摘要:
A PMR head comprises a substrate, a magnetic pole formed over the substrate, the pole having a pole tip having a cross-sectional tapered shape wherein the pole tip is surrounded by a write gap layer, an integrated shield comprising side shields on the substrate laterally surrounding the pole tip and a trailing shield overlying the pole tip and integral with the side shields.
摘要:
A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.
摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
A perpendicular magnetic recording (PMR) head with single or double coil layers has a small write shield stitched onto a main write shield. The stitched shield allows the main write pole to produce a vertical write field with sharp vertical gradients that is reduced on both sides of the write pole so that adjacent track erasures are eliminated. From a fabrication point of view, both the main pole and the stitched shield are defined and formed using a single photolithographic process, a trim mask and CMP lapping process so that the main shield can be stitched onto a self-aligned main pole and stitched shield.
摘要:
For high track density recording, tighter reader and writer track width control are essential. This has been achieved by using the write gap layer as the plating seed on which the upper pole was electro-formed so that the width of the GMR pedestal serves to define the device's write track width.
摘要:
Aggressive (i.e. tight tolerance) stitching offers several advantages for magnetic write heads but at the cost of some losses during pole trimming. This problem has been overcome by replacing the alumina filler layer, that is used to protect the stitched pole during trimming, with a layer of electroplated material. Because of the superior step coverage associated with the plating method of deposition, pole trimming can then proceed without the introduction of stresses to the stitched pole while it is being trimmed.
摘要:
A PMR write head has a stitched shield formation which results in a strong perpendicular write field with sharp vertical gradients. The shape of the stitched shield is determined by two design parameters, d=½(WSWSLE−WMPTE), and TSWS, where WSWSLE is the width of the leading edge of the stitched shield in the ABS plane, WMPTE is the width of the trailing edge of the main magnetic pole in the ABS plane and TSWS is the thickness of the stitched shield. By a proper choice of these parameters, the write field of the head is sharply limited in the cross-track direction, so that adjacent track erasures are eliminated.
摘要翻译:PMR写头具有缝合的屏蔽结构,其形成具有尖锐垂直梯度的强垂直写入场。 缝合屏蔽的形状由两个设计参数d =½(W> SWSLE-> W> MP MP TE TE TE TE SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB and and and and and and and and) W SHSLE SUB>是ABS平面中缝合屏蔽的前缘的宽度,W> MPTE SUB>是ABS平面中主磁极的后缘的宽度 而T SWS SUB>是缝合屏蔽的厚度。 通过这些参数的适当选择,头部的写入场在交叉轨道方向上被大大限制,从而消除了相邻的轨迹擦除。
摘要:
An inductive-type write head and its method of fabrication are disclosed. The write head has a vertically separated two-element planar coil of reduced resistance which is the result of forming the lower of the two coils with windings of a greater height and substantially larger cross-sectional area than those of the upper coil. The formation of a lower coil with greater height is possible because of a surface planarization that allows separating the coils by an alumina layer of minimal thickness. This method allows the reduction of coil resistance without the necessity of enlarging the head dimensions. The reduced resistance results in lower power consumption and the elimination of pole tip protrusion caused by excessive heating during operation.
摘要:
A merged read/write magnetic recording head comprises a low magnetic moment first magnetic shield layer over a substrate. A read gap layer with a magnetoresistive head is formed over the first shield layer. A shared pole comprises a low magnetic moment second magnetic shield layer plated on a sputtered seed PLM layer over the read gap layer, a non-magnetic layer plated over the PLM layer and a HMM lower pole layer plated over the second magnetic shield layer. A write gap layer is formed over the first high magnetic moment pole layer of the shared pole. An upper pole comprises a high magnetic moment pole layer over the write gap layer.
摘要:
A trimmed upper pole piece for a magnetic write head, said pole piece having a tapered profile that is widest at its trailing edge. Such a pole piece is capable of writing narrow tracks with sharply and well defined patterns and minimal overwriting of adjacent tracks. The necessary taper is produced by using NiCr, NiFeCr, Rh or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant. As a result, the write gap does not protrude to mask the effects of the ion-beam etch used to form the taper.