公开(公告)号：US20200091246A1

公开(公告)日：2020-03-19

申请号：US16574055

申请日：2019-09-17

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shipei Li ,  Wusheng Li ,  Qi Yao ,  Dongsheng Li ,  Fang He ,  Huili Wu ,  Renquan Gu ,  Sheng Xu ,  Wei He ,  Dongsheng Yin ,  Ying Zhao

IPC: H01L27/30 ,  H01L51/00 ,  H01L51/44

Abstract: A photosensitive sensor and a method of manufacturing the photosensitive sensor are disclosed. The photosensitive sensor includes a thin film transistor and a photosensitive element on a substrate, wherein the photosensitive element includes a first electrode, a second electrode, and a photosensitive layer between the first electrode and the second electrode. The second electrode is connected to a drain electrode of the thin film transistor. An orthographic projection of an active layer of the thin film transistor on the substrate is within an orthographic projection of the second electrode on the substrate. The second electrode includes at least two stacked conductive layers, at least one of the at least two stacked conductive layers being a light shielding metal layer.

公开(公告)号：US10483129B2

公开(公告)日：2019-11-19

申请号：US15717527

申请日：2017-09-27

Applicant: BOE Technology Group Co., Ltd.

Inventor： Jing Feng ,  Seung Jin Choi ,  Fangzhen Zhang ,  Wusheng Li ,  Zhijun Lv ,  Ce Ning ,  Jiushi Wang

IPC: H01L21/4763 ,  H01L21/027 ,  H01L29/66 ,  H01L29/786 ,  G03F7/00 ,  H01L27/12 ,  G03F7/38 ,  G03F7/20 ,  G03F7/40 ,  H01L21/321

Abstract: The disclosure discloses a method for roughening a surface of a metal layer, a thin film transistor, and a method for fabricating the same. The method for roughening the surface of a metal layer includes: forming a first photo-resist layer on the surface of the metal layer, and processing the first photo-resist layer at high temperature; and stripping the first photo-resist layer to roughen the surface of the metal layer.

公开(公告)号：US10467591B2

公开(公告)日：2019-11-05

申请号：US15521976

申请日：2016-10-21

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Wusheng Li ,  Zhengliang Li ,  Zhen Liu

IPC: G01N21/00 ,  G06Q10/10 ,  G06F8/65

Abstract: A system and a method for detecting a substrate and a manufacturing device are disclosed. The detection system includes: an emitting unit and a control unit; wherein the emitting unit provides a first reference light and a second reference light, the first reference light propagates to the control unit, the second reference light is modulated by the substrate to generate a test light, the test light propagates to the control unit; the control unit obtains and compares a power of the first reference light and a power of the test light so as to determine whether a foreign matter is present on a surface of the substrate. The detection system can prevent foreign matters such as photoresist from influencing other manufacturing devices such as cleaning and deposition devices, which is beneficial to the maintenance and service of the manufacturing devices.

公开(公告)号：US20190181161A1

公开(公告)日：2019-06-13

申请号：US16322420

申请日：2018-05-15

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Wusheng Li

IPC: H01L27/12 ,  G02F1/1345 ,  G02F1/1362

Abstract: Arrangements of the present disclosure provide a manufacturing method. The manufacturing method includes forming a first conductive pattern comprising a first signal line on a base substrate. The manufacturing method includes forming a second conductive pattern comprising a second conductive line on a side of the first conductive pattern away from the base substrate. The first signal line and the second signal line intersect with each other and are insulated from each other. An overlapping region is formed by orthogonal projections of the second signal line and the first signal line on the base substrate. A length of an edge of the overlapping region extending in a direction along with the second signal line is greater than a linear distance between two vertices of the edge.

公开(公告)号：US10128321B2

公开(公告)日：2018-11-13

申请号：US15326373

申请日：2016-03-01

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Wusheng Li ,  Shi Shu ,  Xiaolong He

IPC: H01L29/08 ,  H01L27/32 ,  G02F1/161 ,  H01L51/56 ,  H01L51/00 ,  H01L27/12 ,  H01L51/50

Abstract: The present disclosure provides a pixel isolation wall and its manufacturing method. The pixel isolation wall includes an oleophilic layer arranged on a substrate on which a TFT array and a pixel electrode array is formed, and an oleophobic layer arranged on the oleophilic layer and configured to define, together with the oleophilic layer, a plurality of recess regions corresponding to the pixel electrode array.

公开(公告)号：US10126848B2

公开(公告)日：2018-11-13

申请号：US15030601

申请日：2015-12-10

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Wusheng Li ,  Zhanfeng Cao

IPC: G06F3/00 ,  G06F3/041 ,  B32B15/01 ,  H01L27/32

Abstract: The present application discloses a touch substrate, a display device having the same, and a manufacturing method thereof. The touch substrate comprises a touch electrode and a diffusive reflector disposed on the touch electrode.

公开(公告)号：US20180226269A1

公开(公告)日：2018-08-09

申请号：US15717527

申请日：2017-09-27

Applicant: BOE Technology Group Co., Ltd.

Inventor： Jing Feng ,  Seung Jin Choi ,  Fangzhen Zhang ,  Wusheng Li ,  Zhijun Lv ,  Ce Ning ,  Jiushi Wang

IPC: H01L21/4763 ,  H01L21/027 ,  H01L29/66 ,  H01L29/786 ,  H01L27/12 ,  G03F7/38 ,  G03F7/20 ,  G03F7/40 ,  G03F7/00

CPC classification number: H01L21/47635 ,  G03F7/0035 ,  G03F7/20 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274 ,  H01L21/321 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/66969 ,  H01L29/78618 ,  H01L29/7869

Abstract: The disclosure discloses a method for roughening a surface of a metal layer, a thin film transistor, and a method for fabricating the same. The method for roughening the surface of a metal layer includes: forming a first photo-resist layer on the surface of the metal layer, and processing the first photo-resist layer at high temperature; and stripping the first photo-resist layer to roughen the surface of the metal layer.