公开(公告)号：US20050264797A1

公开(公告)日：2005-12-01

申请号：US11136664

申请日：2005-05-25

Applicant: Hiroyuki Nakano ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Akira Hamamatsu ,  Hisafumi Iwata ,  Tetsuya Watanabe ,  Takahiro Jingu ,  Hideki Fukushima

Inventor： Hiroyuki Nakano ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Akira Hamamatsu ,  Hisafumi Iwata ,  Tetsuya Watanabe ,  Takahiro Jingu ,  Hideki Fukushima

IPC: G01B11/30 ,  G01N21/88 ,  G01N21/89 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/956 ,  G01N2021/8905 ,  G01N2021/9513

Abstract: The present invention relates to a defect detection apparatus and method by which foreign particles and circuit pattern defects can be detected in distinction from the edge roughness of wiring on the substrate. The defect detection apparatus comprises an irradiation optical system includes: a beam expander; an optical member group formed by stacking multiple plate-like optical members each having a different optical path length at least in a beam-converging direction in order to admit the laser beam with the beam diameter extended by the beam expander and emit multiple slit-like beams each spatially reduced in coherence in the beam-converging direction; and beam-converging optical system by which the multiple slit-like beams each emitted from the optical member group is converged into a slit-like beam in the beam-converging direction and the slit-like beam is irradiated from an oblique direction onto the surface of the subject.

Abstract translation: 本发明涉及一种缺陷检测装置和方法，通过该缺陷检测装置和方法可以检测与基板上的布线的边缘粗糙度相关的异物和电路图案缺陷。 缺陷检测装置包括：照射光学系统，包括：扩束器; 光学构件组，其通过至少在束会聚方向上堆叠具有不同光程长度的多个板状光学构件而形成，以便允许具有由扩束器延伸的光束直径的激光束并且发射多个狭缝状 光束在束收敛方向上的相干性在空间上减小; 以及束光聚光光学系统，其中从光学构件组发射的多个狭缝状光束在束会聚方向上会聚到狭缝状光束中，并且狭缝状光束从倾斜方向照射到表面上 的主题。

公开(公告)号：US20050213086A1

公开(公告)日：2005-09-29

申请号：US11086442

申请日：2005-03-23

Applicant: Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

Inventor： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC: G01N21/88 ,  G01N21/956 ,  H01L21/66

CPC classification number: G01N21/956

Abstract: An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.

Abstract translation: 用于检查图案以检测小图案缺陷的装置具有照明光源，作为具有多个照明部的照明光学系统，所述照明光学系统具有多个照明部分，用于将照明光束的光路从多个照明部分切换到构成被检查物体的板的表面 方向不同的检测光学系统，使用用于聚焦来自照明板的反射衍射光的物镜具有可变放大倍数的检测光学系统，具有可变倍率的聚焦光学系统，其能够通过会聚的反射衍射光聚焦光学图像，具有期望的 聚焦放大率和用于检测由聚焦光学系统聚焦的光学图像以将其转换成图像信号的光学检测器，用于将图像信号转换为数字图像信号的A / D转换器和用于处理数字图像信号的图像信号处理器 图像信号来检测缺陷。

公开(公告)号：US20050206887A1

公开(公告)日：2005-09-22

申请号：US11128352

申请日：2005-05-13

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

Abstract: An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.

Abstract translation: 用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元， 可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。 信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。 显示单元显示由信号处理器提取的缺陷的信息。

公开(公告)号：US06894773B2

公开(公告)日：2005-05-17

申请号：US09805188

申请日：2001-03-14

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

Abstract: A processing method for semiconductor devices in a semiconductor fabrication line includes processing a substrate in a first processing apparatus, transferring the substrate processed in the first processing apparatus to a detecting apparatus without removal of the substrate from the semiconductor fabrication line while continuing fabrication of the semiconductor devices, detecting foreign particle defects on the substrate transferred to the detecting apparatus, and determining a foreign particle generation condition of the processing apparatus based on a data from the detecting.

Abstract translation: 半导体制造线中的半导体器件的处理方法包括在第一处理设备中处理衬底，将在第一处理设备中处理的衬底转移到检测设备，而不从半导体制造线移除衬底，同时继续制造半导体 检测转移到检测装置的基板上的异物缺陷，以及根据来自检测的数据确定处理装置的异物生成条件。

公开(公告)号：US06411377B1

公开(公告)日：2002-06-25

申请号：US09362135

申请日：1999-07-28

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N2101

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention provides a defect inspecting apparatus and a defect inspection method for inspecting an object of inspection for a defect such as a foreign particle existing on the object wherein, by using a high-efficiency illumination optical system for radiating an illumination beam to the object of inspection from a direction to reduce the intensity of a scattered light generated by a pattern on the object of inspection, it is possible to decrease the intensity of the scattered light from the pattern which causes a variation of a signal and, in addition, by using a means for setting a detection threshold value based on a variation of a signal computed for each area in a chip on the object of inspection, the detection threshold value can be made small and, thus, the sensitivity as well as the throughput can be raised.

