Manufacturing method for display device

    公开(公告)号:US11056514B2

    公开(公告)日:2021-07-06

    申请号:US15659796

    申请日:2017-07-26

    Abstract: Separation of wirings formed on an organic passivation film is prevented in an organic EL display device or a liquid crystal display device. The organic EL display device includes a TFT formed on a substrate and an organic passivation film formed to cover the TFT. An intermediate film containing SiO or SiN is formed to cover the organic passivation film. An insulation film formed with an organic material is formed on the intermediate film. A reflective electrode is formed on the intermediate film. The reflective electrode is connected to the TFT via a through-hole formed in the organic passivation film and a through-hole formed in the intermediate film.

    Display device
    35.
    发明授权

    公开(公告)号:US10886469B2

    公开(公告)日:2021-01-05

    申请号:US16701821

    申请日:2019-12-03

    Abstract: A method of manufacturing a display device, including: a stacking step of stacking, on a glass substrate, a sacrificial resin layer, a metal layer, a transparent metal oxide layer, a base material resin layer, and a functional layer including at least one of a pixel circuit-constituting layer driving a plurality of pixels and a color filter layer, in this order; a radiating step of radiating a pulsed light of a xenon flash lamp to the metal layer through the glass substrate and the sacrificial resin layer; and a detaching step of reducing a force of adhesion between the sacrificial resin layer and the metal layer with the pulsed light radiated in the radiating step, and detaching the sacrificial resin layer from the metal layer.

    Display device and method of manufacturing the same

    公开(公告)号:US10115774B2

    公开(公告)日:2018-10-30

    申请号:US15242799

    申请日:2016-08-22

    Abstract: A base body including a plurality of first regions and a second region having a shape surrounding each of the first regions is prepared. A resin layer is formed in the plurality of first regions while avoiding the second region. A buried layer having a moisture-proof property higher than the resin layer is formed in the second region. A functional layer including a self-emitting element layer emitting light whose luminance is controlled for each of a plurality of unit pixels constituting an image is formed on the resin layer and the buried layer. The buried layer and the functional layer are cut along a line passing through the second region, so as to separate the resin layer into a plurality of portions respectively corresponding to the plurality of first regions.

    Semiconductor device
    38.
    发明授权

    公开(公告)号:US10115740B2

    公开(公告)日:2018-10-30

    申请号:US15405511

    申请日:2017-01-13

    Abstract: According to one embodiment, a semiconductor device includes an insulating substrate, a first semiconductor layer formed of silicon and positioned above the insulating substrate, a second semiconductor layer formed of a metal oxide and positioned above the first semiconductor layer, a first insulating film formed of a silicon nitride and positioned between the first semiconductor layer and the second semiconductor layer, and a block layer positioned between the first semiconductor film and the second semiconductor layer, the block layer hydrogen diffusion of which is lower than that of the first insulating film.

    Method for manufacturing display device

    公开(公告)号:US09960317B2

    公开(公告)日:2018-05-01

    申请号:US15630243

    申请日:2017-06-22

    Abstract: A lamination includes a sheet substrate and a display element layer. The sheet substrate includes a plurality of product regions cut out into a plurality of products and a blank region surrounding the product regions. The display element layer is formed on each of a plurality of display areas placed on each of the plurality of product regions for displaying an image. The sheet substrate adheres to a top of a substrate. The substrate has light transmissivity. A protective film is adhered to the lamination so as to cover the display areas. A divider line is formed in a blank region that surrounds the product regions by removing a portion of the lamination. The substrate is removed from the sheet substrate by irradiating the sheet substrate with a laser beam.

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