公开(公告)号：US11139141B2

公开(公告)日：2021-10-05

申请号：US16675192

申请日：2019-11-05

Applicant: ASML Netherlands B.V.

Inventor： Martijn Petrus Christianus Van Heumen ,  Jeroen Gerard Gosen

IPC: H01J37/20 ,  H01L21/67

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.

公开(公告)号：US20210302845A1

公开(公告)日：2021-09-30

申请号：US16330417

申请日：2017-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bert VERSTRAETEN ,  HUGO JOSEPH CRAMER AUGUSTINUS ,  THOMAS THEEUWES

IPC: G03F7/20

Abstract: A method of evaluating a patterning process, the method including: obtaining the result of a first measurement of a first metrology target; obtaining the result of a second measurement of a second metrology target, the second metrology target having a structural difference from the first metrology target that generates a sensitivity difference and/or an offset, of a process parameter of the patterning process between the first and second metrology targets; and determining a value pertaining to the patterning process based on the results of the first and second measurements.

公开(公告)号：US11131937B2

公开(公告)日：2021-09-28

申请号：US16723995

申请日：2019-12-20

Applicant: ASML Netherlands B.V.

Inventor： Michaël Johannes Christiaan Ronde ,  Johannes Hubertus Antonius Van De Rijdt ,  Maarten Frans Janus Kremers ,  Erik Maria Rekkers

IPC: G03B27/42 ,  G03F7/20 ,  H01L21/67

Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.

公开(公告)号：US11131936B2

公开(公告)日：2021-09-28

申请号：US16486169

申请日：2018-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Antoine Gaston Marie Kiers ,  Scott Anderson Middlebrooks ,  Jan-Willem Gemmink

IPC: G03F7/00 ,  G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G06K9/32

Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.

公开(公告)号：US11112618B2

公开(公告)日：2021-09-07

申请号：US15754480

申请日：2016-08-03

Applicant: ASML Netherlands B.V.

Inventor： Gosse Charles De Vries ,  Han-Kwang Nienhuys

IPC: G02B27/10 ,  G03F7/20 ,  G02B5/18 ,  H01S3/09 ,  G02B6/293 ,  G02B6/00

Abstract: A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0th diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0th diffraction order.

公开(公告)号：US20210271172A1

公开(公告)日：2021-09-02

申请号：US17176559

申请日：2021-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Ya Luo ,  Yu Cao ,  Jen-Shiang Wang ,  Yen-Wen Lu

IPC: G03F7/20 ,  G06N20/00 ,  G06K9/62 ,  G06N20/10

Abstract: Methods of determining, and using, a process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.

公开(公告)号：US11106144B2

公开(公告)日：2021-08-31

申请号：US16629480

申请日：2018-06-12

Applicant: ASML Netherlands B.V.

Inventor： Paulus Hubertus Petrus Koller ,  Johannes Jacobus Matheus Baselmans ,  Bartolomeus Petrus Rijpers

IPC: G03F7/20

Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.

公开(公告)号：US11106142B2

公开(公告)日：2021-08-31

申请号：US16733890

申请日：2020-01-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Martin Jacobus Johan Jak

IPC: G03F7/20 ,  G01B11/24 ,  G01B11/30 ,  G01N21/47 ,  G01N21/88

Abstract: A method including evaluating a plurality of substrate measurement recipes for measurement of a metrology target processed using a patterning process, against stack sensitivity and overlay sensitivity, and selecting one or more substrate measurement recipes from the plurality of substrate measurement recipes that have a value of the stack sensitivity that meets or crosses a threshold and that have a value of the overlay sensitivity within a certain finite range from a maximum or minimum value of the overlay sensitivity.

公开(公告)号：US20210263422A1

公开(公告)日：2021-08-26

申请号：US17277027

申请日：2019-08-12

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac ,  Igor Vladimirovich Fomenkov

IPC: G03F7/20 ,  H05G2/00

Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.

公开(公告)号：US11101099B2

公开(公告)日：2021-08-24

申请号：US16638124

申请日：2018-06-21

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Derk Ferdinand Walvoort

IPC: H01J37/04 ,  H01J37/317

Abstract: The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.