公开(公告)号：US07142287B2

公开(公告)日：2006-11-28

申请号：US11345316

申请日：2006-02-02

申请人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

发明人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

公开(公告)号：US20060215132A1

公开(公告)日：2006-09-28

申请号：US11373503

申请日：2006-03-13

申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

IPC分类号： G03B27/52

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

摘要翻译： 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。

公开(公告)号：US20060176463A1

公开(公告)日：2006-08-10

申请号：US11345316

申请日：2006-02-02

申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

IPC分类号： G03B27/72

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。 该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。 表面远离光束入射区域和光束出射区域中的至少一个设置。

公开(公告)号：US20050117148A1

公开(公告)日：2005-06-02

申请号：US10499271

申请日：2002-05-03

申请人： Peter Dirksen ,  Casparus Anthonius Juffermans ,  Augustus Josephus Elizabeth Janssen

发明人： Peter Dirksen ,  Casparus Anthonius Juffermans ,  Augustus Josephus Elizabeth Janssen

IPC分类号： G01M11/02 ,  G03F7/20 ,  H01L21/027 ,  G01B9/00

CPC分类号： G03F7/706 ,  G03F7/7085

摘要： For determining aberrations of an optical imaging system (PL), a test object (12,14) comprising at least one delta test feature (10) is imaged either on an aerial scanning detector (110) or in a resist layer (71), which layer is scanned by a scanning device, for example a SEM. A new analytical method is used to retrieve from the data stream generated by the aerial detector or the scanning device different Zernike coefficients (Zn).

摘要翻译： 为了确定光学成像系统（PL）的像差，包括至少一个δ测试特征（10）的测试对象（12,14）在空中扫描检测器（110）或抗蚀剂层（71）中成像， 哪个层被扫描装置扫描，例如SEM。 使用新的分析方法从天线检测器或扫描装置生成的数据流中检索不同的泽尼克系数（Zn）。

公开(公告)号：US06417922B1

公开(公告)日：2002-07-09

申请号：US09324421

申请日：1999-06-01

申请人： Peter Dirksen ,  Antonius M. Nuijs

发明人： Peter Dirksen ,  Antonius M. Nuijs

IPC分类号： G01B1100

CPC分类号： G03F7/70258 ,  G03F9/70 ,  H01L21/681

摘要： An alignment device, for use in a lithographic apparatus, for aligning a first object, provided with a first alignment mark relative to a second object, provided with a second alignment mark, employs as a radiation source a laser which emits an alignment beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.

摘要翻译： 一种用于光刻设备的对准装置，用于对准具有第二对准标记的具有第二对象的第一对准标记的第一物体，其具有第二对准标记，该激光器发射具有 波长为1000nm，数量级为1100nm。

公开(公告)号：US5485272A

公开(公告)日：1996-01-16

申请号：US247933

申请日：1994-05-24

申请人： Peter Dirksen ,  Manfred G. Tenner ,  Jan E. van der Werf

发明人： Peter Dirksen ,  Manfred G. Tenner ,  Jan E. van der Werf

IPC分类号： G01B9/02 ,  G02F1/33 ,  G02F2/02 ,  G03F9/00 ,  G11B7/135 ,  H01S5/00

CPC分类号： G03F9/7049 ,  G02F1/33

摘要： A radiation-source unit is described which produces a radiation beam (30) with two components (9, 10) which are polarized perpendicularly relative to one another and which have different frequencies. The unit comprises a radiation source, a beam splitter (4), an acousto-optical modulation system (13, 18) for generating the frequency difference, and a beam combiner (25). Since the beam splitter and the beam combiner are transmission elements and their connecting line extends through the center of the modulation system the unit is compact and no alignment problems occur. Moreover, the frequency difference is adjustable over a wide range.

摘要翻译： 描述了辐射源单元，其产生具有彼此垂直偏振且具有不同频率的两个分量（9,10）的辐射束（30）。 该单元包括辐射源，分束器（4），用于产生频率差的声光调制系统（13,18）和光束组合器（25）。 由于分束器和光束组合器是传输元件，并且其连接线延伸穿过调制系统的中心，所以该单元是紧凑的，并且不会发生对准问题。 此外，频率差可在宽范围内调节。

公开(公告)号：USRE42849E1

公开(公告)日：2011-10-18

申请号：US12153717

申请日：2008-05-22

申请人： Paulus Cornelis Duineveld ,  Peter Dirksen ,  Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen

发明人： Paulus Cornelis Duineveld ,  Peter Dirksen ,  Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.

