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    RADIATION-SENSITIVE RESIN COMPOSITION
    32.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
    辐射敏感性树脂组合物

    公开(公告)号：US20120183902A1

    公开(公告)日：2012-07-19

    申请号：US13338260

    申请日：2011-12-28

    申请人： Hiroki Nakagawa ,  Takehiko Naruoka ,  Shinichi Nakamura ,  Kazuki Kasahara

    发明人： Hiroki Nakagawa ,  Takehiko Naruoka ,  Shinichi Nakamura ,  Kazuki Kasahara

    IPC分类号： G03F7/027

    CPC分类号： G03F7/0397 ,  G03F7/0045

    摘要： A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.

    摘要翻译： 辐射敏感性树脂组合物包括含酸不稳定基团的树脂，辐射敏感性酸产生剂和包含由以下通式（1-1）表示的第一化合物的酸扩散控制剂和由 以下通式（1-2）或（1-3）。 式（1-1）中，R 1和R 2分别表示氢原子等，R p表示酸不稳定基。 式（1-2）中，R3表示氢原子等，R4〜R6各自表示氢原子等。 在式（1-3）中，R 3表示氢原子等，R q表示单键等，R 5和R 6各自表示氢原子等。

    COPOLYMER AND TOP COATING COMPOSITION
    36.
    发明申请
    COPOLYMER AND TOP COATING COMPOSITION 审中-公开
    共聚物和顶涂料组合物

    公开(公告)号：US20100266953A1

    公开(公告)日：2010-10-21

    申请号：US12832035

    申请日：2010-07-07

    申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    IPC分类号： G03F7/004

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an α-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是具有羧基的重复单元（I），具有磺基的重复单元（II）和通过在氟代烷基中共聚有碳原子数1〜20的氟代烷基（甲基）丙烯酸酯）而得到的重复单元的共聚物 除了具有侧链的重链单元以外，其具有至少在α-位具有氟烷基的醇羟基，所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

    Copolymer and top coating composition
    37.
    发明授权
    Copolymer and top coating composition 有权
    共聚物和顶涂组合物

    公开(公告)号：US07781142B2

    公开(公告)日：2010-08-24

    申请号：US11664296

    申请日：2005-09-28

    申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R1和R2中的至少一个为 具有1至4个碳原子的氟代烷基和式（2）中的R 3表示具有1至20个碳原子的氟烷基。

    Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern
    38.
    发明申请
    Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern 有权
    用于液体浸渍的Uper层成膜组合物和形成光刻胶图案的方法

    公开(公告)号：US20070269734A1

    公开(公告)日：2007-11-22

    申请号：US10586187

    申请日：2005-01-14

    申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    IPC分类号： G03F7/20 ,  G03F7/11 ,  H01L21/027

    CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    摘要翻译： 提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中 在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。 当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂， 和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上在侧链上含有氟烷基的具有醇羟基的树脂成分。

    Fluorescent-lamp driving apparatus adopting high-frequency inverter driving method, and compact self-ballasted fluorescent lamp equipped with such fluorescent-lamp driving apparatus
    39.
    发明授权
    Fluorescent-lamp driving apparatus adopting high-frequency inverter driving method, and compact self-ballasted fluorescent lamp equipped with such fluorescent-lamp driving apparatus 失效
    采用高频逆变器驱动方法的荧光灯驱动装置和配有这种荧光灯驱动装置的紧凑型自镇流荧光灯

    公开(公告)号：US07042168B2

    公开(公告)日：2006-05-09

    申请号：US10802094

    申请日：2004-03-16

    申请人： Hiroki Kitagawa ,  Hiroki Nakagawa

    发明人： Hiroki Kitagawa ,  Hiroki Nakagawa

    IPC分类号： H05B41/16

    CPC分类号： H05B41/2827 ,  H05B41/2985 ,  H05B41/2986 ,  Y02B20/185

    摘要： A fluorescent-lamp driving apparatus and a compact self-ballasted fluorescent lamp, when a blowout occurs at the electrodes of the arc tube, swiftly and assuredly stop a glow discharge at the electrodes of the arc tube, therefore have heightened security. In the compact self-ballasted fluorescent lamp 1, a switching device (nMOS-FET56) is mounted to the lighting unit 50 so that the entire device main body of the switching device faces the choke coil 52, with the print substrate 51 therebetween. Thus structured lighting unit 50 forms a heat transmission path between the nMOS-FET56 and the choke coil 52, and the heat generated at the choke coil 52 will be swiftly and assuredly transmitted to the device main body of the nMOS-FET56.

    摘要翻译： 荧光灯驱动装置和紧凑型自镇流荧光灯当电弧管的电极发生爆发时，迅速且可靠地停止在电弧管的电极处的辉光放电，因此安全性得到提高。 在紧凑型自镇流荧光灯1中，将开关装置（nMOS-FET56）安装到照明单元50，使得开关装置的整个装置主体面对扼流圈52，其间具有印刷基板51。 因此，结构化照明单元50形成nMOS-FET56和扼流线圈52之间的热传递路径，并且在扼流线圈52处产生的热量将被迅速且可靠地传输到nMOS-FET 56的器件主体。

    Bulb-shaped fluorescent lamp
    40.
    发明授权
    Bulb-shaped fluorescent lamp 失效

    公开(公告)号：US06600272B2

    公开(公告)日：2003-07-29

    申请号：US09933246

    申请日：2001-08-20

    申请人： Nobuyuki Matsui ,  Hiroki Nakagawa ,  Tetsuya Tahara

    发明人： Nobuyuki Matsui ,  Hiroki Nakagawa ,  Tetsuya Tahara

    IPC分类号： H01J744

    CPC分类号： H05B41/2827 ,  H01J61/325 ,  H05B41/295

    摘要： A bulb-shaped fluorescent lamp adopting an inexpensive and highly reliable electronic ballast is provided. A fluorescent arc tube, an electronic ballast, and a base are provided. The electronic ballast lights and drives the fluorescent arc tube, and the base provides a power to the electronic ballast. The electronic ballast has an inductor connected in series to the fluorescent arc tube, and at least two capacitors constituting a resonant circuit with the inductor and connected in parallel to the fluorescent arc tube. At least two capacitors are disposed on the surface of a printed board on the base side. At least two capacitors are disposed stepwise in such a manner that bodies thereof are not opposed to each other and the body with a larger capacitance is spaced further from the fluorescent arc tube.