Abstract:
The present invention relates to a high voltage transistor and method of manufacturing the same. The high voltage transistor includes: a channel region which is formed in a semiconductor substrate; a gate insulating film which is formed on the channel region of the semiconductor substrate; a low concentration source region and a low concentration drain region having the channel region interposed therebetween and each being formed in the semiconductor substrate; a high concentration source region which is formed to be spaced away from the channel region by a first distance; a high concentration drain region which is formed to be spaced away from the channel region by a second distance that is larger than the first distance; a gate electrode which has a gate bottom portion interfacing with the gate insulating film over the channel region, and a gate top portion integrated with the gate bottom portion and protruding by a predetermined length from a top of the gate bottom portion to extend over the low concentration drain region; a first metal silicide layer which is formed on the high concentration source region; and a second metal silicide layer which is formed on the high concentration drain region.
Abstract:
A semiconductor memory device having a self-aligned charge trapping layer and a method of manufacturing the same in which a consistent length of an ONO layer is ensured. Here, an insulating stacked structure is self-aligned to a bottom surface of conductive spacers.
Abstract:
The present invention relates to a high voltage transistor and method of manufacturing the same. The high voltage transistor includes: a channel region which is formed in a semiconductor substrate; a gate insulating film which is formed on the channel region of the semiconductor substrate; a low concentration source region and a low concentration drain region having the channel region interposed therebetween and each being formed in the semiconductor substrate; a high concentration source region which is formed to be spaced away from the channel region by a first distance; a high concentration drain region which is formed to be spaced away from the channel region by a second distance that is larger than the first distance; a gate electrode which has a gate bottom portion interfacing with the gate insulating film over the channel region, and a gate top portion integrated with the gate bottom portion and protruding by a predetermined length from a top of the gate bottom portion to extend over the low concentration drain region; a first metal silicide layer which is formed on the high concentration source region; and a second metal silicide layer which is formed on the high concentration drain region.
Abstract:
A method of manufacturing an EEPROM cell includes growing a first oxide layer on a semiconductor substrate; forming a first conductive layer on the first oxide layer; forming a first conductive pattern and a tunneling oxide layer by patterning the first conductive layer and the first oxide layer, the tunneling oxide layer being disposed under the first conductive pattern; forming a gate oxide layer on sidewalls of the first conductive pattern and the substrate and forming a second conductive pattern on both sides of the first conductive pattern; forming a conductive layer for a floating gate by electrically connecting the first conductive pattern to the second conductive pattern; forming a coupling oxide layer on the conductive layer for the floating gate; forming a third conductive layer on the coupling oxide layer; and forming a select transistor and a control transistor by patterning the third conductive layer, the coupling oxide layer, and the conductive layer for the floating gate. The select transistor is spaced apart from the control transistor. The select transistor, which is formed on the tunneling oxide layer, includes a gate stack formed of a select gate, a first coupling oxide pattern, and a first floating gate, and the control transistor includes a gate stack formed of a control gate, a second coupling oxide pattern, and a second floating gate.
Abstract:
A semiconductor memory device having a self-aligned charge trapping layer and a method of manufacturing the same in which a consistent length of an ONO layer is ensured. Here, an insulating stacked structure is self-aligned to a bottom surface of conductive spacers.
Abstract:
A method of transforming a 3D video format of a 3D video, the method including receiving a video sequence comprising 3D video that includes left-viewpoint video and right-viewpoint video; estimating at least one of disparity information between the left-viewpoint video and the right-viewpoint video and correlation information between neighboring pixel values of the left-viewpoint video and the right-viewpoint video, and determining a 3D video format of the 3D video based on a result of the estimating; transforming the left-viewpoint video and the right-viewpoint video into a format, based on the determined 3D video format; and displaying the transformed left-viewpoint video and the transformed right-viewpoint video three-dimensionally on a the display device.
Abstract:
Provided are a method and apparatus for generating a stereoscopic image bitstream. The method includes dividing a base view image and an additional view image into blocks having a predetermined size, generating a combined image by combining the blocks of the base view image and the blocks of the additional view image, recording the combined image in a payload area of the stereoscopic image bitstream, and recording block combination pattern information about a pattern of arranging the blocks of the base view image and the additional view image in the combined image, in a header area of the stereoscopic image bitstream.
Abstract:
Provided is a method of reducing fatigue resulting from viewing a three-dimensional (3D) image display. The method includes: obtaining low visual fatigue parameter information on a frame section including at least one frame of a received 3D image; obtaining disparity vector information on each frame of the 3D image; and determining a disparity minimum limit value and a disparity maximum limit value with respect to the 3D image.
Abstract:
Provided is a method and apparatus for generating a multi-view image data stream, the method including: recording multi-view image data onto the multi-view image data stream; recording onto the multi-view image data stream a multi-view image parameter recording parameter indicating whether a multi-view image parameter with regard to the multi-view image data is to be recorded onto the multi-view image data stream; and determining whether the multi-view image parameter is to be recorded onto the multi-view image data stream based on a value of the multi-view image data parameter recording parameter.
Abstract:
A method of generating a broadcasting bitstream for a digital caption broadcast, the method including: receiving video data in which a video including at least one of a two-dimensional (2D) video and a three-dimensional (3D) video is encoded; determining caption data for reproduction in conjunction with the video, and 3D caption converting information including information relating to a converting speed of an offset for reproducing the caption data as a 3D caption; and outputting a bitstream for a digital broadcast by multiplexing the received video data, the determined caption data, and the determined 3D caption converting information.