公开(公告)号：US06798808B1

公开(公告)日：2004-09-28

申请号：US09492803

申请日：2000-01-28

申请人： Fumihiro Konushi ,  Nobuhiro Ohkubo ,  Shinichi Kawato

发明人： Fumihiro Konushi ,  Nobuhiro Ohkubo ,  Shinichi Kawato

IPC分类号： H01S500

CPC分类号： H01S5/32308

摘要： In a semiconductor laser device having a quantum well active layer, an undoped thin spacer layer is formed between an undoped optical guide layer and a p-type cladding layer. The thickness of the spacer layer is preferably 5 nm or more but less than 10 nm. The spacer layer absorbs impurities diffusing thereinto from the p-type cladding layer. Thus, the dopant is prevented from being diffused into the undoped optical guide layer.

摘要翻译： 在具有量子阱有源层的半导体激光器件中，在未掺杂的光导层和p型覆层之间形成未掺杂的间隔层。 间隔层的厚度优选为5nm以上且小于10nm。 间隔层吸收从p型包层扩散的杂质。 因此，防止掺杂剂扩散到未掺杂的光导层中。

公开(公告)号：US09343515B2

公开(公告)日：2016-05-17

申请号：US14215692

申请日：2014-03-17

申请人： Nozomu Sugisawa ,  Hisao Ikeda ,  Katsuhiro Kikuchi ,  Manabu Niboshi ,  Satoshi Inoue ,  Yuto Tsukamoto ,  Shinichi Kawato

发明人： Nozomu Sugisawa ,  Hisao Ikeda ,  Katsuhiro Kikuchi ,  Manabu Niboshi ,  Satoshi Inoue ,  Yuto Tsukamoto ,  Shinichi Kawato

IPC分类号： H01J1/62 ,  H01J63/04 ,  H01L27/32 ,  H01L51/52

CPC分类号： H01L27/3246 ,  H01L51/5218 ,  H01L51/5265 ,  H01L51/5281

摘要： A display device that includes a reflective electrode; a transparent electrode; a partition; an EL layer formed over the partition and the transparent electrode; a semi-transmissive electrode formed over the EL layer; and a coloring layer over the semi-transmissive electrode. A light-emitting region is formed to overlap with the transparent electrode, the EL layer, the semi-transmissive electrode, and the coloring layer. A non-light-emitting region is formed to overlap with the transparent electrode, the partition, the EL layer, and the coloring layer. The non-light-emitting region is formed to surround the light-emitting region. The sum of the optical length of the transparent electrode and the optical length of the EL layer is adjusted to fulfill a condition of a microcavity intensifying light of the color of the coloring layer. The optical length of the partition in the non-light-emitting region is adjusted to weaken external light incident through the coloring layer.

摘要翻译： 一种显示装置，包括反射电极; 透明电极; 一个分区 形成在隔板和透明电极上的EL层; 形成在EL层上的半透射电极; 和半透射电极上的着色层。 形成发光区域与透明电极，EL层，半透射电极和着色层重叠。 形成与透明电极，隔板，EL层和着色层重叠的非发光区域。 非发光区域形成为围绕发光区域。 调整透明电极的光学长度和EL层的光学长度的总和，以实现着色层的颜色的微腔增强光的条件。 调整非发光区域中的隔板的光学长度，以削弱通过着色层入射的外部光。

公开(公告)号：US09093646B2

公开(公告)日：2015-07-28

申请号：US13992613

申请日：2011-12-07

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L51/00 ,  C23C14/24 ,  C23C14/56 ,  H01L27/32 ,  H01L51/56

CPC分类号： H01L51/0008 ,  C23C14/24 ,  C23C14/243 ,  C23C14/246 ,  C23C14/568 ,  H01L27/3211 ,  H01L51/56

摘要： A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), including: a vapor deposition source (91) which has a plurality of injection holes (92) from which vapor deposition particles are to be injected towards the film formation substrate (60), the plurality of injection holes (92) being arranged in a line or in a plurality of lines; a vapor deposition crucible (93) for supplying the vapor deposition particles to the vapor deposition source (91) via a pipe (94), the pipe being connected to the vapor deposition source (91) on a side where one end of the line(s) of the plurality of injection holes (92) is located; moving means for moving the film formation substrate (60) relative to the vapor deposition source(s) (91); and a rotation mechanism (100) for rotating the vapor deposition source (91).

