公开(公告)号：US20210396683A1

公开(公告)日：2021-12-23

申请号：US17283930

申请日：2019-09-20

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yixiang WANG ,  Zhiwen KANG

IPC: G01N21/95 ,  G01N21/88

Abstract: An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.

公开(公告)号：US20210391139A1

公开(公告)日：2021-12-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Peter-Paul CRANS ,  Marc SMITS ,  Laura DEL TIN ,  Christan TEUNISSEN ,  Yang-Shan HUANG ,  Stijn Wilem, Herman, Karel STEENBRINK ,  Xuerang HU ,  Qingpo XI ,  Xinan LUO ,  Xuedong LIU

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/18 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：US20210389365A1

公开(公告)日：2021-12-16

申请号：US17460947

申请日：2021-08-30

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Patrick WARNAAR ,  Vasco Tomas TENNER ,  Maurits VAN DER SCHAAR

IPC: G01R31/265

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：US20210382396A1

公开(公告)日：2021-12-09

申请号：US17283588

申请日：2019-10-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Pawel SAFINOWSKI ,  Derk Servatius Gertruda BROUNS

IPC: G03F7/20 ,  G03F1/62

Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber includes a first parking position and a second parking position for temporarily storing the object.

公开(公告)号：US20210375498A1

公开(公告)日：2021-12-02

申请号：US17395709

申请日：2021-08-06

Applicant: ASML Netherlands B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Sipke Jacob BIJLSMA ,  Olav Waldemar Vladimir FRIJNS ,  Andrey Alexandrovich NIKIPELOV ,  Nicolaas TEN KATE ,  Antonius Theodorus Anna Maria DERKSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Robert Gabriël Maria LANSBERGEN ,  Aukje Arianne Annette KASTELIJN

IPC: G21G1/10 ,  G21G1/12

Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.

公开(公告)号：US11187991B2

公开(公告)日：2021-11-30

申请号：US14858885

申请日：2015-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US11181833B2

公开(公告)日：2021-11-23

申请号：US16442953

申请日：2019-06-17

Applicant: ASML Netherlands B.V.

Inventor： Jerry Johannes Martinus Peijster ,  Diederik Geert Femme Verbeek

IPC: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/317

Abstract: Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: a support body for supporting the radiation projection system; electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system; optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, and a cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system; the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.

公开(公告)号：US11181829B2

公开(公告)日：2021-11-23

申请号：US16640088

申请日：2018-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Cyrus Emil Tabery ,  Hakki Ergün Cekli ,  Simon Hendrik Celine Van Gorp ,  Chenxi Lin

IPC: H01L21/66 ,  G03F7/20

Abstract: A method for determining a control parameter for an apparatus used in a semiconductor manufacturing process, the method including: obtaining performance data associated with a substrate subject to the semiconductor manufacturing process; obtaining die specification data including values of an expected yield of one or more dies on the substrate based on the performance data and/or a specification for the performance data; and determining the control parameter in dependence on the performance data and the die specification data. Advantageously, the efficiency and/or accuracy of processes is improved by determining how to perform the processes in dependence on dies within specification.

公开(公告)号：US20210356875A1

公开(公告)日：2021-11-18

申请号：US17282029

申请日：2019-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost DE HOOGH ,  Alain Louis Claude LEROUX ,  Alexander Marinus Arnoldus HUIJBERTS ,  Christiaan Louis VALENTIN ,  Robert Coenraad WIT ,  Dries Vaast Paul HEMSCHOOTE ,  Frits VAN DER MEULEN ,  Johannes Franciscus Martinus VAN SANTVOORT ,  Radu DONOSE

IPC: G03F7/20 ,  F25D3/10

Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

公开(公告)号：US20210350507A1

公开(公告)日：2021-11-11

申请号：US17308835

申请日：2021-05-05

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Ruochong FEI ,  Lingling PU ,  Wentian ZHOU ,  Liangjiang YU ,  Bo WANG

IPC: G06T5/00 ,  G06T5/50 ,  G06T7/10

Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.