公开(公告)号：US07495779B2

公开(公告)日：2009-02-24

申请号：US12031223

申请日：2008-02-14

申请人： Riki Ogawa

发明人： Riki Ogawa

IPC分类号： G01B11/00 ,  G01B11/14 ,  G02B27/40

CPC分类号： G02B7/32 ,  G01N21/9501

摘要： A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors.

摘要翻译： 电平检测装置包括形成有使得照明光通过的矩形第一开口的照明狭缝，被配置为通过照射光照射目标物体表面的光学系统，并且聚焦来自目标物体表面的反射光 第一和第二检测狭缝，其布置在焦点的前面和后面，并且每个检测狭缝形成有第二开口，使得矩形的短边短于由 所述照明狭缝和所述矩形的长边大于所述照明狭缝图像的长边，被配置为检测通过所述第一和第二检测狭缝的反射光的光量的第一和第二光量传感器，以及计算 被配置为基于来自第一和第二光量传感器的输出来计算目标物体表面的等级。

公开(公告)号：US20080239290A1

公开(公告)日：2008-10-02

申请号：US12047554

申请日：2008-03-13

申请人： Toshiyuki WATANABE ,  Riki Ogawa

发明人： Toshiyuki WATANABE ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

摘要翻译： 提供了能够进行高检测灵敏度的缺陷检查的掩模版缺陷检查装置。 该装置包括用于利用第一检查光照射样品的一个表面的透射照明的光学系统，用第二检查光照射样品的另一个表面的反射照明的光学系统，以及可以同时检测的检测光学系统 通过第一检查光通过样品而获得的透射光和由第二检查光获得的反射光被样品反射。 并且透射照明的光学系统包括用于校正由样品的厚度产生的透射光的焦点偏移的聚焦透镜驱动机构。

公开(公告)号：US20080259328A1

公开(公告)日：2008-10-23

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi HIRANO ,  Riki Ogawa

发明人： Ryoichi HIRANO ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。

公开(公告)号：US07388660B2

公开(公告)日：2008-06-17

申请号：US11344205

申请日：2006-02-01

申请人： Noboru Kobayashi ,  Riki Ogawa ,  Masayuki Hideshima ,  Hiroyuki Nagahama ,  Koji Nakajima

发明人： Noboru Kobayashi ,  Riki Ogawa ,  Masayuki Hideshima ,  Hiroyuki Nagahama ,  Koji Nakajima

IPC分类号： G01J1/00

CPC分类号： G01J1/36 ,  G01J1/04 ,  G01J1/044 ,  G01J1/18

摘要： A device for measuring the intensity of incoming light is disclosed. This device includes a rotatable light blocking unit which interrupts incident signal light at short regular intervals. The device also includes a light source which emits certain light different from the signal light while the signal light is interrupted by the block unit, and a measurement unit for measuring intensity values of the signal light and the certain light. A correction unit is provided for correcting the measured signal light intensity based on the certain light intensity. A calculator unit calculates a correction value through comparison of the intensity of the certain light to a reference value. The correction unit uses this correction value to correct the signal light intensity.

摘要翻译： 公开了一种用于测量入射光强度的装置。 该装置包括可旋转的光阻挡单元，其以规则间隔的短时间中断入射信号光。 该装置还包括在信号光被块单元中断时发出与信号光不同的特定光的光源，以及用于测量信号光和特定光的强度值的测量单元。 提供校正单元，用于基于特定光强度校正测量的信号光强度。 计算器单元通过将特定光的强度与参考值进行比较来计算校正值。 校正单元使用该校正值来校正信号光强度。

公开(公告)号：US08755040B2

公开(公告)日：2014-06-17

申请号：US13351555

申请日：2012-01-17

申请人： Riki Ogawa

发明人： Riki Ogawa

IPC分类号： G01N21/956 ,  G01N21/95

CPC分类号： G01N21/956 ,  B23K26/066 ,  B23K26/0676 ,  G01N21/9505 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84

摘要： An illuminating apparatus includes a rotating phase plate having a height equal to or less than a wavelength of light from a light source and including a plurality of randomly arranged step regions so as to change a phase of light from the light source by allowing the light beam to pass therethrough; and a fly's eye lens including an array of a plurality of lenses configured to pass the light beam passed through the rotating phase plate, wherein a portion in which a product of a maximum size of the plurality of step regions and an optical magnification from the rotating phase plate to a plane of incidence of the fly's eye lens is equal to or less than an arrangement pitch of the plurality of lenses and a portion in which the product is larger than the arrangement pitch of the plurality of lenses are mixed.