摘要翻译： 根据本发明的蒸镀装置（50）是在成膜基板（60）上形成膜的蒸镀装置，其特征在于，包括：具有多个喷射孔（92）的蒸镀源（91） 从该气相沉积粒子向成膜基板（60）喷射，多个喷射孔（92）以一行或多条线排列; 一种用于通过管道（94）将气相沉积颗粒供应到气相沉积源（91）的气相沉积坩埚（93），该管道连接到气相淀积源（91）的一端 （92）的位置; 用于相对于气相沉积源（91）移动成膜衬底（60）的移动装置; 以及用于旋转气相沉积源（91）的旋转机构（100）。

公开(公告)号：US08882918B2

公开(公告)日：2014-11-11

申请号：US13876573

申请日：2011-09-26

申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

IPC分类号： C23C16/00 ,  C23C14/24 ,  C23C14/12 ,  H05B33/10 ,  C23C14/04 ,  C23C14/56 ,  H01L51/00

CPC分类号： H05B33/10 ,  C23C14/042 ,  C23C14/12 ,  C23C14/24 ,  C23C14/562 ,  H01L51/001

摘要： A vapor deposition apparatus (50) includes: a mask unit (54) including a vapor deposition source (70), a vapor deposition mask (60), and a mask holding member (80); a substrate holder (52); and at least either a mask unit moving mechanism (55) or a substrate moving mechanism (53), with a roller (83) provided in a surface of one of (A) the substrate holder (52) and (B) the mask holding member (80) which faces the other one of (A) the substrate holder (52) and (B) the mask holding member (80).

摘要翻译： 气相沉积装置（50）包括：包括气相沉积源（70），气相沉积掩模（60）和掩模保持构件（80）的掩模单元（54）; 衬底保持器（52）; 以及至少一个掩模单元移动机构（55）或基板移动机构（53），其中设置在（A）基板保持器（52）和（B）中的一个的表面中的辊（83） （A）衬底保持器（52）和（B）掩模保持构件（80）中的另一个的构件（80）。

公开(公告)号：US08859438B2

公开(公告)日：2014-10-14

申请号：US13824617

申请日：2011-09-15

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue

IPC分类号： H01L21/31 ,  H05B33/10 ,  H01L33/44 ,  C23C14/24 ,  C23C14/04 ,  C23C14/12 ,  H01L27/32 ,  H01L51/00 ,  H01L51/56

CPC分类号： H01L33/44 ,  C23C14/042 ,  C23C14/12 ,  C23C14/24 ,  H01L27/3211 ,  H01L51/0008 ,  H01L51/0011 ,  H01L51/56 ,  H05B33/10

摘要： A coating film (90) is formed by causing vapor deposition particles (91) to pass through a mask opening (71) of a vapor deposition mask and adhere to a substrate, the vapor deposition particles (91) being discharged from a vapor deposition source opening (61) of a vapor deposition source (60) while the substrate (10) is moved relative to the vapor deposition mask (70) in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. When a direction that is orthogonal to a normal line direction of the substrate and is orthogonal to a relative movement direction of the substrate is defined as a first direction, and the normal line direction of the substrate is defined as a second direction, a plurality of control plate columns are disposed in the first direction between the vapor deposition source opening and the vapor deposition mask, each control plate column including a plurality of control plates (80a and 80b) arranged along the second direction. With this configuration, a coating film in which blur at both edges of the coating film and variations in the blur are suppressed can be formed on a large-sized substrate.

摘要翻译： 通过使气相沉积粒子（91）通过气相沉积掩模的掩模开口（71）并附着到基底上，形成涂膜（90），蒸镀颗粒（91）从气相沉积源 在衬底（10）和气相沉积掩模（70）间隔开的状态下，相对于气相沉积掩模（70）移动衬底（10）的同时，蒸镀源（60）的开口（61） 以固定的间隔。 当将与基板的法线方向正交并与基板的相对移动方向正交的方向定义为第一方向时，将基板的法线方向定义为第二方向， 控制板列在蒸镀源开口和蒸镀掩模之间沿第一方向配置，每个控制板列包括沿第二方向配置的多个控制板（80a，80b）。 利用这种构造，可以在大尺寸的基板上形成其中涂覆膜的两边的模糊和模糊的变化被抑制的涂膜。

公开(公告)号：US20140284576A1

公开(公告)日：2014-09-25

申请号：US14215692

申请日：2014-03-17

申请人： Nozomu SUGISAWA ,  Hisao IKEDA ,  Katsuhiro KIKUCHI ,  Manabu NIBOSHI ,  Satoshi INOUE ,  Yuto TSUKAMOTO ,  Shinichi KAWATO

