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公开(公告)号：US20120162665A1
公开(公告)日：2012-06-28
申请号：US13404749
申请日：2012-02-24
申请人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
发明人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC分类号： G01B11/30
CPC分类号： G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.
摘要翻译： 用于检查基板表面的检查方法和装置包括：由于在多个位置处施加的光，向基板表面施加光，检测散射光或来自基板表面的反射光，以获得多个电信号，提取 在与所述多个电信号中的每一个相互不同的频带中的信号的信号，以及通过所述频带中的多个提取的信号的算术运算处理来计算关于所述衬底的膜的状态的值。
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公开(公告)号：US20120133928A1
公开(公告)日：2012-05-31
申请号：US13378418
申请日：2010-06-09
CPC分类号： G01N21/9501 , G01N2021/8861 , G01N2021/8874
摘要： A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.
摘要翻译： 一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。
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公开(公告)号：US20080237204A1
公开(公告)日：2008-10-02
申请号：US12031232
申请日：2008-02-14
IPC分类号： B23K26/38
CPC分类号： H05K3/0026 , B23K26/066 , B23K26/0732 , B23K26/361 , B23K2101/42 , H05K2203/0557
摘要： A laser beam machining method for a printed circuit board, for enabling to bring the depth of a bottom surface of grooves within an overlap region, which is irradiated with a laser beam, repetitively, to be nearly equal to that of the bottom surface of grooves within other regions, comprises the following steps of: fixing a line beam 4, which is shaped into a rectangular having a length sufficiently larger than its width, in a cross-section perpendicular to a central axis thereof; executing a belt-like machining on a certain region of the printed circuit board 6, while moving a mask 1 and the printed circuit board 6 in opposite directions, in a direction of the width of the line beam 4 (i.e., X-direction); and thereafter moving the mask 1 and the printed circuit board 6, relatively, into a direction perpendicular to the belt-like machining direction, and repeating the belt-like machining upon other region, newly, thereby machining a groove on the printed circuit board 6, wherein when repeating the machining overlapping the regions, the machining is conducted with using the line beam 4 being shaped to be oblique on its overlapping side, to be overlapped on that region.
摘要翻译： 一种用于印刷电路板的激光束加工方法，其能够使被激光束照射的重叠区域内的凹槽的底面的深度重复地与槽的底面的深度相等 在其他区域内，包括以下步骤：在垂直于其中心轴线的横截面中固定成形为具有足够大于其宽度的长度的矩形的线束4; 在沿着线束4的宽度方向（即X方向）移动掩模1和印刷电路板6的相反方向上，在印刷电路板6的某个区域上执行带状加工， ; 然后将掩模1和印刷电路板6相对地移动到垂直于带状加工方向的方向上，并且重新进行其他区域的带状加工，从而在印刷电路板6上加工凹槽 其中，当重复所述加工与所述区域重叠时，使用在其重叠侧成形为倾斜的线束4进行加工，以在该区域上重叠。
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公开(公告)号：US06552771B1
公开(公告)日：2003-04-22
申请号：US09461730
申请日：1999-12-16
申请人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
发明人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
IPC分类号： G02F11336
CPC分类号： G02F1/1333 , G02F1/1309
摘要： An image display device for repairing a scratch or scratches on a surface or surfaces of a light transmitting member having an image display section such an extent that the presence of the scratch or scratches cannot be visually perceived at at least in a bright view distance in all directions, and in which device a liquid filler having a refractive index equivalent to or on the same order of that of the light transmitting member is locally filled only into an area of the scratch or scratches, and the filler is cured. By controlling an amount of the filler so that a difference in level between a surface of the light transmitting member and a surface of the filler is at least ±5.0 &mgr;m or less and that an angle defined between a surface of the filler and a surface of the light transmitting member is at least 45 degrees or less or preferably at least 10 degrees or less, it is possible to exhibit display quality to such a degree that the presence of the scratch or scratches cannot be recognized.
摘要翻译： 一种图像显示装置，用于修复具有图像显示部分的光透射部件的表面或划痕上的划痕或划痕，其程度使得在至少所有的亮视距离中不能视觉地感觉划痕或划痕的存在 方向，并且在该装置中，具有与透光构件的折射率相同或相同的折射率的液体填充剂局部地填充到划痕或划痕的区域中，并且填料被固化。 通过控制填充剂的量使得透光构件的表面与填料的表面之间的水平差异至少为±5.0μm或更小，并且在填料的表面和表面之间限定的角度 透光构件为至少45度以下，优选为10度以下，可以显示出不能识别出划痕或划痕的程度的显示质量。
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公开(公告)号：US09041921B2
公开(公告)日：2015-05-26
申请号：US13519138
申请日：2011-01-17
CPC分类号： G01N21/9501 , G01N21/47
摘要： A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.