摘要翻译： 一种照明装置，包括：旋转相位板，其具有等于或小于来自光源的光的波长，并且包括多个随机布置的台阶区域，以便通过允许光束来改变来自光源的光的相位 通过; 以及包括配置成使通过所述旋转相位板的光束通过的多个透镜的阵列的蝇眼透镜，其中，所述多个台阶区域中的最大尺寸的乘积和来自所述旋转相位板的光学倍率的部分 相位板与飞眼透镜的入射平面等于或小于多个透镜的排列间距，并且其中产品大于多个透镜的排列间距的部分被混合。

公开(公告)号：US08049897B2

公开(公告)日：2011-11-01

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/55

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。

公开(公告)号：US06909501B2

公开(公告)日：2005-06-21

申请号：US09956010

申请日：2001-09-20

申请人： Riki Ogawa ,  Yasushi Sanada ,  Mitsuo Tabata

发明人： Riki Ogawa ,  Yasushi Sanada ,  Mitsuo Tabata

IPC分类号： G01B11/30 ,  G01N21/956 ,  G03F1/84 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G01N21/88

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T2207/30148

摘要： A pattern inspection apparatus includes a pulse laser light source sequentially generating pulse laser light, an illumination optics applying the pulse laser light onto a mask substrate, an imaging optics collecting light from the mask substrate to form an image thereof, an area sensor sensing the image of the mask substrate obtained by the optics in a rectangular area unit, a comparator comparing image data acquired by the area sensor with previously prepared reference data to detect a defect of a pattern, a stage driving apparatus two-dimensionally scanning a stage having the mask substrate placed thereon, and a stage position detector detecting a position of the stage. With the above configuration, it is possible to efficiently inspect the surface of the mask substrate by adequately setting the moving speed of the mask substrate and the sensing timing of the sensing apparatus.

摘要翻译： 图案检查装置包括顺序产生脉冲激光的脉冲激光光源，将脉冲激光施加到掩模基板上的照明光学器件，从掩模基板收集光以形成其图像的成像光学元件，感测图像的区域传感器 通过光学器件以矩形区域单位获得的掩模基板，比较器，将由区域传感器获取的图像数据与预先准备的参考数据进行比较，以检测图案的缺陷;平台驱动装置，二维地扫描具有掩模 放置在其上的基板，以及检测台的位置的台位置检测器。 利用上述结构，可以通过适当地设定掩模基板的移动速度和感测装置的检测定时来有效地检查掩模基板的表面。

公开(公告)号：US20110096324A1

公开(公告)日：2011-04-28

申请号：US12985849

申请日：2011-01-06

申请人： Toshiyuki WATANABE ,  Riki Ogawa

发明人： Toshiyuki WATANABE ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

摘要翻译： 提供了能够进行高检测灵敏度的缺陷检查的掩模版缺陷检查装置。 该装置包括用于利用第一检查光照射样品的一个表面的透射照明的光学系统，用第二检查光照射样品的另一个表面的反射照明的光学系统，以及可以同时检测的检测光学系统 通过第一检查光通过样品而获得的透射光和由第二检查光获得的反射光被样品反射。 并且透射照明的光学系统包括用于校正由样品的厚度产生的透射光的焦点偏移的聚焦透镜驱动机构。

公开(公告)号：US07894051B2

公开(公告)日：2011-02-22

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US07491959B2

公开(公告)日：2009-02-17

申请号：US11526638

申请日：2006-09-26

申请人： Riki Ogawa ,  Soichiro Mitsui

发明人： Riki Ogawa ,  Soichiro Mitsui

IPC分类号： G01V8/00

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N2021/8841 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/7065

摘要： A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.

摘要翻译： 缺陷检查装置包括在掩模的检查对象面上设置透射照明区域和反射照明区域的照明光学系统，具有设置在检查对象面上的第一和第二视野的第一和第二摄像单元， 成像光学系统，其提供第一和第二视野上存在于第一和第二成像单元上的图像;缺陷检测单元，其基于第一和第二成像上提供的图像检测掩模的缺陷; 控制单元，其控制透射照明区域和反射照明区域的设定位置和第一和第二视野的设定位置之间的位置关系。