公开(公告)号：US20090182528A1

公开(公告)日：2009-07-16

申请号：US12332674

申请日：2008-12-11

Applicant: Peter De Groot ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Xavier Colonna De Lega

IPC: G06F15/00 ,  G01B11/24

CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/06 ,  G01B11/0675 ,  G01B11/2441 ,  G01N21/45 ,  G01N21/8422 ,  G01N21/9501 ,  G01N21/95607

Abstract: A method includes comparing a scanning interferometry signal obtained for a location of a test object to each of multiple model signals corresponding to different model parameters for modeling the test object, wherein for each model signal the comparing comprises calculating a correlation function between the scanning interferometry signal and the model signal to identify a surface-height offset between the scanning interferometry signal and the model signal and, based on the identified surface-height offset, calculating a height-offset compensated merit value indicative of a similarity between the scanning interferometry signal and the model signal for a common surface height. The method further includes, based on the respective merit values for the different model signals, determining a test object parameter at the location of the test object.

Abstract translation: 一种方法包括将获得的用于测试对象的位置的扫描干涉测量信号与对应于不同模型参数的多个模型信号中的每一个进行比较，以建模测试对象，其中对于每个模型信号，所述比较包括计算扫描干涉测量信号 以及所述模型信号以识别所述扫描干涉测量信号和所述模型信号之间的表面高度偏移，并且基于所识别的表面高度偏移来计算指示所述扫描干涉测量信号和所述扫描干涉测量信号之间的相似性的高度偏移补偿的优值值 模型信号为共同的表面高度。 该方法还包括基于不同模型信号的相应优值，确定测试对象位置处的测试对象参数。

公开(公告)号：US20080180685A1

公开(公告)日：2008-07-31

申请号：US11757720

申请日：2007-06-04

Applicant: XAVIER COLONNA DE LEGA ,  Robert Stoner ,  Peter De Groot

Inventor： XAVIER COLONNA DE LEGA ,  Robert Stoner ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

Abstract: A method is disclosed which includes: using a scanning interferons dry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

Abstract translation: 公开了一种方法，其包括：使用扫描干扰素干系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 基于对象的相移干涉测量图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位中的干涉条纹减小 转换干涉图像。

公开(公告)号：US07324214B2

公开(公告)日：2008-01-29

申请号：US11525355

申请日：2006-09-21

Applicant: Peter De Groot ,  Michael J Darwin ,  Robert T Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Michael J Darwin ,  Robert T Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G03F7/70625

Abstract: Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parameterized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.

Abstract translation: 公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中，多个模型通过一系列与一个 或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

公开(公告)号：US07212291B2

公开(公告)日：2007-05-01

申请号：US11017632

申请日：2004-12-20

Applicant: Xavier Colonna De Lega ,  Charles McFee

Inventor： Xavier Colonna De Lega ,  Charles McFee

IPC: G01B9/02

CPC classification number: G01B9/02039 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209

Abstract: An apparatus including: (i) an interferometer positioned to derive measurement and reference wavefronts from a source of electromagnetic radiation, wherein the interferometer is configured to direct the measurement wavefront to reflect from a measurement surface and the reference wavefront to reflect from a reference surface, and further directs reflected measurement and reflected reference wavefronts to overlap with one another and to form an interference pattern; (ii) an auxiliary optic having a curved reflective surface positioned to redirect the measurement wavefront between the interferometer and the measurement surface; and (iii) a translation stage, wherein paths for the measurement and reference wavefronts define an optical measurement surface corresponding to a theoretical test surface that would reflect the measurement wavefront to produce a zero optical path length difference between the measurement and reference wavefronts, and wherein the translation stage is configured to scan the optical measurement surface over the measurement surface.

Abstract translation: 一种装置，包括：（i）定位成从电磁辐射源导出测量和参考波前的干涉仪，其中所述干涉仪被配置为引导所述测量波前从所述测量表面和所述参考波阵面反射以从参考表面反射， 并进一步指示反射的测量和反射的参考波前相互重叠并形成干涉图案; （ii）辅助光学元件，其具有弯曲的反射表面，其被定位成在所述干涉仪和所述测量表面之间重定向所述测量波前; 和（iii）翻译阶段，其中用于测量和参考波前的路径定义对应于理论测试表面的光学测量表面，其将反映测量波前以在测量波长和参考波前产生零光程长度差，并且其中 平移台配置成在测量表面上扫描光学测量表面。

公开(公告)号：US20060158659A1

公开(公告)日：2006-07-20

申请号：US11335873

申请日：2006-01-19

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; and (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation.

Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; 和（iii）一个或多个光学元件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度。

公开(公告)号：US20050259265A1

公开(公告)日：2005-11-24

申请号：US11131649

申请日：2005-05-17

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01B9/02 ,  G01B11/02 ,  G01B11/24 ,  G01M11/02 ,  G01N21/45

CPC classification number: G01B9/02084 ,  G01B9/02058 ,  G01B9/0209 ,  G01B11/2441 ,  G01M11/0228 ,  G01M11/0271 ,  G01N21/45

Abstract: Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providing scanning interferometry data. The data typically include obtaining one or more interference signals each corresponding to a different spatial location of a test object. A phase is determined for each of multiple frequencies of each interference signal. The information related to the optical thickness mismatch is determined based on the phase for each of the multiple frequencies of the interference signal(s).

