摘要:
A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane;wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要:
A surgical instrument extends through a guide tube and exits at an intermediate position of the guide tube. The instrument includes a parallel motion mechanism that changes the position of a distal end of the surgical instrument without changing the orientation of the distal end. An image capture component is at the distal end of the guide tube, and a joint allows the image capture component to move while the intermediate position remains stationary. The configuration allows a cross section of the guide tube to be oblong. In some aspects, a joint for the image capture component is placed between exit ports for surgical instruments, which allows the guide tube cross section to be further reduced.
摘要:
A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要:
The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
摘要翻译:本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA,由实心透明体,特别是玻璃或晶体制成的至少一个第一透镜,具有折射率n L L和至少一个液体透镜 (F)由折射率为NF的透明液体制成。 在工作波长下,第一透镜的物镜的所有实心透镜的折射率nL最大,所述至少一个液体透镜(F)的折射率n F F大于折射率n 第一透镜的L SUB>和数值孔径NA的值大于1。
摘要:
A projection system for imaging an object field onto an image field, including at least two partial objectives (S1, S2); at least one intermediate image field between the partial objectives (S1, S2); and a concave reflector (119, 219) having a concave reflecting surface. The concave reflecting surface crosses an optical axis of the projection system proximate along the optical axis to the intermediate image field. Alternatively or in addition, the concave reflecting surface crosses an optical axis of the projection system at a position where the condition |HCR/HMR|≧2 is met, with HCR being a chief ray height and HMR being a marginal ray height with respect to the optical axis. Alternatively or in addition, the concave reflecting surface crosses an optical axis of the projection system at a position where the condition: d=y*L is met, with d being an axial distance from the concave reflecting surface to the intermediate image field, and with L being the total geometrical light path travelled by a light beam along the optical axis from the object field to the image field, wherein y ranges from 0 to 0.10.
摘要:
A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.
摘要:
A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.
摘要:
An optical system comprising three lens sections, a catadioptric objective lens section, a reimaging lens section and a zoom lens section, which are all aligned along the optical path of the optical system. The reimaging lens section re-images the system pupil such that the re-imaged pupil is accessible separately from any of the lens sections. The reimaging lens section includes an intermediate focus lens group, which is used to create an intermediate focus, a recollimating lens group, which is used to recollimate the light traveling from the intermediate focus lens group, refocusing group to generate the re-image of the pupil. The optical system may also include a beamsplitter, which creates a separated illumination pupil and collection pupil. The illumination pupil and the collection pupil may then be manipulated with an illumination aperture and a collection aperture, respectively, so that the optical system may operate in various test modes such as brightfield, ring darkfield, full-sky illumination, and laser darkfield with Fourier filtering capability. Another aspect of the invention pertains to a method for using the broad spectral region catadioptric optical system. The method includes the operations of directing radiation from a radiation source so that the radiation passes through the illumination pupil and the collection pupil of the optical system. The method also includes operations for configuring the illumination pupil and the collection pupil so that the optical system may operate in brightfield, ring darkfield, full-sky or laser darkfield illumination mode, with Fourier filtering capability.
摘要:
A reflecting telescope is provided in which a meniscus lens corrects for coma of the primary parabolic reflecting mirror, and also for coma and spherical aberration of an eyepiece, when an eyepiece is used. The meniscus lens may be formed from a plano-concave lens and a plano-convex lens positioned with their planar sides mutually parallel.
摘要:
A reflecting telescope is provided in which a meniscus lens corrects for coma of the primary parabolic reflecting mirror, and also for coma and spherical aberration of an eyepiece, when an eyepiece is used. The meniscus lens may be formed from a plano-concave lens and a plano-convex lens positioned with their planar sides mutually parallel.