公开(公告)号：US06398626B1

公开(公告)日：2002-06-04

申请号：US09612216

申请日：2000-07-07

申请人： Hisanori Matsuo ,  Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa ,  Tetsuji Togawa

发明人： Hisanori Matsuo ,  Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa ,  Tetsuji Togawa

IPC分类号： B24B100

CPC分类号： B24B37/345 ,  B24B53/017 ,  B24D7/14 ,  B24D13/147

摘要： A polishing apparatus is used for polishing a plate-like workpiece, such as a semiconductor wafer or a glass substrate. The polishing apparatus has a polishing table having a polishing surface thereon, a plurality of workpiece holders each for holding a workpiece and pressing the workpiece against the polishing surface, and a dresser for dressing the polishing surface by pressing a desired position of the polishing surface.

公开(公告)号：US06261162B1

公开(公告)日：2001-07-17

申请号：US09276146

申请日：1999-03-25

申请人： Kazuto Hirokawa ,  Hirokuni Hiyama ,  Yutaka Wada ,  Hisanori Matsuo

发明人： Kazuto Hirokawa ,  Hirokuni Hiyama ,  Yutaka Wada ,  Hisanori Matsuo

IPC分类号： B24B500

CPC分类号： B24B37/14 ,  B24B37/12 ,  B24B37/245 ,  B24B49/14 ,  B24D9/085

摘要： A grinding plate has abrasive particles dispersed uniformly. The grinding plate is made by applying ultrasonic vibration when dispersing the abrasive particles in an organic solvent containing a binder material. The grinding plate is fixed on a base section in a wetted state. The grinding plate is divided into a plurality of segments and is fixed to a flat surface of the base section, and the segments are separated by a given distance.

摘要翻译： 研磨板具有均匀分散的磨料颗粒。 研磨板通过在将磨料颗粒分散在含有粘合剂材料的有机溶剂中时施加超声波振动而制成。 研磨板在润湿状态下固定在基部上。 研磨板被分成多个段，并且固定到基部的平坦表面，并且段被分开给定的距离。

公开(公告)号：US06217411B1

公开(公告)日：2001-04-17

申请号：US09276922

申请日：1999-03-26

申请人： Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa ,  Hisanori Matsuo

发明人： Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa ,  Hisanori Matsuo

IPC分类号： B24B4900

CPC分类号： B24B37/005 ,  B24B41/061 ,  B24B49/10 ,  B24B49/16

摘要： A polishing apparatus includes a rotatable polishing pad having a polishing surface, a carrier for carrying an article to be polished and a support for stationarily supporting the carrier in such a manner that the article carried by the carrier is engaged with the polishing surface. A universal joint is provided between the carrier and the support. A sensor device senses a friction force generated between the article and the polishing surface as the polishing pad is rotated and imposed on the carrier. A pressing device has a plurality of pushers arranged around the joint to apply pressures to the carrier towards the polishing pad. A control unit determines magnitudes of pressures applied to the carrier by the respective pushers on the basis of the friction force sensed by the sensor device so that a total pressure applied to the carrier against the flat polishing surface including the pressures applied by the pushers compensates an angular moment acting on the carrier about the joint which is generated by the friction force acting between the article and the flat polishing surface.

摘要翻译： 抛光装置包括具有抛光表面的可旋转抛光垫，用于承载待抛光物品的托架和用于固定地支撑托架的支撑件，使得托架承载的物品与抛光表面接合。 在托架和支架之间提供万向节。 当抛光垫旋转并施加在载体上时，传感器装置感测在物品和抛光表面之间产生的摩擦力。 挤压装置具有围绕接头设置的多个推动器，以向载体施加压力以朝向抛光垫。 控制单元基于由传感器装置感测到的摩擦力来确定由相应的推动器施加到载体的压力的大小，使得施加到载体上的包括由推动器施加的压力的平坦抛光表面的总压力补偿 通过作用在制品和平坦抛光表面之间的摩擦力产生的关于作用于接头的载体的角力矩。

公开(公告)号：US06196904B1

公开(公告)日：2001-03-06

申请号：US09276148

申请日：1999-03-25

申请人： Hisanori Matsuo ,  Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa

发明人： Hisanori Matsuo ,  Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa

IPC分类号： B24B100

CPC分类号： B24B37/30

摘要： A polishing apparatus polishes a workpiece to a planar mirror finish stably, and is prevented from being vibrated while polishing is carried out. The polishing apparatus has a rotatable holding member for holding the workpiece, and a bearing supporting an outer circumferential surface of the holding member, for suppressing vibrations transmitted to the holder while the workpiece is being polished.

