公开(公告)号：US06817920B1

公开(公告)日：2004-11-16

申请号：US09688970

申请日：2000-10-16

Applicant: Shinobu Furuta ,  Yoshitaka Kurimoto ,  Kazuhisa Tanaka ,  Tatsuya Taniwaki

Inventor： Shinobu Furuta ,  Yoshitaka Kurimoto ,  Kazuhisa Tanaka ,  Tatsuya Taniwaki

IPC: H01J904

CPC classification number: H01J9/02 ,  H01J61/0732

Abstract: A discharge lamp electrode, a discharge lamp for which the electrode is used, and a method for producing a discharge lamp electrode with increased productivity are disclosed. With the disclosed discharge lamp electrode, deformations in its end portion are suppressed, so that the electrode life is extended. For the discharge lamp electrode 106, tungsten wires are wound around an electrode rod 111 in the same turning direction and form a first-layer coil 112 and a second-layer coil 113. A tungsten wire forming the second-layer coil 113 is wound along a spiral valley between adjacent turns in the first-layer coil 112.

Abstract translation: 公开了一种放电灯电极，使用该电极的放电灯以及生产率提高的放电灯电极的制造方法。 利用所公开的放电灯电极，其端部的变形被抑制，使得电极寿命延长。 对于放电灯电极106，钨丝以相同的转动方向缠绕在电极棒111周围，形成第一层线圈112和第二层线圈113.形成第二层线圈113的钨丝沿着 在第一层线圈112中的相邻匝之间的螺旋形谷。

公开(公告)号：US06689282B2

公开(公告)日：2004-02-10

申请号：US10198873

申请日：2002-07-19

Applicant: Aaron R. Wilson

Inventor： Aaron R. Wilson

IPC: H01J904

CPC classification number: H01J9/025

Abstract: A method of forming emitter tips for use in a field emission array is disclosed. The tips are formed by utilizing a polymer residue that forms during the dry etch sharpening step to hold the mask caps in place on the emitter tips. The residue polymer continues to support the mask caps as the tips are over-etched, enabling the tips to be etched past sharp without losing their shape and sharpness. The dry etch utilizes an etchant comprised of fluorine and chlorine gases. The mask caps and residue polymer are easily removed after etching by washing the wafers in a wash of deionized water, or Buffered Oxide Etch.

Abstract translation: 公开了一种形成用于场致发射阵列的发射极尖端的方法。 尖端通过利用在干蚀刻锐化步骤期间形成的聚合物残余物形成，以将掩模帽保持在发射器尖端上的适当位置。 当尖端被过蚀刻时，残余聚合物继续支撑掩模帽，使得尖端能够被锐利地蚀刻而不会损失它们的形状和锐度。 干蚀刻使用由氟和氯气组成的蚀刻剂。 通过在去离子水或缓冲氧化物蚀刻的洗涤中洗涤晶片，蚀刻后容易除去掩模盖和残余聚合物。

公开(公告)号：US06676845B2

公开(公告)日：2004-01-13

申请号：US10200850

申请日：2002-07-22

Applicant: Joel M. Frendt

Inventor： Joel M. Frendt

IPC: H01J904

CPC classification number: B82Y30/00 ,  B82Y10/00 ,  G02F1/13394 ,  H01J9/025 ,  Y10S438/945 ,  Y10T428/24372 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/256

Abstract: A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.

Abstract translation: 用于形成具有不连续规则图案的蚀刻掩模的方法使用珠，其中每个具有由可移除的间隔物涂层覆盖的基本上不可取的芯。 具有芯和间隔层的珠粒作为六边形填充单层分配到目标层上的热粘合层上。 珠子通过小珠限制壁保持在适当位置。 在促进珠的六边形填充的振动步骤之后，加热所得组件，使得珠粘附到粘合剂层。 然后丢弃多余的珠子。 然后从每个珠粒中除去间隔壳材料，留下核心蚀刻掩模。 然后将核心掩蔽的目标层进行等离子体蚀刻，以在每个核心的正下方形成目标材料柱。 核心和核心下面的任何间隔物材料被去除。 所得到的靶材料的圆形岛可以在下层的湿各向同性蚀刻期间用作蚀刻掩模。

公开(公告)号：US06660173B2

公开(公告)日：2003-12-09

申请号：US10153195

申请日：2002-05-22

Applicant: Aaron R. Wilson

Inventor： Aaron R. Wilson

IPC: H01J904

CPC classification number: H01J9/025

Abstract: A method of forming emitter tips for use in a field emission array is disclosed. The tips are formed by utilizing a polymer residue that forms during the dry etch sharpening step to hold the mask caps in place on the emitter tips. The residue polymer continues to support the mask caps as the tips are over-etched, enabling the tips to be etched past sharp without losing their shape and sharpness. The dry etch utilizes an etchant comprised of fluorine and chlorine gases. The mask caps and residue polymer are easily removed after etching by washing the wafers in a wash of deionized water, or Buffered Oxide Etch.

