公开(公告)号：US20170123318A1

公开(公告)日：2017-05-04

申请号：US15359973

申请日：2016-11-23

Applicant: FUJIFILM Corporation

Inventor： Hiromi KANDA ,  Shinichi KANNA ,  Haruki INABE

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/09 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

公开(公告)号：US20170115778A1

公开(公告)日：2017-04-27

申请号：US15401194

申请日：2017-01-09

Applicant: FUJIFILM Corporation

Inventor： Shinichi KANNA

IPC: G06F3/044 ,  B32B27/30 ,  B32B37/00 ,  B32B27/08

CPC classification number: G06F3/044 ,  B32B7/00 ,  B32B7/02 ,  B32B27/08 ,  B32B27/30 ,  B32B27/308 ,  B32B37/025 ,  B32B2037/1253 ,  B32B2307/20 ,  B32B2307/202 ,  B32B2307/40 ,  B32B2307/412 ,  B32B2457/00 ,  B32B2457/20 ,  B32B2457/206 ,  B32B2457/208 ,  G06F2203/04103

Abstract: Provided is a method for producing a laminated material, the method including forming a first transparent resin layer on a base material; and forming a second transparent resin layer directly on the first transparent resin layer, in which the forming a first transparent resin layer is applying an organic solvent-based resin composition on the base material, and the forming a second transparent resin layer is applying a water-based resin composition including an ammonium salt of a monomer having an acid group or an ammonium salt of a resin having an acid group. The method for producing a laminated material can provide a laminated material which exhibits satisfactory layer demarcation, and by which a problem caused by moisture absorption of the transparent resin layer formed using a water-based resin composition in a case in which the laminated material is subjected to a high temperature and high humidity environment for a period of time can be suppressed. Also provided are a laminated material, a transparent laminate, a method for producing a transparent laminate, a capacitance-type input device, and an image display device.

公开(公告)号：US20160357290A1

公开(公告)日：2016-12-08

申请号：US15239904

申请日：2016-08-18

Applicant: FUJIFILM Corporation

Inventor： Shinichi KANNA

IPC: G06F3/044 ,  B32B27/08 ,  B32B27/30 ,  B32B27/20

CPC classification number: G06F3/044 ,  B32B3/10 ,  B32B3/30 ,  B32B7/02 ,  B32B27/08 ,  B32B27/20 ,  B32B27/308 ,  B32B27/325 ,  B32B37/00 ,  B32B37/025 ,  B32B2264/102 ,  B32B2307/202 ,  B32B2307/412 ,  B32B2307/418 ,  B32B2457/00 ,  B32B2457/20 ,  B32B2457/208 ,  C09D123/06 ,  G06F3/041 ,  G06F2203/04103

Abstract: Provided are a transfer film having a temporary support, a first curable transparent resin layer disposed adjacently to the temporary support to be in direct contact therewith, and a second curable transparent resin layer disposed adjacently to the first curable transparent resin layer to be in direct contact therewith, in this order, in which the refractive index of the second curable transparent resin layer is higher than the refractive index of the first curable transparent resin layer, and the second curable transparent resin layer contains metal oxide particles at a proportion of 28.1% by mass to 95% by mass relative to the total solid content of the second curable transparent resin layer, the transfer film being capable of forming a transparent laminate that is free of the problem that a transparent electrode pattern is visually recognized; a method for producing a transfer film; a method for producing a transparent laminate; a transparent laminate; a capacitance-type input device; and an image display device.

Abstract translation: 提供了具有临时支撑体的转移膜，与临时支撑体相邻设置的与其直接接触的第一可固化透明树脂层和与第一可固化透明树脂层相邻设置的直接接触的第二可固化透明树脂层 其次，第二可固化透明树脂层的折射率高于第一可固化透明树脂层的折射率，第二可固化透明树脂层以28.1％的比例含有金属氧化物颗粒 相对于第二可固化透明树脂层的总固体成分质量至95质量％，转印膜能够形成没有透明电极图案被视觉识别的问题的透明层压体; 转印膜的制造方法; 一种透明层压体的制造方法; 透明层压板 电容式输入装置; 和图像显示装置。

公开(公告)号：US20160349619A1

公开(公告)日：2016-12-01

申请号：US15232872

申请日：2016-08-10

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Shinichi KANNA

IPC: G03F7/32 ,  G03F7/40 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2024 ,  G03F7/30 ,  G03F7/32 ,  G03F7/40 ,  Y10T428/24802

Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.

公开(公告)号：US20160103395A1

公开(公告)日：2016-04-14

申请号：US14973097

申请日：2015-12-17

Applicant: FUJIFILM Corporation

Inventor： Hideaki TSUBAKI ,  Shinichi KANNA

IPC: G03F7/30

CPC classification number: G03F7/325 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2024 ,  G03F7/30 ,  G03F7/32 ,  G03F7/40 ,  Y10T428/24802

Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.