摘要翻译： 抛光装置稳定地将工件抛光到平面镜面，并且在进行抛光时防止其振动。 抛光装置具有用于保持工件的可旋转保持构件和支撑保持构件的外周面的轴承，用于在工件被抛光时抑制传递到保持器的振动。

公开(公告)号：US5838447A

公开(公告)日：1998-11-17

申请号：US683959

申请日：1996-07-19

申请人： Hirokuni Hiyama ,  Yutaka Wada

发明人： Hirokuni Hiyama ,  Yutaka Wada

IPC分类号： G01B11/06 ,  G01B11/30 ,  G01N21/84

CPC分类号： B24B37/205 ,  B24B49/12 ,  G01B11/0683 ,  G01B11/306

摘要： A polishing apparatus polishes a workpiece such as a semiconductor wafer while detecting a thickness or a flatness of a surface layer of the workpiece on a real-time basis. The polishing apparatus includes a turntable with a polishing cloth mounted on an upper surface thereof, and a top ring disposed above the turntable for supporting a workpiece to be polished and such workpiece against the polishing cloth. The polishing apparatus also has a thickness detector for detecting the thickness of a surface layer of the workpiece supported by the top ring while the workpiece is being polished without exposing the workpiece. The thickness detector includes a sensor mounted in the turntable and including at least one light-emitting element for emitting light toward the surface layer of the workpiece and at least one light-detecting element for detecting light reflected from the surface layer of the workpiece.

摘要翻译： 抛光装置在实时检测工件的表面层的厚度或平坦度的同时对半导体晶片等工件进行抛光。 抛光装置包括：转台，其具有安装在其上表面上的抛光布，以及设置在转盘上方的顶环，用于将抛光的工件支撑在抛光布上。 抛光装置还具有厚度检测器，用于在工件抛光而不暴露工件的同时检测由顶环支撑的工件的表面层的厚度。 厚度检测器包括安装在转盘中的传感器，并且包括用于向工件的表面层发射光的至少一个发光元件和用于检测从工件的表面层反射的光的至少一个光检测元件。

公开(公告)号：US20120068965A1

公开(公告)日：2012-03-22

申请号：US13228686

申请日：2011-09-09

申请人： Yutaka Wada ,  Naohiro Takahashi ,  Takashi Itaya

发明人： Yutaka Wada ,  Naohiro Takahashi ,  Takashi Itaya

IPC分类号： G06F3/045

CPC分类号： G06F3/044 ,  G06F3/0414

摘要： A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.

摘要翻译： 传感器装置包括：传感器面板，包括输入操作面，被配置为检测与输入操作面接触的检测对象的位置坐标; 套管 以及压敏传感器，其包括固定在所述传感器面板侧的第一电极，固定在所述壳体侧的第二电极和设置在所述传感器面板与所述壳体之间的弹性部件，并相对于所述传感器面板弹性地支撑所述传感器面板 壳体在第一电极和第二电极之间包括形成有第一电容的第一区域和形成有大于第一电容的第二电容的第二区域，并且被配置为检测输入到输入操作的按压力 表面作为第一电极和第二电极之间的电容的变化。

公开(公告)号：US20060110566A1

公开(公告)日：2006-05-25

申请号：US11257325

申请日：2005-10-24

申请人： Yutaka Wada ,  Masatsugu Suwabe ,  Junko Shimada ,  Toru Yano ,  Keiji Oya ,  Koichi Shigeno

发明人： Yutaka Wada ,  Masatsugu Suwabe ,  Junko Shimada ,  Toru Yano ,  Keiji Oya ,  Koichi Shigeno