公开(公告)号：US06648712B2

公开(公告)日：2003-11-18

申请号：US10263580

申请日：2002-10-02

Applicant: Sung-Yool Choi ,  Mun-Cheol Paek ,  Kyoung-Ik Cho ,  Jeen Hur ,  Gi-Pyung Han

Inventor： Sung-Yool Choi ,  Mun-Cheol Paek ,  Kyoung-Ik Cho ,  Jeen Hur ,  Gi-Pyung Han

IPC: H01J904

CPC classification number: H01J3/022 ,  H01J31/127

Abstract: A triode-type field emission device includes an insulating substrate; a cathode formed on the insulating substrate; a field emitter aligned on the cathode, wherein the field emitter includes a plurality of emitter tips and each emitter tip has the diameter of nanometers; an insulating layer positioned around the field emitter for electrically isolating the field emitter; and a gate electrode formed on the insulating layer, wherein the gate electrode is closed to an upper portion of the field emitter. Therefore, the triode-type field emission device may be operable in a low voltage.

公开(公告)号：US06562438B1

公开(公告)日：2003-05-13

申请号：US09482189

申请日：2000-01-12

Applicant: Joel M. Frendt

Inventor： Joel M. Frendt

IPC: H01J904

CPC classification number: B82Y30/00 ,  B82Y10/00 ,  G02F1/13394 ,  H01J9/025 ,  Y10S438/945 ,  Y10T428/24372 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/256

Abstract: A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer. Such a combination of plasma etching using the bead cores as a primary mask and a wet etch using the islands formed by the plasma etch as a secondary mask may be used to form micropoint cathode emitter tips in an underlying conductive or semiconductive layer.

公开(公告)号：US06554673B2

公开(公告)日：2003-04-29

申请号：US09917663

申请日：2001-07-31

Applicant: Pehr Pehrsson ,  James Butler

Inventor： Pehr Pehrsson ,  James Butler

IPC: H01J904

CPC classification number: B82Y10/00 ,  H01J1/3044 ,  H01J1/312 ,  H01J9/022 ,  H01J9/025 ,  H01J2201/30446 ,  H01J2201/30457

Abstract: A method for fabricating an electron emitter. This emitter structure may be used to form individual emitters or arrays of emitters. The method is comprised of implanting energetic ions into a diamond lattice to form cones or other continuous regions of damaged diamond. These regions are more electrically conducting than the surrounding diamond lattice, and have locally sharp tips at or near the point of entry of the ion into the diamond. The tips may then also be additionally coated with a layer of a wide band-gap semiconductor. An electrically conducting material may also be placed in proximity to the tips to generate an electric field sufficient to extract electrons from the conducting tips into either the region above the surface, or into the wide band-gap semiconductor layer in contact with the tips. Electrical contact is made to the electrically conducting damage tracks and the electrical circuit may be completed with an electrically conducting material on the surface of the wide band-gap semiconductor or diamond, or in the ambient above the surface of the emitter. The surface of the wideband gap semiconductor or diamond may be chemically modified to enhance the emission of electrons from the surface.

Abstract translation: 一种制造电子发射器的方法。 该发射器结构可以用于形成发射器的单独发射器或阵列。 该方法包括将能量离子注入到金刚石晶格中以形成损坏金刚石的锥体或其它连续区域。 这些区域比周围的金刚石晶格更具导电性，并且在离子进入金刚石的位置处或附近具有局部尖锐的尖端。 然后可以另外涂覆一层宽带隙半导体的尖端。 还可以将导电材料放置在靠近尖端处以产生足以将电子从导电尖端引入到表面上方的区域中的电场，或者与尖端接触的宽带隙半导体层中。 对导电损伤轨道进行电接触，并且电路可以在宽带隙半导体或金刚石的表面上或在发射器表面上的环境中的导电材料完成。 宽带隙半导体或金刚石的表面可以被化学修饰以增强从表面发射电子。

公开(公告)号：US06464551B1

公开(公告)日：2002-10-15

申请号：US09583404

申请日：2000-05-31

Applicant: Don Mark Lipkin ,  Carl Edward Erikson ,  Bernard Patrick Bewlay ,  Dennis Joseph Dalpe

Inventor： Don Mark Lipkin ,  Carl Edward Erikson ,  Bernard Patrick Bewlay ,  Dennis Joseph Dalpe

IPC: H01J904

CPC classification number: H01K7/02 ,  H01J1/18 ,  H01J9/04 ,  H01K1/14

Abstract: A filament comprises a generally thin metal component, such as a sheet, ribbon, or foil. The filament comprises at least one emitter, at least one current-condensing structure and a tab on each end of the at least one emitter. Each tab is connectable to a support system, comprising for example a lead and attachment post. When a current is passed through the filament, the current-condensing structure establishes current flow through the filament resulting in a desired temperature distribution across the emitter, for example a substantially uniform temperature distribution. A predictive tool for determining a geometry of a filament to provide a desired temperature distribution is set forth. The filament may be curved, and methods and systems for providing a curved filament are also provided. Attachment systems are further disclosed for attaching an emitter to a support structure.

Abstract translation: 长丝包括通常薄的金属部件，例如片，带或箔。 灯丝包括至少一个发射器，至少一个电流冷凝结构和至少一个发射器的每个端部上的突出部。 每个标签可连接到支撑系统，包括例如引线和附接柱。 当电流通过灯丝时，电流冷凝结构建立通过灯丝的电流，导致跨过发射器的所需温度分布，例如基本均匀的温度分布。 阐述了用于确定细丝几何形状以提供所需温度分布的预测工具。 丝可以是弯曲的，并且还提供了用于提供弯曲细丝的方法和系统。 进一步公开了用于将发射器附接到支撑结构的附接系统。