发明人： Nozomu SUGISAWA ,  Hisao IKEDA ,  Katsuhiro KIKUCHI ,  Manabu NIBOSHI ,  Satoshi INOUE ,  Yuto TSUKAMOTO ,  Shinichi KAWATO

IPC分类号： H01L51/52 ,  H01L51/56

CPC分类号： H01L27/3246 ,  H01L51/5218 ,  H01L51/5265 ,  H01L51/5281

摘要： A display device that includes a reflective electrode; a transparent electrode; a partition; an EL layer formed over the partition and the transparent electrode; a semi-transmissive electrode formed over the EL layer; and a coloring layer over the semi-transmissive electrode. A light-emitting region is formed to overlap with the transparent electrode, the EL layer, the semi-transmissive electrode, and the coloring layer. A non-light-emitting region is formed to overlap with the transparent electrode, the partition, the EL layer, and the coloring layer. The non-light-emitting region is formed to surround the light-emitting region. The sum of the optical length of the transparent electrode and the optical length of the EL layer is adjusted to fulfil a condition of a microcavity intensifying light of the color of the coloring layer. The optical length of the partition in the non-light-emitting region is adjusted to weaken external light incident through the coloring layer.

摘要翻译： 一种显示装置，包括反射电极; 透明电极; 一个分区 形成在隔板和透明电极上的EL层; 形成在EL层上的半透射电极; 和半透射电极上的着色层。 形成发光区域与透明电极，EL层，半透射电极和着色层重叠。 形成与透明电极，隔板，EL层和着色层重叠的非发光区域。 非发光区域形成为围绕发光区域。 调整透明电极的光学长度和EL层的光学长度的总和，以实现着色层的颜色的微腔增强光的条件。 调整非发光区域中的隔板的光学长度，以削弱通过着色层入射的外部光。

公开(公告)号：US08841142B2

公开(公告)日：2014-09-23

申请号：US13989053

申请日：2011-12-13

申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

IPC分类号： H01L51/56 ,  H01L51/00 ,  H01L21/66 ,  C23C14/12 ,  C23C14/04 ,  C23C14/24

CPC分类号： H01L22/10 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H01L51/0011 ,  H01L51/56 ,  H01L2924/0002 ,  H01L2924/00

摘要： A coating film (90) is formed by causing vapor deposition particles (91) discharged from a vapor deposition source opening (61) of a vapor deposition source (60) to pass through a space (82) between a plurality of limiting plates (81) of a limiting plate unit (80) and a mask opening (71) of a vapor deposition mask in this order and adhere to a substrate while the substrate is moved relative to the vapor deposition mask in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. It is determined whether or not it is necessary to correct the position of at least one of the plurality of limiting plates in the X axis direction, and in the case where it is necessary to correct the position, the position of at least one of the plurality of limiting plates in the X axis direction is corrected. Accordingly, a coating film whose edge blur is suppressed can be stably formed at a desired position on a large-sized substrate.

摘要翻译： 通过使从气相沉积源（60）的气相沉积源开口（61）排出的气相沉积颗粒（91）通过多个限制板（81）之间的空间（82）形成涂膜（90） ）和气相沉积掩模的掩模开口（71），并且在衬底（10）的状态下，相对于气相沉积掩模移动衬底而粘附到衬底上， 并且气相沉积掩模（70）以固定的间隔间隔开。 确定是否需要校正多个限位板中的至少一个在X轴方向上的位置，并且在需要校正位置的情况下，至少一个限位板的位置 对X轴方向的多个限位板进行校正。 因此，可以在大尺寸基板的期望位置稳定地形成抑制边缘模糊的涂膜。

公开(公告)号：US20140225102A1

公开(公告)日：2014-08-14

申请号：US14169920

申请日：2014-01-31

申请人： Hisao IKEDA ,  Takuya KAWATA ,  Manabu NIBOSHI ,  Katsuhiro KIKUCHI ,  Shinichi KAWATO ,  Takashi OCHI ,  Yuto TSUKAMOTO ,  Tomohiro KOSAKA ,  Tomofumi OSAKI

发明人： Hisao IKEDA ,  Takuya KAWATA ,  Manabu NIBOSHI ,  Katsuhiro KIKUCHI ,  Shinichi KAWATO ,  Takashi OCHI ,  Yuto TSUKAMOTO ,  Tomohiro KOSAKA ,  Tomofumi OSAKI

