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公开(公告)号：US09431279B2
公开(公告)日：2016-08-30
申请号：US13895331
申请日：2013-05-15
Applicant: AP SYSTEMS INC.
Inventor： Chang-Kyo Kim , Sung-Chul Kim , Chang-Min Kwon , Ki-Nam Kim
CPC classification number: H01L21/67115
Abstract: The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.
Abstract translation: 本发明涉及一种加热器块和基板处理装置，更具体地涉及对基板进行热处理的加热器块和具有该加热块的基板处理装置。 根据本发明的实施例，提供了一种用于基板处理装置的加热块，该基板处理装置的一侧具有加热灯，以将热量传递到经受热处理的目标，加热灯在多个区域中具有不同的布置图案 一方说
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公开(公告)号：US09318359B2
公开(公告)日：2016-04-19
申请号：US13886261
申请日：2013-05-02
Applicant: AP SYSTEMS INC.
Inventor： Il-Hwan Lim , Jang-Woo Shim , Chul-Soo Kim , Seung-Ae Choi
CPC classification number: H01L21/67115 , F27B17/0025 , H05B3/0047
Abstract: The present invention relates to an apparatus for heat-treating a substrate, and more particularly to an apparatus for substrate treatment to perform a heat treatment of a substrate for a flat panel display panel.An apparatus for substrate treatment according to an embodiment of the present invention comprises a processing chamber having a substrate treatment space; a heating housing having a heating lamp that emits radiant energy and a reflecting block that reflects radiant energy emitted from the heating lamp; and a window that maintains a sealing between the processing chamber and the heating housing and transmits the radiant energy to a substrate.
Abstract translation: 本发明涉及一种用于对基板进行热处理的装置，更具体地涉及用于对平板显示面板进行基板的热处理的基板处理装置。 根据本发明的实施例的用于基板处理的装置包括具有基板处理空间的处理室; 具有发射辐射能的加热灯的加热壳体和反射从加热灯发出的辐射能的反射块; 以及在处理室和加热壳体之间保持密封并将辐射能传递到基板的窗口。
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公开(公告)号：US20140345646A1
公开(公告)日：2014-11-27
申请号：US14255557
申请日：2014-04-17
Applicant: AP Systems Inc.
Inventor： Sung Ho Kwak , Min Young Cho
CPC classification number: G03F1/82 , B08B7/0042
Abstract: This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent to the adhesive residue, and a laser generator for irradiating a laser onto the metal plate so that the adhesive residue is removed by heat generated from the metal plate.
Abstract translation: 本发明涉及一种清洁光掩模的装置和方法。 适用于从光掩模中去除粘合剂残留物的该装置包括光掩模，该光掩模被设置为使得其上残留有粘合剂残留物的表面向下指向，邻近粘合残渣形成的金属板，以及激光发生器 用于将激光照射到金属板上，使得通过从金属板产生的热量去除粘合剂残留物。
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公开(公告)号：US20250001765A1
公开(公告)日：2025-01-02
申请号：US18677843
申请日：2024-05-29
Applicant: AP SYSTEMS INC.
Inventor： Woo Jong HAN , Jeong Ho KIM , Tae Jun UM , Seok Jae RYU
IPC: B41J2/175
Abstract: Provided are an apparatus for supplying ink and an inkjet printing system including the same, and more particularly, to an apparatus for supplying ink, which may effectively circulate ink for inkjet printing to stably maintain a state of the ink, and an inkjet printing system including the same. The apparatus for supplying ink includes an ink storage unit configured to store ink at least temporarily, a first passage tube configured to supply the ink stored in the ink storage unit to an inkjet head unit, a second passage tube configured to collect the ink from the inkjet head unit, an ink circulation unit configured to move the ink introduced through the second passage tube in one direction, and a third passage tube configured to supply the ink discharged from the ink circuit unit to the ink storage unit.
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公开(公告)号：USD1051081S1
公开(公告)日：2024-11-12
申请号：US29891976
申请日：2023-05-11
Applicant: AP SYSTEMS INC.
Designer： Chang Min Kwon , Chang Kyo Kim
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Patent Agency Ranking
公开(公告)号：USD1034493S1
公开(公告)日：2024-07-09
申请号：US29891977
申请日：2023-05-11
Applicant: AP SYSTEMS INC.
Designer： Chang Min Kwon , Chang Kyo Kim
Abstract: FIG. 1 is a perspective view of a chamber wall liner for a semiconductor manufacturing apparatus, showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.-
公开(公告)号：US20230366092A1
公开(公告)日：2023-11-16
申请号：US18029898
申请日：2021-09-16
Applicant: AP SYSTEMS INC.
Inventor： Pil Seong JEONG , Sang Hyun JI , Chang Kyo KIM , Dong Sik KIM
IPC: C23C16/50 , C23C16/52 , C23C16/455
CPC classification number: C23C16/50 , C23C16/52 , C23C16/45559
Abstract: Provided are an apparatus and method for forming a thin film. The apparatus for forming a thin film include a chamber configured to define a substrate processing space therein, a substrate support part connected to the chamber to support a substrate inside the chamber, a heat source part connected to the chamber to face the substrate support part, and a plasma generation part connected to the chamber to supply radicals between the substrate support part and the heat source part at at least two points.
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公开(公告)号：US11450551B2
公开(公告)日：2022-09-20
申请号：US16989864
申请日：2020-08-10
Applicant: AP SYSTEMS INC.
Inventor： Chang Kyo Kim , Chang Min Kwon
IPC: H01L21/687 , H01L21/67 , C23C16/458
Abstract: Provided are an edge ring and a heat treatment apparatus having the same. The edge ring includes a main body having a ring shape. The main body includes a substrate support part configured to support an edge of a bottom surface of a substrate, an outer band provided outside the substrate support part and having a top surface that is higher than a top surface of the substrate support part and is parallel to a top surface of the substrate supported by the substrate support part, an outer sidewall provided outside the outer band, and a groove part provided between the substrate support part and the outer band.
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公开(公告)号：US20190201887A1
公开(公告)日：2019-07-04
申请号：US15859266
申请日：2017-12-29
Applicant: AP SYSTEMS INC.
Inventor： Jae Keun HYUN , Hee Woon LEE , Yong Seok KIM
CPC classification number: B01L1/025 , B01L2300/041 , B01L2300/043 , B01L2300/10 , E05C19/166 , E05D3/08 , E05F5/02 , E05F15/611 , E05Y2201/212 , E05Y2900/21
Abstract: Provided is a door apparatus that is installed on a chamber including an inner space and an opening defined in one surface thereof. The door includes a cover unit configured to cover the opening, a first magnetic unit installed on the cover unit or the chamber, and a second magnetic unit installed on the cover unit or the chamber to face the first magnetic unit, converting a polarity thereof, and coupled to the first magnetic unit in a separable manner
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公开(公告)号：US20180240623A1
公开(公告)日：2018-08-23
申请号：US15883063
申请日：2018-01-29
Applicant: AP SYSTEMS INC.
Inventor： Kwang Soo KIM , Jong Gwon CHOI , Hyun Sik YUN , Joo Hyeok BAEK
CPC classification number: H01H17/08 , H01H3/0226 , H01H9/16 , H01H17/10 , H01H17/16 , H01H89/00 , H01H2003/323
Abstract: Provided are an emergency stop apparatus including a switch unit installed in a work space, electrically connected to a facility, and operable by pulling and a wire which is disposed in the work space so that tension is applied and of which at least one side is detachably mounted on the switch unit and an emergency stop method for quickly stopping the facility at a desired position within the work space in a manner of pulling or pushing the wire.
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