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    Positive photosensitive resin composition and method for forming pattern
    21.
    发明申请
    Positive photosensitive resin composition and method for forming pattern 有权
    正型感光性树脂组合物及其形成方法

    公开(公告)号：US20090208868A1

    公开(公告)日：2009-08-20

    申请号：US11988557

    申请日：2006-07-11

    申请人： Masaki Okazaki ,  Hitoshi Ohnishi ,  Wataru Yamashita

    发明人： Masaki Okazaki ,  Hitoshi Ohnishi ,  Wataru Yamashita

    IPC分类号： G03F7/004 ,  C08G69/08 ,  G03F7/20

    CPC分类号： C08L79/08 ,  C08G73/10 ,  C08G73/1032 ,  C08G73/1075 ,  C08G73/1082 ,  C08K5/06 ,  G03F7/0233 ,  G03F7/0392 ,  H05K3/287 ,  Y10S430/107

    摘要： A positive photosensitive resin composition containing 100 parts by weight of a polyimide precursor (A) having a constituent unit represented by the formula (1), 15 to 25 parts by weight of a crosslinking agent (B) represented by the formula (2), and 2 to 5 parts by weight of a photosensitizer (C) generating acid upon irradiation of an actinic ray: wherein m is an integer of 1 or greater, and R is an aromatic group or an aliphatic group having a valency of 1 or higher. The positive photosensitive resin composition can be developed by using an aqueous solution of alkali metal carbonate, is capable of forming micropatterns, and has excellent thermal resistance and the like. A method for forming a positive pattern, and uses thereof are also provided.

    摘要翻译： 含有100重量份具有由式（1）表示的结构单元的聚酰亚胺前体（A），15-25重量份由式（2）表示的交联剂（B）的正性感光性树脂组合物， 和2〜5重量份的光敏剂（C），其在光化射线照射时产生酸：其中m为1以上的整数，R为芳族基或1价以上的脂肪族基。 正型感光性树脂组合物可以通过使用碱金属碳酸盐的水溶液显影，能够形成微图案，并且具有优异的耐热性等。 还提供了形成正图案的方法及其用途。

    Positive photosensitive resin composition and method for forming pattern
    24.
    发明授权
    Positive photosensitive resin composition and method for forming pattern 有权
    正型感光性树脂组合物及其形成方法

    公开(公告)号：US07666573B2

    公开(公告)日：2010-02-23

    申请号：US11988557

    申请日：2006-07-11

    申请人： Masaki Okazaki ,  Hitoshi Ohnishi ,  Wataru Yamashita

    发明人： Masaki Okazaki ,  Hitoshi Ohnishi ,  Wataru Yamashita

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： C08L79/08 ,  C08G73/10 ,  C08G73/1032 ,  C08G73/1075 ,  C08G73/1082 ,  C08K5/06 ,  G03F7/0233 ,  G03F7/0392 ,  H05K3/287 ,  Y10S430/107

    摘要： A positive photosensitive resin composition containing 100 parts by weight of a polyimide precursor (A) having a constituent unit represented by the formula (1), 15 to 25 parts by weight of a crosslinking agent (B) represented by the formula (2), and 2 to 5 parts by weight of a photosensitizer (C) generating acid upon irradiation of an actinic ray: wherein m is an integer of 1 or greater, and R is an aromatic group or an aliphatic group having a valency of 1 or higher. The positive photosensitive resin composition can be developed by using an aqueous solution of alkali metal carbonate, is capable of forming micropatterns, and has excellent thermal resistance and the like. A method for forming a positive pattern, and uses thereof are also provided.

    摘要翻译： 含有100重量份具有由式（1）表示的结构单元的聚酰亚胺前体（A），15-25重量份由式（2）表示的交联剂（B）的正性感光性树脂组合物， 和2〜5重量份的光敏剂（C），其在光化射线照射时产生酸：其中m为1以上的整数，R为芳族基或1价以上的脂肪族基。 正型感光性树脂组合物可以通过使用碱金属碳酸盐的水溶液显影，能够形成微图案，并且具有优异的耐热性等。 还提供了形成正图案的方法及其用途。

    Polyamic acid, polyimide, process for producing these, and film of the polyimide
    26.
    发明授权
    Polyamic acid, polyimide, process for producing these, and film of the polyimide 有权
    聚酰胺酸，聚酰亚胺，其制造方法和聚酰亚胺薄膜

    公开(公告)号：US06710160B2

    公开(公告)日：2004-03-23

    申请号：US10088481

    申请日：2002-03-20

    申请人： Wataru Yamashita ,  Katsuji Watanabe ,  Hideaki Oikawa ,  Hisato Ito

    发明人： Wataru Yamashita ,  Katsuji Watanabe ,  Hideaki Oikawa ,  Hisato Ito

    IPC分类号： C08G7310

    CPC分类号： G01N33/54346 ,  C08G73/10 ,  C08G73/1082

    摘要： Disclosed are a polyamic acid having repeating units represented by the formula (1): wherein the norbornane skeleton of comprises four components of and their contents satisfy the following: 1%≦2,5-[diexo]≦90%, 1%≦2,5-[exo,endo]≦90%, 1%≦2,6-[diexo]≦90%, 1% ≦2,6-[exo,endo]≦90%, provided that (2,5-[diexo])+(2,5-[exo,endo])+(2,6-[diexo])+(2,6-[exo,endo])=100%, R represents from 4 to 27 carbon atoms, and represents a tetravalent group selected from the group consisting of an aliphatic group, a monocyclic aliphatic group, a condensed polycyclic aliphatic group, a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aliphatic or aromatic group which is composed of cycloaliphatic or aromatic groups mutually bonded to each other either directly or via a crosslinking member; and a polyimide which is obtained by imidizing the polyamic acid and which has good properties intrinsic to polyimides, or that is, thermal resistance, mechanical properties, slidability, low water absorption, electric properties and radiation resistance intrinsic thereto. By varying the composition ratio of the starting diamine isomers, various polyimides having controlled thermal resistance, melt flowability, optical properties, chemical resistance and electric properties and capable of forming films of various forms can be obtained.

    摘要翻译： 公开了具有由式（1）表示的重复单元的聚酰胺酸：其中含有四种成分及其含量的降冰片烷骨架满足以下条件：1％<= 2,5- [阴离子] <= 90％，1％<= 2,5- [外，内] <= 90％，1％<= 2,6- [阴离子] <= 90％，1％<= 2,6- [外，内] <= 90％ 表示4〜27个碳原子，表示选自脂肪族基团，单环脂族基团，缩合多环脂族基团，单环芳香族基团，缩合多环芳香族基团和未缩合的四价基团 由脂环族或芳族基团组成的多环脂肪族或芳香族基团直接或通过交联成分彼此相互结合; 和通过酰亚胺化聚酰胺酸而获得的聚酰亚胺，其具有聚酰亚胺所固有的良好性能，或者其本身具有的热阻，机械性能，滑动性，低吸水性，电性能和耐辐射性。 通过改变起始二胺异构体的组成比，可以获得具有受控热阻，熔体流动性，光学性能，耐化学性和电性能并且能够形成各种形式的膜的各种聚酰亚胺。