公开(公告)号：US07978337B2

公开(公告)日：2011-07-12

申请号：US12267077

申请日：2008-11-07

Applicant: Peter De Groot ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Xavier Colonna De Lega

IPC: G01B9/02 ,  G02B21/00

CPC classification number: G02B21/0004

Abstract: In one aspect, the disclosure features methods that include using a microscope to direct light to a test object and to direct the light reflected from the test object to a detector, where the light includes components having orthogonal polarization states, varying an optical path length difference (OPD) between the components of the light, acquiring an interference signal from the detector while varying the OPD between the components, and determining information about the test object based on the acquired interference signal.

Abstract translation: 在一个方面，本发明的特征在于包括使用显微镜将光引导到测试对象并将从测试对象反射的光引导到检测器的方法，其中光包括具有正交偏振态的分量，改变光路长度差 （OPD），在改变组件之间的OPD的同时获取来自检测器的干扰信号，并且基于所获取的干扰信号确定关于测试对象的信息。

公开(公告)号：US07948636B2

公开(公告)日：2011-05-24

申请号：US12701690

申请日：2010-02-08

Applicant: Peter De Groot ,  Michael J Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Michael J Darwin ,  Robert Stoner ,  Gregg M. Gallatin ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G03F7/70625

Abstract: Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.

Abstract translation: 公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化 或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。

公开(公告)号：US07884947B2

公开(公告)日：2011-02-08

申请号：US11758252

申请日：2007-06-05

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/211

Abstract: Disclosed is an apparatus which includes: an interferometer configured to direct broadband spatially coherent test light to a test surface of a test object over a range of illumination angles and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source; and multi-element detector; and one or more optics configured to direct at least a portion of the combined light to the detector so that different elements of the detector correspond to different illumination angles of a region of the test surface illuminated by the test light.

Abstract translation: 公开了一种装置，其包括：干涉仪，其被配置为在宽度范围的照射角度下将宽带空间相干测试光引导到测试对象的测试表面，并随后将其与参考光组合以形成干涉图案，所述测试和参考光为 源自一个共同的来源; 多元素检测器; 以及一个或多个光学器件，被配置为将组合的光的至少一部分引导到检测器，使得检测器的不同元件对应于由测试光照射的测试表面的区域的不同照明角度。

公开(公告)号：US07289224B2

公开(公告)日：2007-10-30

申请号：US10941631

申请日：2004-09-15

Applicant: Xavier Colonna De Lega ,  Peter J. De Groot ,  Michael Kuchel

Inventor： Xavier Colonna De Lega ,  Peter J. De Groot ,  Michael Kuchel

IPC: G01B9/02

CPC classification number: G03F7/70491 ,  G01B9/02019 ,  G01B9/02022 ,  G01B9/02084 ,  G01B9/02087 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70608 ,  G03F7/70641 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088

Abstract: An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer has a reference optical path and a measurement optical path. Light that passes along the reference optical path reflects at least once from the reference surface and light that passes along the measurement optical path reflects at least once from the object. The detector is configured to detect a low coherence interference signal including light that has passed along the reference optical path and light that has passed along the measurement optical path. The low coherence interference signal is indicative of a spatial relationship between the reference surface and the object.

Abstract translation: 光学系统包括光刻系统，低相干干涉仪和检测器。 光刻系统被配置为用光图案照射物体的一部分并具有参考表面。 低相干干涉仪具有参考光路和测量光路。 沿着基准光路通过的光至少从参考面反射一次，并且沿测量光路通过的光从物体反射至少一次。 检测器被配置为检测包括沿着参考光路已经通过的光和沿着测量光路已经通过的光的低相干干涉信号。 低相干干涉信号指示参考表面和对象之间的空间关系。

公开(公告)号：US07271918B2

公开(公告)日：2007-09-18

申请号：US10795579

申请日：2004-03-08

Applicant: Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/0201 ,  G01B9/02011 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/70

Abstract: A method including comparing information derivable from a scanning interferometry signal for a first surface location of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics for the test object. The information corresponding to the multiple models may include information about at least one amplitude component of a transform of a scanning interferometry signal corresponding to each of the models of the test object.

Abstract translation: 一种方法，包括将来自测试对象的第一表面位置的扫描干涉测量信号的可导出信息与对应于所述测试对象的多个模型的信息进行比较，其中所述多个模型由所述测试对象的一系列特征参数化。 对应于多个模型的信息可以包括关于与测试对象的每个模型相对应的扫描干涉测量信号的变换的至少一个幅度分量的信息。

公开(公告)号：US07239398B2

公开(公告)日：2007-07-03

申请号：US11520031

申请日：2006-09-12

Applicant: Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

Inventor： Peter J. De Groot ,  Robert Stoner ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B11/0675 ,  G01B9/0201 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/211 ,  G01N21/8422 ,  G01N21/9501

Abstract: A method including comparing information derivable from a scanning interferometry signal for a first surface location of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics for the test object. The derivable information being compared may relate to a shape of the scanning interferometry signal for the first surface location of the test object.