IPC分类号： B32B3/02

CPC分类号： G11B7/2472 ,  G11B7/246 ,  G11B7/2467 ,  G11B7/248 ,  G11B2007/24612 ,  Y10S430/146 ,  Y10T428/21

摘要： Disclosed is to provide with an optical recording medium of a write-once type in which an excellent recording characteristic can be obtained over low speed recording to high speed recording. In an optical recording medium having a recording layer that contains an organic dye, the recording layer is configured to have at least an organic dye expressed by a general formula shown in the following chemical formula 1 (in this formula, R1 represents an alkyl group of carbon number 1 through 4, R2 and R3 represent respectively an alkyl group of carbon number 1 through 4 and a benzyl group or group forming three to six-member ring by coupling, each of Y1 and Y2 represents independently an organic group, and X represents ClO4, FB4, PF6, and SbF6) and an organic dye expressed by a general formula shown in the following chemical formula 2 (in this formula, R1 and R4 represent an alkyl group of carbon number 1 through 4, R2 and R3 represent respectively an alkyl group of carbon number 1 through 4 and a benzyl group or group forming three to six-member ring by coupling, each of Y1 and Y2 represents independently an organic group, and X represents ClO4, FB4, PF6, and SbF6).

摘要翻译： 公开了提供一种一次写入型光记录介质，其中通过低速记录到高速记录可以获得优异的记录特性。 在具有含有有机染料的记录层的光学记录介质中，记录层被配置为至少具有由以下化学式1所示的通式表示的有机染料（在该式中，R1表示 碳数1至4，R 2和R 3分别表示碳数1至4的烷基和通过偶联形成3至6元环的苄基或基团，Y 1和Y 2各自独立地表示有机基团，X表示 ClO 4，FB 4，PF 6和SbF 6）和由通式（I）表示的有机染料 如以下化学式2所示（在该式中，R 1和R 4表示碳数1至4的烷基，R 2和R 3分别表示碳数1至4的烷基和形成三至六个的苄基或基团 - 通过偶合成环，Y1和Y2各自独立地表示有机基团，X表示 FB 3，4，6，和6，6）。

公开(公告)号：US20050030838A1

公开(公告)日：2005-02-10

申请号：US10492094

申请日：2002-10-01

申请人： Yutaka Wada ,  Hiroshi Nakayama ,  Atsushi Takeuchi ,  Mitsuo Arima

发明人： Yutaka Wada ,  Hiroshi Nakayama ,  Atsushi Takeuchi ,  Mitsuo Arima

IPC分类号： G11B11/105 ,  G11B7/007 ,  G11B7/24

CPC分类号： G11B11/10586 ,  G11B7/00718 ,  G11B7/24076 ,  G11B7/24079 ,  G11B11/10578 ,  G11B11/10584

摘要： A magneto-optical recording medium for MSR reproduction of a high signal quality wherein both faces of a land and a groove are used as recording tracks is disclosed. A magneto-optical recording medium wherein both of a land portion and a groove portion on a substrate are used as recording and reproduction tracks while laser light having passed through an objective lens is illuminated on the recording and reproduction tracks is configured that a ratio Wg/Wl between a track width (Wg) of the groove portion and a track width (Wl) of the land portion is equal to or higher than 0.65 but equal to or lower than 0.85, and, where the wavelength of the laser light is represented by λ, the numerical aperture of the objective lens by NA and the refractive index of the substrate by n, the groove distance Gp is equal to or greater than 1.0×λ/NA but equal to or smaller than 1.2×λ/NA and besides the depth D of the groove is equal to or greater than λ/11 n but equal to or smaller than λ/8 n.