Abstract translation: 描述了用于确定光学系统（例如，干涉仪）和/或光学元件（例如，透镜和/或透镜系统）的性质的方法和相关系统。 例如，可以通过提供扫描干涉测量数据来确定与干涉仪的光学厚度失配有关的信息。 数据通常包括获得每个对应于测试对象的不同空间位置的一个或多个干扰信号。 确定每个干扰信号的多个频率中的每一个的相位。 基于干涉信号的多个频率中的每一个的相位确定与光学厚度失配有关的信息。

公开(公告)号：US20050134863A1

公开(公告)日：2005-06-23

申请号：US11017632

申请日：2004-12-20

Applicant: Xavier Colonna De Lega ,  Charles McFee

Inventor： Xavier Colonna De Lega ,  Charles McFee

IPC: G01B9/02

CPC classification number: G01B9/02039 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209

Abstract: An apparatus including: (i) an interferometer positioned to derive measurement and reference wavefronts from a source of electromagnetic radiation, wherein the interferometer is configured to direct the measurement wavefront to reflect from a measurement surface and the reference wavefront to reflect from a reference surface, and further directs reflected measurement and reflected reference wavefronts to overlap with one another and to form an interference pattern; (ii) an auxiliary optic having a curved reflective surface positioned to redirect the measurement wavefront between the interferometer and the measurement surface; and (iii) a translation stage, wherein paths for the measurement and reference wavefronts define an optical measurement surface corresponding to a theoretical test surface that would reflect the measurement wavefront to produce a zero optical path length difference between the measurement and reference wavefronts, and wherein the translation stage is configured to scan the optical measurement surface over the measurement surface.

Abstract translation: 一种装置，包括：（i）定位成从电磁辐射源导出测量和参考波前的干涉仪，其中所述干涉仪被配置为引导所述测量波前从所述测量表面和所述参考波阵面反射以从参考表面反射， 并进一步指示反射的测量和反射的参考波前相互重叠并形成干涉图案; （ii）辅助光学元件，其具有弯曲的反射表面，其被定位成在所述干涉仪和所述测量表面之间重定向所述测量波前; 和（iii）翻译阶段，其中用于测量和参考波前的路径定义对应于理论测试表面的光学测量表面，其将反映测量波前以在测量波长和参考波前产生零光程长度差，并且其中 平移台配置成在测量表面上扫描光学测量表面。

公开(公告)号：US06226092B1

公开(公告)日：2001-05-01

申请号：US09321475

申请日：1999-05-27

Applicant: Xavier Colonna de Lega

Inventor： Xavier Colonna de Lega

IPC: G01B902

CPC classification number: G01B9/02098 ,  G01B9/02022 ,  G01B11/2441

Abstract: A full-field, geometrically-desensitized interferometer (GDI) instrument incorporates a combination of reflecting and refracting optics to perform beam splitting and recombining operations for surface profilometry. Symmetrically-positioned inbound and outbound optical subassemblies typically are arranged to direct inbound collimated beams from a light generator to the profiled surface of a test object and to direct outbound reflected beams to an imaging device as a single recombined outbound interference beam. Every point on the detector has a corresponding point on the object from which reflected illumination originated from both reflected beams. The optical path difference between the two inbound beams or between the two reflected outbound beams can be substantially independent of field position. The resultant instrument, in addition to being capable of full-field imaging, exhibits several advantages including 1) a large working distance, 2) the employment of readily-available non-diffractive elements, and 3) the ability to transmit light with high efficiency.

Abstract translation: 全场，几何脱敏干涉仪（GDI）仪器结合了反射和折射光学元件，以进行表面轮廓测量的分束和重组操作。 对称定位的入射和出射光学子组件通常被布置成将来自光发生器的入射准直光束引导到测试对象的成型表面，并且将出射反射光束作为单个重新组合的出射干涉光束引导到成像装置。 检测器上的每个点在物体上具有对应的点，反射照明源自两个反射光束。 两个入射光束之间或两个反射出射光束之间的光程差可以基本上与场位置无关。 所得到的仪器除了能够进行全场成像外，还具有以下优点：1）工作距离大，2）使用易于获得的非衍射元件，以及3）高效传输光的能力 。

公开(公告)号：US09025162B2

公开(公告)日：2015-05-05

申请号：US12540709

申请日：2009-08-13

Applicant: Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

Inventor： Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

IPC: G01B9/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

公开(公告)号：US20120224183A1

公开(公告)日：2012-09-06

申请号：US13408003

申请日：2012-02-29

Applicant: Martin Fay ,  Jan Liesener ,  Xavier Colonna de Lega

Inventor： Martin Fay ,  Jan Liesener ,  Xavier Colonna de Lega

IPC: G01B9/02

CPC classification number: G01B11/2441 ,  G01B9/0209 ,  G01B2210/56

Abstract: An interferometry method for determining information about a test object includes directing test light to the test object positioned at a plane, wherein one or more properties of the test light vary over a range of incidence angles at the plane, the properties of the test light being selected from the group consisting of the spectral content, intensity, and polarization state; subsequently combining the test light with reference light to form an interference pattern on a multi-element detector so that different regions of the detector correspond to different angles of the test light emerging from the test object, wherein the test and reference light are derived from a common source; monitoring the interference pattern using the multi-element detector while varying an optical path difference between the test light and the reference light; determining the information about the test object based on the monitored interference pattern.

Abstract translation: 用于确定关于测试对象的信息的干涉测量方法包括将测试光引导到位于平面处的测试对象，其中测试光的一个或多个属性在平面处的入射角范围内变化，测试光的特性为 选自光谱含量，强度和偏振态; 随后将测试光与参考光组合以在多元素检测器上形成干涉图案，使得检测器的不同区域对应于从测试对象出射的测试光的不同角度，其中测试和参考光源自 共同来源 在改变测试光和参考光之间的光程差的同时使用多元素检测器来监测干涉图案; 基于所监测的干扰模式确定关于测试对象的信息。