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    MICROLITHOGRAPH SYSTEM
    32.
    发明申请
    MICROLITHOGRAPH SYSTEM 有权
    微系统

    公开(公告)号：US20080088816A1

    公开(公告)日：2008-04-17

    申请号：US11949981

    申请日：2007-12-04

    申请人： Daniel Kraehmer ,  Wilhelm Ulrich

    发明人： Daniel Kraehmer ,  Wilhelm Ulrich

    IPC分类号： G03B27/72 ,  G02B5/30 ,  G03B27/52

    CPC分类号： G03F7/70225 ,  G03F7/70966

    摘要： An optical system of a microlithographic exposure apparatus comprises at least one optical element (L1 to L16, 15, 16, 24) having a locally varying birefringence direction distribution that is caused by stress-induced birefringence and is at least substantially rotationally symmetrical. At least one birefringent correcting element (K1, K2; K′) is made of a crystal having a location independent birefringence direction distribution that is at least substantially rotationally symmetrical. The crystal has a crystal lattice orientation that is oriented such that its birefringence direction distribution is at least substantially perpendicular to the locally varying birefringence direction distribution of the at least one optical element (L1 to L16, 15, 16, 24).

    摘要翻译： 微光刻曝光设备的光学系统包括至少一个光学元件（L 1至L 16,15,16,24），其具有由应力引起的双折射引起的局部变化的双折射方向分布，并且至少基本上是旋转对称的。 至少一个双折射校正元件（K 1，K 2; K'）由具有至少基本上旋转对称的位置无关双折射方向分布的晶体制成。 晶体具有取向为使得其双折射方向分布至少基本上垂直于至少一个光学元件（L 1至L 16,15,16,24）的局部变化的双折射方向分布的晶格取向。

    Optical system and method for the production of micro-structured components by microlithography
    34.
    发明授权
    Optical system and method for the production of micro-structured components by microlithography 有权
    通过微光刻法生产微结构元件的光学系统和方法

    公开(公告)号：US07317508B2

    公开(公告)日：2008-01-08

    申请号：US10997455

    申请日：2004-11-24

    申请人： Daniel Kraehmer ,  Wilhelm Ulrich

    发明人： Daniel Kraehmer ,  Wilhelm Ulrich

    IPC分类号： G03B27/52 ,  G02F1/01 ,  G02B27/28

    CPC分类号： G03F7/70225 ,  G03F7/70966

    摘要： An optical system of a microlithographic exposure apparatus comprises at least one optical element (L1 to L16, 15, 16, 24) having a locally varying birefringence direction distribution that is caused by stress-induced birefringence and is at least substantially rotationally symmetrical. At least one birefringent correcting element (K1, K2; K′) is made of a crystal having a location independent birefringence direction distribution that is at least substantially rotationally symmetrical. The crystal has a crystal lattice orientation that is oriented such that its birefringence direction distribution is at least substantially perpendicular to the locally varying birefringence direction distribution of the at least one optical element (L1 to L16, 15, 16, 24).

    摘要翻译： 微光刻曝光设备的光学系统包括至少一个光学元件（L 1至L 16,15,16,24），其具有由应力引起的双折射引起的局部变化的双折射方向分布，并且至少基本上是旋转对称的。 至少一个双折射校正元件（K 1，K 2; K'）由具有至少基本上旋转对称的位置无关双折射方向分布的晶体制成。 晶体具有取向为使得其双折射方向分布至少基本上垂直于至少一个光学元件（L 1至L 16,15,16,24）的局部变化的双折射方向分布的晶格取向。

    Objective with crystal lenses
    35.
    发明申请
    Objective with crystal lenses 审中-公开
    目标水晶镜片

    公开(公告)号：US20070242250A1

    公开(公告)日：2007-10-18

    申请号：US11765200

    申请日：2007-06-19

    申请人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    发明人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    IPC分类号： G02B27/28 ,  G03B27/52 ,  H01L21/00

    CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/14 ,  G02B27/0043 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

    摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

    摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

    Objective with birefringent lenses
    39.
    发明申请
    Objective with birefringent lenses 失效
    目标双折射镜片

    公开(公告)号：US20050200966A1

    公开(公告)日：2005-09-15

    申请号：US11071523

    申请日：2005-03-02

    申请人： Michael Totzeck ,  Vladimer Kamenov ,  Daniel Kraehmer ,  Wilhelm Ulrich

    发明人： Michael Totzeck ,  Vladimer Kamenov ,  Daniel Kraehmer ,  Wilhelm Ulrich

    IPC分类号： G02B1/02 ,  G02B5/30 ,  G02B13/14 ,  G02B13/18 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00 ,  G02B9/00 ,  G02B15/14

    CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966

    摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101-L107, L110-L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101-L107, L110-L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101-L107, L110-L128), an outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128).

    摘要翻译： 目的（1，601），特别是具有第一双折射透镜（L 108，L 109，L 129，L 130）和第二双折射透镜（L 101 -L 107，L 110-110）的微光刻投影装置的投影物镜， L 128）。 第一透镜（L 108，L 109，L 129，L 130）与所使用的透镜材料或材料取向与第二透镜（L 101 -L 107，L 110 -L 128）不同。 在穿过第一透镜（L 108，L 109，L 129，L 130）和第二透镜（L 101 -L 107，L 110 -L 128）之后，外孔光线（5,7）和主光线 （9）对于两个相互正交的极化状态经受光程差。 这些光程差之差小于工作波长的25％。 在至少一个第一透镜（L 129，L 130）中，外孔径光线（5,7）的孔径角度是所有第一透镜中的所述孔径光线发生的最大孔径角的至少70％（L 108，L 109，L 129，L 130）和第二透镜（L 101 -L 107，L 110 -L 128）。 这种结构的结果是，第一透镜（L 108，L 109，L 129，L 130）的组合材料体积不超过第一透镜（L 108，L 109，L 130， L 129，L 130）和第二透镜（L 101 -L 107，L 110 -L 128）。

    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
    40.
    发明申请
    LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME 有权
    图像投影目标和校正其图像缺陷的方法

    公开(公告)号：US20120019800A1

    公开(公告)日：2012-01-26

    申请号：US13245116

    申请日：2011-09-26

    申请人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

    发明人： Ulrich Loering ,  Vladan Blahnik ,  Wilhelm Ulrich ,  Daniel Kraehmer ,  Norbert Wabra

    IPC分类号： G03F7/20 ,  G02B17/08 ,  G03B27/52 ,  G02B3/00

    CPC分类号： G03F7/70341 ,  G03F7/7015

    摘要： A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

    摘要翻译： 用于将要布置在投影物镜的物平面中的图案成像到要布置在投影物镜的像平面中的基板上的光刻投影物镜包括沿着投影物镜的光轴布置的多个光学元件 。 光学元件包括光学元件之后的物体平面上的第一组和最后一个光学元件，该光学元件跟随第一组并且邻近于图像平面并且限定投影物镜的出射表面并且被布置在 与图像平面的距离。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。