IPC分类号： H01L33/08 ,  H01L33/26

CPC分类号： H01L33/26 ,  H01L27/322 ,  H01L51/504 ,  H01L51/5225 ,  H01L51/5265 ,  H01L51/5268

摘要： The emission efficiency of a light-emitting device including a microcavity structure is improved. The light-emitting device includes a plurality of light-emitting elements. The plurality of light-emitting elements each include a reflective electrode, a transparent electrode, a plurality of light-emitting layers, and a semi-transmissive and semi-reflective electrode stacked in that order. The plurality of light-emitting layers emit light of different colors. A surface roughness of the transparent electrode in the light-emitting element which is among the plurality of light-emitting elements and in which light emitted from the light-emitting layer closest to the reflective electrode is amplified and emitted outside is greater than surface roughnesses of the transparent electrodes in the other light-emitting elements.

摘要翻译： 提高了包括微腔结构的发光装置的发射效率。 发光装置包括多个发光元件。 多个发光元件各自包括反射电极，透明电极，多个发光层以及按顺序堆叠的半透射和半反射电极。 多个发光层发射不同颜色的光。 作为多个发光元件之中的发光元件中的透明电极的表面粗糙度，其中从最靠近反射电极的发光层发出的光被放大和发射到外部，其表面粗糙度大于 其他发光元件中的透明电极。

公开(公告)号：US08669192B2

公开(公告)日：2014-03-11

申请号：US13980037

申请日：2012-01-04

申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda

IPC分类号： H01L21/31 ,  H01L21/469 ,  C23C16/00

CPC分类号： H01L51/0008 ,  C23C14/042 ,  C23C14/044 ,  C23C14/12 ,  C23C14/243 ,  H01L51/001 ,  H01L51/56

摘要： First and second vapor deposition particles (91a, 91b) discharged from first and second vapor deposition source openings (61a, 61b) pass through first and second limiting openings (82a, 82b) of a limiting plate unit (80), pass through mask opening (71) of a vapor deposition mask (70) and adhere to a substrate (10) so as to form a coating film. If regions on the substrate to which the first vapor deposition particles and the second vapor deposition particles adhere if the vapor deposition mask is assumed not to exist are respectively denoted by a first region (92a) and a second region (92b), the limiting plate unit limits the directionalities of the first vapor deposition particles and the second vapor deposition particles in a first direction (10a) that travel to the substrate such that the second region is contained within the first region. Accordingly, it is possible to form a light emitting layer with a doping method by using vapor deposition by color.

摘要翻译： 从第一和第二气相沉积源开口（61a，61b）排出的第一和第二蒸镀颗粒（91a，91b）穿过限制板单元（80）的第一和第二限制开口（82a，82b），通过掩模开口 （70）的表面（71）并粘附到基底（10）上以形成涂膜。 如果假设不存在气相沉积掩模，则第一气相沉积颗粒和第二气相沉积颗粒附着的基板上的区域分别由第一区域（92a）和第二区域（92b）表示，限制板 单元限制第一气相沉积颗粒和第二气相沉积颗粒在向基板移动的第一方向（10a）上的方向性，使得第二区域包含在第一区域内。 因此，可以通过使用通过颜色的气相沉积形成具有掺杂方法的发光层。

公开(公告)号：US08664023B2

公开(公告)日：2014-03-04

申请号：US13976011

申请日：2011-12-20

申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

IPC分类号： H01L21/00 ,  H01L21/40 ,  H01L51/40

CPC分类号： H01L51/0011 ,  C23C14/042 ,  C23C14/12 ,  H01L51/0008

摘要： A vapor deposition method of the present invention includes the steps of (i) preparing a mask unit including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other, (ii) while moving at least one of the mask unit and the film formation substrate (200) relative to the other, depositing a vapor deposition flow, emitted from the vapor deposition source (85), onto a vapor deposition region (210), and (iii) adjusting the position of a second shutter (111) so that the second shutter (111) blocks a vapor deposition flow traveling toward the vapor deposition unnecessary region (210).

摘要翻译： 本发明的气相沉积方法包括以下步骤：（i）制备掩模单元，其包括荫罩（81）和相对于彼此固定的位置的气相沉积源（85），（ii）在移动至少一个 的掩模单元和成膜基板（200）相对于另一方形成，从蒸镀源（85）排出的气相沉积流沉积在蒸镀区域（210）上，（iii） 第二挡板（111），使得所述第二挡板（111）阻挡向所述气相沉积不需要区域（210）行进的气相沉积流。