摘要翻译： 浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势 浸泡液中的气泡表面。

公开(公告)号：US20110156863A1

公开(公告)日：2011-06-30

申请号：US13059432

申请日：2009-08-14

申请人： Peter Dirksen ,  Willem Franke Pasveer

发明人： Peter Dirksen ,  Willem Franke Pasveer

IPC分类号： G06F7/04

CPC分类号： G08C23/02 ,  G07C1/10 ,  G07C9/00111 ,  G07C2009/00801 ,  G08C17/02 ,  G08C2201/20 ,  G08C2201/91 ,  G08C2201/93

摘要： First apparatuses (10) such as tags and batches comprise receivers (11) for receiving ultrasonic signals (1) comprising first codes from sources (27, 30), analyzers (12) for analyzing first codes, transmitters (13) for transmitting electromagnetic signals (2) comprising second codes to second apparatuses (20), and controllers (14) for, in response to analyses of first codes, controlling at least parts of the first apparatuses (10), such as modes, transmissions, and supplies of second codes. Second apparatuses (20) such as parts of interfaces and parts of stations comprise receivers (21) for receiving the electromagnetic signals (2) comprising second codes from the first apparatuses (10), analyzers (22) for analyzing second codes, and generators (23) for, in response to analyses of second codes, generating parameter signals (5) defining issues like registration issues and authorization issues and environmental issues, and analysis results. The first apparatuses (10) may form part of first devices (100) such as mobile phones and organizers, and the second apparatuses (20) may form part of second devices (200) such as interfaces and stations.

摘要翻译： 诸如标签和批次的第一设备（10）包括用于接收包括来自源（27,30）的第一代码的超声信号（1）的接收器（11），用于分析第一代码的分析器（12），用于发送电磁信号的发射器 （2）包括第二代码到第二设备（20），以及控制器（14），用于响应于第一代码的分析，控制第一设备（10）的至少一部分，诸如模式，传输和第二 代码。 诸如接口部分和站部分的第二装置（20）包括用于接收包括来自第一装置（10）的第二代码的电磁信号（2），用于分析第二代码的分析器（22）和发电机 23）为了响应第二代码的分析，产生定义诸如注册问题和授权问题以及环境问题之类的问题的参数信号（5）和分析结果。 第一设备（10）可以形成诸如移动电话和组织者的第一设备（100）的一部分，并且第二设备（20）可以形成诸如接口和站之类的第二设备（200）的一部分。

公开(公告)号：US20110101243A1

公开(公告)日：2011-05-05

申请号：US12999639

申请日：2009-06-23

申请人： Reinhold Wimberger-Friedl ,  Peter Dirksen ,  Marius Iosif Boamfa ,  Erik Martinus Hubertus Petrus Van Dijk

发明人： Reinhold Wimberger-Friedl ,  Peter Dirksen ,  Marius Iosif Boamfa ,  Erik Martinus Hubertus Petrus Van Dijk

IPC分类号： G01N21/64

CPC分类号： G01N21/6452 ,  B01L3/5027 ,  G02B21/0028

摘要： A system and method is described for detecting a plurality of analytes in a sample. The characterization system (100) comprises an aperture array (108) and a lens array (110) for generating and focusing a plurality of excitation sub-beams on different sub-regions of a substrate. These sub-regions can be provided with different binding sites for binding different analytes in the sample. By detecting the different luminescent responses in a detector, the presence or amount of different analytes can be determined simultaneously. Alternatively or in addition thereto collection of the luminescence radiation can be performed using the lens array for directly collecting the luminescence response and for guiding the collected luminescence response to corresponding apertures. In a preferred embodiment, the excitation sub-beams are focused at the side of the substrate opposite of the lens array and an immersion fluid is provided between the lens array and the substrate to increase the collection efficiency of the luminescence radiation.

摘要翻译： 描述了用于检测样品中多个分析物的系统和方法。 表征系统（100）包括孔径阵列（108）和透镜阵列（110），用于在衬底的不同子区域上产生和聚焦多个激励子束。 这些子区域可以具有不同的结合位点，用于结合样品中的不同分析物。 通过检测检测器中的不同发光响应，可以同时测定不同分析物的存在或量。 或者或另外，可以使用透镜阵列来进行发光辐射的收集，用于直接收集发光响应并且用于将所收集的发光响应引导到相应的孔。 在优选实施例中，激发子光束在与透镜阵列相对的一侧聚焦，并且在透镜阵列和基板之间提供浸没流体，以增加发光辐射的收集效率。

公开(公告)号：US07659041B2

公开(公告)日：2010-02-09

申请号：US11367810

申请日：2006-03-01

申请人： Peter Dirksen ,  Casparus Anthonius Henricus Juffermans ,  Johannes Van Wingerden

发明人： Peter Dirksen ,  Casparus Anthonius Henricus Juffermans ,  Johannes Van Wingerden

IPC分类号： G03F1/00 ,  G03C5/00

CPC分类号： H01L21/32139 ,  G03F1/26 ,  G03F1/36 ,  G03F7/0035

摘要： For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.

摘要翻译： 为了光刻制造具有非常高密度的器件，通过新的方法将设计掩模图案（120）分布在多个子图案（120a，120b，120c）上。 子图案不包括“禁止”结构（135）并且可以通过常规设备传送到待图案化的基底层。 为了传送，使用新的层叠层，其包括用于每个子图案的一对处理层（22; 26）和无机抗反射层（24; 28）。 在第一处理层（26）已经被图案化为第一子图案之后，其被涂覆有用第二子图案曝光的新抗蚀剂层（30）和在第一子图案下方的第二处理层（22） 用第二子图案处理处理层。