Abstract:
Provided are a pattern formation method and a method for manufacturing a polarizing plate using the pattern formation method, the pattern formation method having: a step for forming, on a substrate, a linear guide pattern which is arranged at a predetermined pitch and is compatible with a portion of block chains of a block copolymer, and a neutral pattern embedded in the pattern of the guide pattern; a step for forming a layer including a block copolymer on the guide pattern and the neutral pattern; a step for heat-treating the layer including the block copolymer and forming a lamellar structure in which lamellar boundaries are arranged perpendicular to the substrate by microphase separation of the block copolymer; and a step for selectively removing a portion of the block chains of the block copolymer and thereby forming a line-and-space-shaped fine pattern having a smaller pitch than the guide pattern.
Abstract:
Provided is a polarizing plate having a wire grid structure, including: a transparent substrate; grid-shaped protrusions that are arranged in a one-dimensional grid shape on the transparent substrate at a pitch shorter than a wavelength of light in a use band and extend in a predetermined direction, in which the grid-shaped protrusions include a first grid-shaped protrusion group arranged, at a first pitch P1 and a second grid-shaped protrusion group arranged at a second pitch P2 between the adjacent grid-shaped protrusions of the first grid-shaped protrusion group, and in which a width W1 of the grid-shaped protrusion in the first grid-shaped protrusion group is larger than a width W2 of the grid-shaped protrusion in the second grid-shaped protrusion group. In addition, provided is an optical device including the polarizing plate.
Abstract:
Provided are a polarizing plate having excellent optical characteristics, and a method for manufacturing the polarizing plate. The present invention is provided with: a translucent substrate through which light passes in a working band; a bundle structure layer constituted of a columnar sheaf comprising one or more material from among dielectrics, metals, and semiconductors, the bundle structure layer being formed on the translucent substrate; an absorption layer formed on the bundle structure layer; a dielectric layer formed on the absorption layer; and a reflection layer formed on the dielectric layer and arranged as a one-dimensional lattice at a pitch that is smaller than the wavelength of the light in the working band. Because the bundle structure layer increases light absorption and light scattering, the result is that reflectivity can be reduced and excellent optical characteristics obtained.
Abstract:
Provided is a polarizing plate that is a polarizing plate having a wire grid structure, and includes a transparent substrate and a plurality of protrusions that extend in a first direction on the transparent substrate and are periodically arranged at a pitch shorter than a wavelength of light in a use band. Each of the protrusions includes a reflective layer, a multilayer film, and an optical property improving layer located between the reflective layer and the multilayer film. The optical property improving layer contains an oxide that contains a constituent element of which the reflective layer is composed. An etching rate of the optical property improving layer with respect to a chlorine-based gas is no less than 6.7 times and no more than 15 times an etching rate of the multilayer film.
Abstract:
Provided is a polarizing plate having a wire grid structure, including: a transparent substrate; grid-shaped protrusions that are arranged in a one-dimensional grid shape on the transparent substrate at a pitch shorter than a wavelength of light in a use band and extend in a predetermined direction, in which the grid-shaped protrusions include a first grid-shaped protrusion group arranged, at a first pitch P1 and a second grid-shaped protrusion group arranged at a second pitch P2 between the adjacent grid-shaped protrusions of the first grid-shaped protrusion group, and in which a width W1 of the grid-shaped protrusion in the first grid-shaped protrusion group is larger than a width W2 of the grid-shaped protrusion in the second grid-shaped protrusion group. In addition, provided is an optical device including the polarizing plate.
Abstract:
To provide an inorganic polarizing plate which, when used in structures having different used wavelength bands, can reduce reflectance by using a common structure, making it possible to achieve a predetermined light extinction ratio. The inorganic polarizing plate has a substrate that is transparent to light in a used bandwidth, a reflective layer that is composed of grids that are formed on one surface of the substrate with a pitch that is smaller than a wavelength of light in the used bandwidth, a dielectric layer that is stacked on the reflective layer, and an absorbing layer containing FeSi fine particles.
Abstract:
The present application provides a retardation element, having a first birefringent layer; and a second birefringent layer which has approximately the same average thickness as that of the first birefringent layer and contacts the first birefringent layer such that an angle formed between a first line segment representing the principal axis of refractive index anisotropy of the first birefringent layer and a second line segment representing the principal axis of refractive index anisotropy of the second birefringent layer is neither 0° nor 180° when the first line segment and the second line segment are projected on the transparent substrate such that an end A of the first line segment at a side of the transparent substrate and an end B of the second line segment at a side of the transparent substrate coincide with each other.
Abstract:
To provide an inorganic polarizing plate which, when used in structures having different used wavelength bands, can reduce reflectance by using a common structure, making it possible to achieve a predetermined light extinction ratio. The inorganic polarizing plate has a substrate that is transparent to light in a used bandwidth, a reflective layer that is composed of grids that are formed on one surface of the substrate with a pitch that is smaller than a wavelength of light in the used bandwidth, a dielectric layer that is stacked on the reflective layer, and an absorbing layer containing FeSi fine particles.
Abstract:
A wavelength plate, wherein first birefringent layer and second birefringent layer are laminated such that in-plane directions of optical axes of first birefringent layer and second birefringent layer cross each other, wherein the wavelength plate satisfies formulae (1), (2), (3), and (4), and wherein at least one of first birefringent layer and second birefringent layer is obliquely-deposited birefringent layer formed by oblique deposition, Δn1×t1=λ/2 (1) 1.7≦(Δn1×t1)/(Δn2×t2)≦2.7 (2) 5°≦θ1≦30° (3) (2θ1+35°)≦θ2≦(2θ1+50°) (4) where Δn1 represents birefringence of first birefringent layer, Δn2 represents birefringence of second birefringent layer, t1 represents a film thickness of first birefringent layer, t2 represents a film thickness of second birefringent layer, θ1 represents angle between optical axis of first birefringent layer and incident linearly polarized light, θ2 represents angle between optical axis of second birefringent layer and incident linearly polarized light, and λ represents a predetermined value in a range of wavelengths of incident light.
Abstract:
Provided are a heat-absorbing material having high heat resistance and high wavelength selectivity, and a process for producing the same. The heat-absorbing material includes: a heat-resistant metal having the substantially same periodic structure in the light incidence plane as the wavelength of sunlight having a specific wavelength in the wavelength regions of visible light and near-infrared rays; and a cermet formed on the light incidence plane of the heat-resistant metal. Thus, there can be achieved desirable absorption and radiation characteristics being such that absorption is performed in the visible light region meanwhile reflection is performed in the infrared region. Furthermore, the cermet does not need complicated film-formation control, and therefore, the high heat resistance can be maintained.