unit which removes the deposit. The removing unit includes a catalyst for generating, from a gas, an active species for decomposing the deposit by irradiation with the energy beam, a supplying mechanism for supplying the gas to a position where the active species is generated, and a moving mechanism for moving, when executing processing of removing the deposit, the catalyst to a first position which is irradiated with the energy beam, and moving, when executing drawing processing on the substrate, the catalyst to a second position which is not irradiated with the energy beam.

Abstract translation: 能量束描绘装置包括位于能量束源和衬底之间的构件，沉积物沉积在其上，以及去除沉积物的去除单元。 除去单元包括用于从气体产生用于通过用能量束照射分解沉积物的活性物质的催化剂，用于将气体供给到产生活性物质的位置的供给机构，以及用于移动的移动机构 当执行将所述沉积物去除的处理时，将所述催化剂移动到被所述能量束照射的第一位置，并且当在所述基板上执行拉伸处理时将所述催化剂移动到未被所述能量束照射的第二位置。

公开(公告)号：US20110262866A1

公开(公告)日：2011-10-27

申请号：US13090410

申请日：2011-04-20

Applicant: Takahiro Nakayama ,  Shigeru Terashima ,  Yutaka Watanabe

Inventor： Takahiro Nakayama ,  Shigeru Terashima ,  Yutaka Watanabe

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70925

Abstract: An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.

Abstract translation: 将曝光光从照明原稿的图案投影到基板上的曝光装置包括：投影系统，包括光学元件，并将曝光光投射到基板上;被构造成包围投影系统的外壳;以及清洁机构 被配置为通过在所述外壳内存在氧气的环境下用紫外线照射所述光学元件来清洁所述光学元件，所述清洁机构包括被配置为产生紫外线的光源，所述管状部件包括出射窗， 在光源和光学元件之间包围光路，以及调节装置，其被配置为调节管状部件内的空间的环境，使得在管状部件内的空间中氧的分压变低 在管状构件外。

公开(公告)号：US07738076B2

公开(公告)日：2010-06-15

申请号：US11495767

申请日：2006-07-31

Applicant: Noriyasu Hasegawa ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Shigeru Terashima

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70883 ,  G03F7/70908

Abstract: An exposure apparatus for exposing a substrate to exposure light via a pattern of a mask. The apparatus includes a stage configured to hold one of the substrate and the mask, and to move, a projection optical system configured to project the pattern onto the substrate, a defining member facing the stage and configured to define a space, between the stage and the projection optical system, through which the exposure light passes and which is to be filled with fluid, a first stream mechanism having a first supply port in the defining member and configured to stream the fluid through the space from the first supply port, an exhaust mechanism having an exhaust port in the defining member and configured to exhaust fluid in the space from the exhaust port, and a second stream mechanism having a second supply port different from the first supply port. The second supply port is arranged to surround the space at a lower portion of the defining member, and configured to stream fluid from the second supply port against the stage to seal the space.

Abstract translation: 一种曝光装置，用于经由掩模图案使基板曝光于曝光光。 该装置包括一个被配置为保持基板和掩模中的一个并且移动的台，配置成将图案投影到基板上的投影光学系统，面向台的限定构件，并且被配置为在台架和 投射光学系统，曝光光通过该透镜并且被填充流体;第一流机构，其具有在限定构件中的第一供应口，并且构造成使流体从第一供应口流过空间;排气 所述机构在所述限定部件中具有排气口，并且构造成从所述排气口排出所述空间中的流体;以及第二流体机构，其具有与所述第一供给口不同的第二供给口。 第二供应口被布置成围绕限定构件的下部周围的空间，并且构造成将来自第二供应口的流体压靠在台上以密封空间。