公开(公告)号：US07102761B2

公开(公告)日：2006-09-05

申请号：US10855788

申请日：2004-05-27

Applicant: Xavier Colonna De Lega ,  David A. Grigg ,  Peter J. De Groot

Inventor： Xavier Colonna De Lega ,  David A. Grigg ,  Peter J. De Groot

IPC: G01B9/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/0209 ,  G01B11/0675

Abstract: An interferometry method includes: imaging test light reflected from at least a first portion of a test surface to interfere with reference light on a camera and form an interference pattern, wherein the imaging defines a depth of focus for the light reflected from the test surface, and wherein the test light and reference light are derived from a common source; varying an optical path length difference between the test light and reference light over a range larger than the depth of focus, wherein the optical path length difference corresponds to a difference between a first optical path between the common source and the camera for the test light and a second optical path between the common source and the camera for the reference light; and maintaining the first portion of the test surface within the depth of focus as the optical path length difference is varied.

Abstract translation: 干涉测量方法包括：对从测试表面的至少第一部分反射的测试光进行成像，以干涉照相机上的参考光并形成干涉图案，其中所述成像为从所述测试表面反射的光定义焦深， 并且其中所述测试光和参考光源自公共源; 在大于焦深的范围内改变测试光和参考光之间的光程长度差，其中光程长度差对应于测试光的公共源和照相机之间的第一光路之间的差，以及 用于参考光的公共源和照相机之间的第二光路; 以及当所述光路长度差被改变时，将所述测试表面的所述第一部分保持在所述焦深内。

公开(公告)号：US06195168B1

公开(公告)日：2001-02-27

申请号：US09514215

申请日：2000-02-25

Applicant: Xavier Colonna De Lega ,  Peter De Groot ,  Leslie L. Deck

Inventor： Xavier Colonna De Lega ,  Peter De Groot ,  Leslie L. Deck

IPC: G01B0902

CPC classification number: G01B9/02039 ,  G01B9/02024 ,  G01B9/02082 ,  G01B9/0209 ,  G01B11/2441

Abstract: The invention features an interferometry system for a measuring a surface profile or thickness of a measurement object. In one aspect, the interferometry system includes: a broadband infrared source which during operation generates broadband infrared radiation including central wavelengths greater than about 1 micron; a scanning interferometer which during operation directs a first infrared wavefront along a reference path and a second infrared wavefront along a measurement path contacting the measurement object, and, after the second wavefront contacts the measurement object, combines the wavefronts to produce an optical interference pattern, the first and second infrared wavefronts being derived from the broadband infrared radiation; a detector producing data in response to the optical interference pattern; and a controller which during operation causes the scanning interferometer to vary the optical path difference between the reference and measurement paths over a range larger than the coherence length of the broadband source and analyzes the data as a function of the varying optical path difference to determine the surface profile.

Abstract translation: 本发明的特征在于用于测量测量对象的表面轮廓或厚度的干涉测量系统。 在一个方面，干涉测量系统包括：宽带红外光源，其在操作期间产生包括大于约1微米的中心波长的宽带红外辐射; 扫描干涉仪，其在操作期间沿着参考路径引导第一红外波前沿，并沿着与所述测量对象接触的测量路径引导第二红外波前，并且在所述第二波前接触所述测量对象之后，组合所述波前以产生光学干涉图案， 第一和第二红外波前是从宽带红外辐射得到的; 响应于光学干涉图案产生数据的检测器; 以及控制器，其在操作期间使得扫描干涉仪在大于宽带源的相干长度的范围上改变参考和测量路径之间的光程差，并且根据变化的光程差分析数据以确定 表面轮廓。

公开(公告)号：US08248617B2

公开(公告)日：2012-08-21

申请号：US12427079

申请日：2009-04-21

Applicant: Peter De Groot ,  Jan Liesener ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Jan Liesener ,  Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/95607 ,  G03F7/70633 ,  Y10T29/49004

Abstract: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.

Abstract translation: 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。

公开(公告)号：US07889355B2

公开(公告)日：2011-02-15

申请号：US11757720

申请日：2007-06-04

Applicant: Xavier Colonna De Lega ,  Robert Stoner ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Robert Stoner ,  Peter De Groot

IPC: G01B9/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。