摘要翻译： 公开了一种用于MSR再现高信号质量的磁光记录介质，其中使用焊盘和凹槽的两个面作为记录磁道。 一种磁光记录介质，其中基板上的接地部分和凹槽部分都用作记录和再现轨道，同时通过物镜的激光照射在记录和再现轨道上，被配置为比率Wg / 槽部的轨道宽度（Wg）与焊盘部的轨道宽度（W1）之间的宽度W1为0.65以上且0.85以下，激光的波长表示为 lambda，物镜的数值孔径由NA和折射率 衬底指数为n，槽距Gp等于或大于1.0x lambda / NA，但等于或小于1.2x lambda / NA，此外凹槽的深度D等于或大于 lambda / 11 n，但等于或小于 lambda / 8 n。

公开(公告)号：US5786367A

公开(公告)日：1998-07-28

申请号：US600987

申请日：1996-03-05

申请人： Yasuo Oshiro ,  Tatsuyoshi Tanaka ,  Takao Nishi ,  Keiichi Kuwahara ,  Shigeki Fujisawa ,  Keiko Takasu ,  Yutaka Wada

发明人： Yasuo Oshiro ,  Tatsuyoshi Tanaka ,  Takao Nishi ,  Keiichi Kuwahara ,  Shigeki Fujisawa ,  Keiko Takasu ,  Yutaka Wada

IPC分类号： A61K8/49 ,  A61Q17/04 ,  C07D215/22 ,  C07D215/227 ,  C07D263/58 ,  C07D265/36 ,  C07D277/68 ,  C07D401/06 ,  C07D405/12 ,  C07D521/00 ,  C07F9/60 ,  A61K31/47

CPC分类号： C07D215/227 ,  A61K8/49 ,  A61K8/4926 ,  A61Q17/04 ,  C07D231/12 ,  C07D233/56 ,  C07D249/08 ,  C07D263/58 ,  C07D265/36 ,  C07D277/68 ,  C07D401/06 ,  C07D405/12 ,  C07F9/60

摘要： The present invention provides novel cyclic amide derivatives having activity for protecting against the ultraviolet rays, activity for scavenging active oxygen species and activity for inhibiting the formation of lipid peroxides, which is represented by the following general formula (1): ##STR1## wherein R.sup.2 is a hydroxyl group, a lower alkenyloxy group, a phenyl-lower alkenyloxy group, a cycloalkenyloxy group, a tetrahydropyranyloxy group, a pyridyloxy group, or a lower alkanoyloxy group which may have carboxyl group(s).

摘要翻译： PCT No.PCT / JP95 / 01392 Sec。 371日期：1996年3月5日 102（e）日期1996年3月5日PCT提交1995年7月12日PCT公布。 公开号WO96 / 02508 日本1996年2月1日本发明提供了具有防紫外线活性，清除活性氧的活性和抑制脂质过氧化物形成活性的新型环状酰胺衍生物，由以下通式（1）表示： 其中R2是可以具有羧基的羟基，低级链烯氧基，苯基 - 低级链烯氧基，环烯氧基，四氢吡喃氧基，吡啶氧基或低级烷酰氧基。

公开(公告)号：US4984180A

公开(公告)日：1991-01-08

申请号：US440442

申请日：1989-11-22

申请人： Yutaka Wada ,  Yasuhiro Kobayashi ,  Toru Mitsuta

发明人： Yutaka Wada ,  Yasuhiro Kobayashi ,  Toru Mitsuta

IPC分类号： G06F17/50

CPC分类号： G06T19/00 ,  G06F17/50 ,  G06F17/5004 ,  G06F2217/34

摘要： Graphic data of design objects designated by an input device are retrieved from a design object data memory and displayed on a display device. A restrictive item applied to the design object displayed on the display device and redesignated by the input device is read from the design object data memory. Specification data of the designated design objects are also read from the design object data memory. A condition part of the design reference is made based on the redesignated design object and the selected specification data, and an end portion of the design reference is made based on the redesignated design object, the selected restrictive item and a reference value entered by the input device. The design reference including the condition part and the end portion is displayed on the display device and stored into a design reference memory.

摘要翻译： 从设计对象数据存储器检索由输入装置指定的设计对象的图形数据，并显示在显示装置上。 从设计对象数据存储器读取应用于显示装置上显示并由输入装置重新指定的设计对象的限制项目。 也可以从设计对象数据存储器读取指定的设计对象的规格数据。 基于重新指定的设计对象和所选择的规格数据进行设计参考的条件部分，并且基于重新指定的设计对象，所选择的限制项和由输入输入的参考值来进行设计参考的端部 设备。 将包括条件部分和结束部分的设计参考显示在显示装置上并存储到设计参考存储器中。