公开(公告)号：US20230116396A1

公开(公告)日：2023-04-13

申请号：US18079589

申请日：2022-12-12

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Kallol Bera ,  Joseph Yudovsky

IPC: H01L21/687 ,  H01L21/683 ,  H01L21/67

Abstract: Susceptor assemblies comprising a susceptor base and a plurality of pie-shaped skins thereon are described. A pie anchor can be positioned in the center of the susceptor base to hold the pie-shaped skins in place during processing.

公开(公告)号：US11557501B2

公开(公告)日：2023-01-17

申请号：US16902253

申请日：2020-06-15

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Kallol Bera ,  Joseph Yudovsky

IPC: H01L21/687 ,  H01L21/683 ,  H01L21/67

Abstract: Susceptor assemblies comprising a susceptor base and a plurality of pie-shaped skins thereon are described. A pie anchor can be positioned in the center of the susceptor base to hold the pie-shaped skins in place during processing.

公开(公告)号：US11430680B2

公开(公告)日：2022-08-30

申请号：US16388132

申请日：2019-04-18

Applicant: Applied Materials, Inc.

Inventor： Abraham Ravid ,  Kevin Griffin ,  Joseph Yudovsky ,  Kaushal Gangakhedkar ,  Dmitry A. Dzilno ,  Alex Minkovich

IPC: H01L21/67 ,  C23C16/52 ,  H01L21/687 ,  C23C16/455 ,  C23C16/458

Abstract: Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.

公开(公告)号：US11384648B2

公开(公告)日：2022-07-12

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy Melnik ,  Sukti Chatterjee ,  Kaushal Gangakhedkar ,  Jonathan Frankel ,  Lance A. Scudder ,  Pravin K. Narwankar ,  David Alexander Britz ,  Thomas Knisley ,  Mark Saly ,  David Thompson

IPC: F01D5/28 ,  F01D9/02 ,  C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D25/12 ,  F01D25/28 ,  F23R3/28 ,  C07F11/00 ,  F01D25/14

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US11180851B2

公开(公告)日：2021-11-23

申请号：US16438382

申请日：2019-06-11

Applicant: Applied Materials, Inc.

Inventor： Colin C. Neikirk ,  Pravin K. Narwankar ,  Kaushal Gangakhedkar ,  Visweswaren Sivaramakrishnan ,  Jonathan Frankel ,  David Masayuki Ishikawa ,  Quoc Truong ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/442

Abstract: A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated and coupled to the motors, a controller configured to cause the motors to rotate the chamber in a first direction about an axial axis at a rotation speed sufficient to force the particles to be centrifuged against an inner diameter of the chamber, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

公开(公告)号：US11174552B2

公开(公告)日：2021-11-16

申请号：US16438371

申请日：2019-06-11

Applicant: Applied Materials, Inc.

Inventor： Colin C. Neikirk ,  Pravin K. Narwankar ,  Kaushal Gangakhedkar ,  Visweswaren Sivaramakrishnan ,  Jonathan Frankel ,  David Masayuki Ishikawa ,  Quoc Truong ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/442

Abstract: A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated, wherein the rotary vacuum chamber is coupled to the motors, a controller configured to cause the motors to rotate the rotary vacuum chamber about an axial axis of the rotary vacuum chamber such that the particles undergo tumbling agitation, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the rotary vacuum chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

公开(公告)号：US11094577B2

公开(公告)日：2021-08-17

申请号：US15927066

申请日：2018-03-20

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Kaushal Gangakhedkar

IPC: H01L21/683 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C23C16/50 ,  H01L21/687

Abstract: Described are apparatus and methods for processing a semiconductor wafer so that the wafer remains in place during processing. The wafer is subjected to a pressure differential between the top surface and bottom surface so that sufficient force prevents the wafer from moving during processing, the pressure differential generated by applying a decreased pressure to the back side of the wafer.

公开(公告)号：US20200312702A1

公开(公告)日：2020-10-01

申请号：US16902253

申请日：2020-06-15

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar ,  Kallol Bera ,  Joseph Yudovsky

IPC: H01L21/687 ,  H01L21/683 ,  H01L21/67

Abstract: Susceptor assemblies comprising a susceptor base and a plurality of pie-shaped skins thereon are described. A pie anchor can be positioned in the center of the susceptor base to hold the pie-shaped skins in place during processing.

公开(公告)号：US20190169444A1

公开(公告)日：2019-06-06

申请号：US16203456

申请日：2018-11-28

Applicant: Applied Materials, Inc.

Inventor： Kaushal Gangakhedkar

IPC: C09D5/08 ,  C23C14/08 ,  C23C16/40 ,  C04B41/45 ,  C04B41/48 ,  C04B41/50

Abstract: An anti-wetting coating including a ceramic material and a second material that may include, but not be limited to, pure amorphous silicon, hydrogenated silicon, silicon hydride, polytetrafluoroethylene (PTFE), perfluoroalkoxy alkanes (PFA), fluorinated ethylene propylene (FEP), polyvinylidene fluoride (PVDF), low density polyethylene (PELD), polyamide, polyimide, polyimide-amide, polyurea, polyurethane, polythiurea, polyester, polyimine, and combinations thereof.

公开(公告)号：US10312120B2

公开(公告)日：2019-06-04

申请号：US14774377

申请日：2014-03-14

Applicant: Applied Materials, Inc.

Inventor： Abraham Ravid ,  Kevin Griffin ,  Joseph Yudovsky ,  Kaushal Gangakhedkar ,  Dmitry A. Dzilno ,  Alex Minkovich

IPC: H01L21/67 ,  C23C16/44 ,  H01L21/687 ,  C23C16/52 ,  C23C16/455 ,  C23C16/458

Abstract: Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.