Abstract translation: 本发明提供了一种缺陷检查装置和缺陷检查方法，用于检查物体上存在的异物等缺陷的检查对象，其中，通过使用用于向对象照射照明光束的高效率照明光学系统 从减少由检查对象上的图案产生的散射光的强度的方向进行检查的情况下，可以降低来自图案的散射光的强度，导致信号的变化，另外，由 使用基于针对检查对象中的芯片中的每个区域计算的信号的变化来设置检测阈值的装置，可以使检测阈值较小，因此灵敏度以及吞吐量可以是 上调。

公开(公告)号：US5135303A

公开(公告)日：1992-08-04

申请号：US658258

申请日：1991-02-20

Applicant: Sachio Uto ,  Yoshimasa Ohshima

Inventor： Sachio Uto ,  Yoshimasa Ohshima

IPC: G01B11/00 ,  G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  G11B5/84 ,  G11B33/10

CPC classification number: G11B5/84 ,  G01N21/88 ,  G11B33/10

Abstract: The present invention relates to a method of inspecting a defect on a surface of a test piece, and to an apparatus using this method. The method comprises the steps of dividing the surface of the test piece into a plurality of inspection regions so as to detect image signals from said plurality of inspection regions thus divided; measuring feature values of background levels from image signals detected at divided inspection regions adjacent to the plurality of inspection regions thus divided; and representing the image signals detected at the adjacent divided inspection regions in binary form on the basis of threshold values set based on the measured feature values, thereby detecting fine defects on the surface of the test piece based on the image signals represented in binary form.

Abstract translation: 本发明涉及一种检查试件表面上的缺陷的方法以及使用该方法的装置。 该方法包括以下步骤：将测试片的表面划分成多个检查区域，以便检测来自所分割的所述多个检查区域的图像信号; 从与所分割的多个检查区域相邻的划分的检查区域检测到的图像信号测量背景级别的特征值; 并且基于基于测量的特征值设置的阈值来表示在相邻的分割检查区域检测到的图像信号，从而基于以二进制形式表示的图像信号来检测测试片表面上的细小缺陷。

公开(公告)号：US07768634B2

公开(公告)日：2010-08-03

申请号：US12192578

申请日：2008-08-15

Applicant: Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

Inventor： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC: G01N21/00

CPC classification number: G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

Abstract: An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

Abstract translation: 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。

公开(公告)号：US07692779B2

公开(公告)日：2010-04-06

申请号：US11244080

申请日：2005-10-06

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N21/00

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus for detecting defects on a specimen including an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.

Abstract translation: 一种用于检测试样上的缺陷的装置，包括照射光学单元，该照明光学单元将激光倾斜地突出到在一个方向上比沿垂直于所述一个方向的横向方向在一个方向上更长的区域;安装所述样本的台单元 检测光学单元，其利用图像传感器检测在所述图像传感器上形成有从所述一个方向的两个方向和横向方向反射的光形成的光，并且在所述图像传感器上形成两个方向的反射光 当所述表移动时，信号处理器处理从所述检测光学单元的所述图像传感器输出的信号，以提取所述样本的缺陷。 一种显示由所述信号处理器提取的缺陷信息的显示单元。

公开(公告)号：US20090323054A1

公开(公告)日：2009-12-31

申请号：US12555530

申请日：2009-09-08

Applicant: Akira HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

Inventor： Akira HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC: G01N21/88 ,  G06F19/00

CPC classification number: G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

Abstract: The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

Abstract translation: 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

公开(公告)号：US07639350B2

公开(公告)日：2009-12-29

申请号：US11681981

申请日：2007-03-05

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N21/00

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method for detecting defects on a specimen includes mounting a specimen on a table with which is movable, obliquely projecting a laser as a line onto a surface of the specimen, detecting with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks scattered light resulting from repetitive patterns formed on the specimen, processing a signal outputted from the image sensor to extract defects of the specimen, and a displaying information of defects extracted by the signal processor.

Abstract translation: 一种检测试样缺陷的方法，其特征在于，将试样安装在可移动的台面上，将作为线的激光线倾斜投射到试样的表面上，用图像传感器检测由试样反射的光形成的光的图像 通过滤波器，该滤波器阻挡由样本上形成的重复图案产生的散射光，处理从图像传感器输出的信号，提取样本的缺陷，以及由信号处理器提取的缺陷的显示信息。