摘要:
There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of developed priming layer, wherein the pattern of developed priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of developed priming layer on the first layer. The priming material has at least one unit of Formula I In Formula I: R1 through R6 are D, alkyl, aryl, or silyl, where adjacent R groups can join together to form an aromatic ring; X is a single bond, H, D, or a leaving group; Y is H, D, alkyl, aryl, silyl, or vinyl; a-f are an integer from 0-4; m, p and q are an integer of 0 or greater.
摘要:
There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has Formula I In Formula I: Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and in an integer from 0-4; and n is an integer greater than 0.
摘要:
There is provided a process for forming a layer of electroactive material having a substantially flat profile. The process includes the steps of providing a workpiece having at least one active area; depositing a liquid composition including the electroactive material onto the workpiece in the active area, to form a wet layer; treating the wet layer on the workpiece at a controlled temperature in the range of −25 to 80° C. and under a vacuum in the range of 10−6 to 1,000 Torr, for a first period of 1-100 minutes, to form a partially dried layer; and heating the partially dried layer to a temperature above 100° C. for a second period of 1-50 minutes to form a dried layer.
摘要:
There is disclosed a compound having Formula I In Formula I: Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and is an integer from 0-4; and n is an integer greater than 0.
摘要:
There is provided a compound having at least one unit of Formula I where Ar1, Ar2, and Ar3 are the same or different and have Formula II In Formula II: R1 is the same or different at each occurrence and is D, alkyl, or silyl, or adjacent R1 groups can be joined together to form a 6-membered fused aromatic ring; Q is the same or different at each occurrence and is phenyl, naphthyl, substituted naphthyl, an N,O,S-heterocycle, or a deuterated analog thereof; a is an integer from 1-5; b is an integer from 0-5, with the proviso that when b=5, c=0; and c is an integer from 0-4. In the compound not all Ar1, Ar2, and Ar3 are the same.
摘要:
There is disclosed a compound having Formula I In Formula I: Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and is an integer from 0-4; and n is an integer greater than 0.
摘要翻译:公开了具有式I的化合物在式I中:Ar 1至Ar 4相同或不同,为芳基; L是螺基,金刚烷基,双环环己基,氘代类似物或其取代衍生物; R 1在每次出现时相同或不同,为D,F,烷基,芳基,烷氧基,甲硅烷基或可交联基团,其中相邻的R 1基团可以连接在一起形成芳香环; R2在每次出现时相同或不同,为H,D或卤素; a在每次出现时相同或不同,为0-4以上的整数; 并且n是大于0的整数。
摘要:
There is disclosed a compound having Formula I or Formula I′: In Formula I and Formula I′: Ar1 and Ar2 are the same or different and are aryl groups; R1 through R5 are independently the same or different at each occurrence and are D, F, alkyl groups, aryl groups, alkoxy groups, silyl groups, or crosslinkable groups; R6 is H, D, or halogen; a through e are independently an integer from 0 to 4; f is 1 or 2; g is 0, 1 or 2; h is 1 or 2; and n is an integer greater than 0.
摘要:
This invention relates to anthracene derivatives that are useful in electroluminescent applications. It also relates to electronic devices in which the active layer includes such an anthracene derivative.