摘要翻译： 缺陷检查装置具有：利用照明光照射检查对象物的规定区域的照明光学系统; 检测光学系统，其具有检测器，该检测器设置有多个像素，通过该检测器能够检测来自照明光学系统的照明光来自检查对象物的预定区域的散射光; 以及信号处理部，其具有校正部，该校正部基于由检测光学系统的检测器检测到的散射光，相对于检测信号校正与垂直于检查对象的表面的方向的变化引起的像素位移 以及缺陷确定部分，其基于由校正部分校正的检测信号来确定检查对象的表面上的缺陷。
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公开(公告)号：US08654350B2
公开(公告)日：2014-02-18
申请号：US13672742
申请日：2012-11-09
申请人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
发明人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC分类号： G01B11/30
CPC分类号： G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.
摘要翻译： 用于检查基板表面的检查方法和装置包括将光照射到具有膜的基板表面，从基板表面的多个位置检测散射光或反射光以获得多个电信号， 多个电信号和指示电信号和表面粗糙度之间的关系的数据库，以及基于比较结果的表面粗糙度值的计算。
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公开(公告)号：US20130003052A1
公开(公告)日：2013-01-03
申请号：US13519138
申请日：2011-01-17
IPC分类号： G01N21/956
CPC分类号： G01N21/9501 , G01N21/47
摘要： A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.
摘要翻译： 缺陷检查装置具有：利用照明光照射检查对象物的规定区域的照明光学系统; 检测光学系统，其具有检测器，该检测器设置有多个像素，通过该检测器能够检测来自照明光学系统的照明光来自检查对象物的预定区域的散射光; 以及信号处理部，其具有校正部，该校正部基于由检测光学系统的检测器检测到的散射光，相对于检测信号校正与垂直于检查对象的表面的方向的变化引起的像素位移 以及缺陷确定部分，其基于由校正部分校正的检测信号来确定检查对象的表面上的缺陷。
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公开(公告)号：US20120194807A1
公开(公告)日：2012-08-02
申请号：US13387120
申请日：2010-07-28
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/47
摘要： In order to maximize the effect of signal addition during inspection of foreign substances in wafers, a device structure including line sensors arranged in plural directions is effective. Low-angle detection optical systems that detect light beams in plural azimuth directions, the light beams being scattered in low angle directions among those scattered from a linear area on a sample illuminated by illuminating means, each include a combination of a first imaging lens group (330) and a diffraction grating (340) and a combination of a second imaging lens group (333) and an image detector (350) having a plurality of light receiving surfaces. A signal processing unit processes signals from the image detectors of the low-angle detection optical systems by adding the signals from the light receiving surfaces corresponding between the image detectors.
摘要翻译： 为了最大限度地发挥在晶片中异物检查期间信号增加的效果，包括沿多个方向布置的线传感器的装置结构是有效的。 检测在多个方位方向上的光束的低角度检测光学系统，所述光束在从照明装置照射的样品上的线性区域散射的那些中以低角度方向散射，各自包括第一成像透镜组（ 330）和衍射光栅（340）以及具有多个光接收表面的第二成像透镜组（333）和图像检测器（350）的组合。 信号处理单元通过将来自相应于图像检测器之间的光接收表面的信号相加来处理来自低角度检测光学系统的图像检测器的信号。
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公开(公告)号：US20120092656A1
公开(公告)日：2012-04-19
申请号：US13322935
申请日：2010-06-28
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/8851 , H01L22/12
摘要： Provided is a method for inspecting a defect on a surface of a sample, the method including the steps of comparing a haze signal distribution with a predetermined light intensity distribution to calculate pixel shift amounts of detection signals; and adding up shift corrected detection signals to detect a defect.
摘要翻译： 提供了一种用于检查样品表面上的缺陷的方法，所述方法包括以下步骤：将雾度信号分布与预定光强度分布进行比较，以计算检测信号的像素偏移量; 并加上移位校正检测信号以检测缺陷。
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公开(公告)号：US20120019835A1
公开(公告)日：2012-01-26
申请号：US13146428
申请日：2009-12-15
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8809 , G01N2021/8848 , H01L22/12
摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.
摘要翻译： 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测来进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。
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