PROCESS FOR PRODUCING MINERAL OIL USING SURFACTANTS BASED ON A MIXTURE OF C20 GUERBET-, C22 GUERBET-, C24 GUERBET-CONTAINING HYDROCARBYL ALKOXYLATES
    34.
    发明申请
    PROCESS FOR PRODUCING MINERAL OIL USING SURFACTANTS BASED ON A MIXTURE OF C20 GUERBET-, C22 GUERBET-, C24 GUERBET-CONTAINING HYDROCARBYL ALKOXYLATES 有权
    使用C20 GUERBET-,C22GERBET-,C24含碳氢化烷基酯的混合物生产矿物油的方法

    公开(公告)号:US20130102504A1

    公开(公告)日:2013-04-25

    申请号:US13659454

    申请日:2012-10-24

    Applicant: BASF SE

    CPC classification number: C09K8/584

    Abstract: The present invention relates to a surfactant mixture comprising at least three ionic surfactants which differ in terms of the hydrocarbyl moiety (R1)(R2)—CH—CH2— and are of the general formula (I) where R1, R2, A0, k, X, o, Y, a, b, M are each as defined in the description and the claims. The invention further relates to the use and preparation thereof, and to aqueous surfactant formulations comprising the mixtures, and to processes for producing mineral oil by means of Winsor type III microemulsion flooding, in which the aqueous surfactant formulation is injected into a mineral oil deposit through injection wells and crude oil is withdrawn from the deposit through production wells.

    Abstract translation: 本发明涉及包含至少三种离子表面活性剂的表面活性剂混合物,它们在烃基部分(R 1)(R 2)-CH-CH 2 - 和通式(I)方面不同,其中R1,R2,A0,k ,X,o,Y,a,b,M各自如说明书和权利要求书中所定义。 本发明进一步涉及其使用和制备以及包含该混合物的含水表面活性剂制剂,以及通过Winsor III型微乳液淹水制备矿物油的方法,其中将表面活性剂水溶液注入矿物油沉积物中 注入井和原油通过生产井从沉积物中取出。

    Cleavable additives for use in a method of making a semiconductor substrate

    公开(公告)号:US11742197B2

    公开(公告)日:2023-08-29

    申请号:US17044928

    申请日:2019-04-02

    Applicant: BASF SE

    CPC classification number: H01L21/02057 C07C271/12

    Abstract: The use of an organic compound as cleavable additive, preferably as cleavable surfactant, in the modification and/or treatment of at least one surface of a semiconductor substrate is described. Moreover, it is described a method of making a semiconductor substrate, comprising contacting at least one surface thereof with an organic compound, or with a composition comprising it, to treat or modify said surface, cleaving said organic compound into a set of fragments and removing said set of fragments from the contacted surface. More in particular, a method of cleaning or rinsing a semiconductor substrate or an intermediate semiconductor substrate is described. In addition, a compound is described which is suitable for the uses and methods pointed out above and which preferably is a cleavable surfactant.

    Associative copolymers with hydrophobic quaternized (meth)acrylamide and (meth)acrylic acid derivatives

    公开(公告)号:US11613686B2

    公开(公告)日:2023-03-28

    申请号:US15734557

    申请日:2019-06-03

    Applicant: BASF SE

    Abstract: The present invention relates to a process for the preparation of a water-soluble copolymer comprising the step of reacting a monomer (a) of formula (I), (1) wherein Q1, Q2, R1 to R7 and X have the meaning as indicated in the description and claims with at least one monoethylenically unsaturated, anionic monomer (b), preferably representing a monoethylenically unsaturated monomer comprising at least one carboxy, phosphonate or sulfonate group and salts thereof, preferably their ammonium salts or alkaline-earth metal salts or alkali metal salts; and at least one monoethylenically unsaturated, non-ionic monomer (c). The present invention further relates to a copolymer obtainable by said process and its use in enhanced oil recovery (EOR), a formulation comprising said copolymer and a method of oil production uses said formulation.

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