APPARATUSES AND METHODS FOR CALIBRATING ADJUSTABLE IMPEDANCES OF A SEMICONDUCTOR DEVICE

    公开(公告)号:US20190334505A1

    公开(公告)日:2019-10-31

    申请号:US16505369

    申请日:2019-07-08

    发明人: Dean Gans

    摘要: Apparatuses and methods for calibrating adjustable impedances of a semiconductor device are disclosed in the present application. An example apparatus includes a register configured to store impedance calibration information and further includes programmable termination resistances having a programmable impedance. The example apparatus further includes an impedance calibration circuit configured to perform a calibration operation to determine calibration parameters for setting the programmable impedance of the programmable termination resistances. The impedance calibration circuit is further configured to program the impedance calibration information in the register related to the calibration operation.

    Switch
    23.
    发明授权
    Switch 有权

    公开(公告)号:US10418984B2

    公开(公告)日:2019-09-17

    申请号:US15631591

    申请日:2017-06-23

    发明人: Winfried Bakalski

    摘要: A switch includes an input terminal, an output terminal, and a stack including transistors, such as, for example, field effect transistors, coupled in series, the stack being coupled between the input terminal and the output terminal. The switch also includes at least one switching element configured to be selectively operated in a conducting state or a non-conducting state, and at least one overvoltage protection element coupled to the stack by the at least one switching element. By way of example, the switch can implement a radio-frequency switch.

    LOW POWER PIN DIODE DRIVER
    25.
    发明申请

    公开(公告)号:US20190214986A1

    公开(公告)日:2019-07-11

    申请号:US16245926

    申请日:2019-01-11

    IPC分类号: H03K17/74 H03H11/28

    摘要: This disclosure relates to apparatus and methods for radio-frequency (RF) switching circuits, and more particularly for a PIN diode driver circuit for high speed, high repetition rate and/or high power applications. The PIN diode driver may include a dual voltage reverse bias provided to the PIN diode, which dual voltage reverse bias may be provided by a first, relatively lower voltage, power supply and a second, relatively higher voltage, power supply. The relatively lower voltage is to discharge an intrinsic layer of the PIN diode at a lower voltage than during reverse bias of the PIN diode at the second relatively higher bias voltage in order to reduce overall power consumption.

    Control circuit, connection line and control method thereof

    公开(公告)号:US10211813B2

    公开(公告)日:2019-02-19

    申请号:US14976363

    申请日:2015-12-21

    发明人: Cheng-Chun Yeh

    IPC分类号: G06F13/40 H03H11/28

    摘要: A control circuit disposed in a connection line including a first power pin and a second power pin and including a native N-type transistor, a first impedance unit, and a second impedance unit is provided. The native N-type transistor includes a first gate, a first drain and a first source. The first drain is coupled to the first power pin. The first impedance unit is coupled between the first source and the second power pin. The second impedance unit is coupled between the first drain and the first gate. When the voltage level of the first power pin is equal to a pre-determined level, the first gate of the native N-type transistor receives an adjusting signal to adjust an equivalent impedance of the native N-type transistor.

    RF IMPEDANCE MATCHING CIRCUIT AND SYSTEMS AND METHODS INCORPORATING SAME

    公开(公告)号:US20190013185A1

    公开(公告)日:2019-01-10

    申请号:US16111776

    申请日:2018-08-24

    摘要: In one embodiment, a semiconductor processing tool includes a plasma chamber and an impedance matching circuit. The matching circuit includes a first electronically variable capacitor having a first variable capacitance, a second electronically variable capacitor having a second variable capacitance, and a control circuit. The control circuit is configured to determine a variable impedance of the plasma chamber, determine a first capacitance value for the first electronically variable capacitor and a second capacitance value for the second electronically variable capacitor, and generate a control signal to alter at least one of the first variable capacitance and the second variable capacitance to the first capacitance value and the second capacitance value, respectively. An elapsed time between determining the variable impedance of the plasma chamber to when RF power reflected back to the RF source decreases is less than about 150 μsec.

    Method and apparatus for dynamic calibration of on-die-precision-resistors

    公开(公告)号:US10147721B1

    公开(公告)日:2018-12-04

    申请号:US15847996

    申请日:2017-12-20

    摘要: Various on-die-precision-resistor arrays, and methods of making and calibrating the same are disclosed. In one aspect, an apparatus is provided that includes a semiconductor chip and a precision resistor array on the semiconductor chip. A replica precision resistor array is on the semiconductor chip. The replica precision resistor array is configured to mimic the resistance behavior of the precision resistor array and has a characteristic resistance that is a function of temperature. The semiconductor chip is configured to calibrate the precision resistor array using the characterized resistance as a function of temperature, a resistance offset of the precision resistor array relative to the characterized resistance as a function of temperature, and a temperature of the precision resistor array.