Semiconductor ESD device and method of making same
    31.
    发明授权
    Semiconductor ESD device and method of making same 有权
    半导体ESD器件及其制造方法

    公开(公告)号:US07985983B2

    公开(公告)日:2011-07-26

    申请号:US12769021

    申请日:2010-04-28

    IPC分类号: H01L29/74 H01L27/06

    摘要: A semiconductor device includes an ESD device region disposed within a semiconductor body of a first semiconductor type, an isolation region surrounding the ESD device region, a first doped region of a second conductivity type disposed at a surface of the semiconductor body within the ESD region, and a second doped region of the first conductivity type disposed between the semiconductor body within the ESD region and at least a portion of the first doped region, where the doping concentration of the second doped region is higher than the semiconductor body. A third doped region of the second semiconductor type is disposed on the semiconductor body and a fourth region of the first conductivity type is disposed over the third doped region. A fifth doped region of the second conductivity type is disposed on the semiconductor body. A trigger device and an SCR is formed therefrom.

    摘要翻译: 半导体器件包括设置在第一半导体类型的半导体本体内的ESD器件区域,围绕ESD器件区域的隔离区域,设置在ESD区域内的半导体本体的表面处的第二导电类型的第一掺杂区域, 以及设置在ESD区域内的半导体本体与第一掺杂区域的至少一部分之间的第一导电类型的第二掺杂区域,其中第二掺杂区域的掺杂浓度高于半导体本体。 第二半导体类型的第三掺杂区域设置在半导体本体上,并且第一导电类型的第四区域设置在第三掺杂区域上。 第二导电类型的第五掺杂区域设置在半导体本体上。 触发装置和SCR由其形成。

    Reticle for use in a semiconductor lithographic system and method for modifying the same
    32.
    发明授权
    Reticle for use in a semiconductor lithographic system and method for modifying the same 有权
    用于半导体光刻系统的掩模版及其修改方法

    公开(公告)号:US07910265B2

    公开(公告)日:2011-03-22

    申请号:US12049080

    申请日:2008-03-14

    IPC分类号: G03F1/00

    CPC分类号: G03F1/50 G03F7/70433

    摘要: A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one of the two separated reticle parts is independently replaceable.

    摘要翻译: 用于半导体光刻系统的掩模版包括至少两个分离的掩模版部件。 每个部分包括将光刻转印到基底上的图案。 两个分离的光罩部件中的至少一个是独立可替换的。

    FUEL HEATER
    33.
    发明申请
    FUEL HEATER 审中-公开
    燃油加热器

    公开(公告)号:US20090308362A1

    公开(公告)日:2009-12-17

    申请号:US12304299

    申请日:2007-09-12

    IPC分类号: F02G5/00

    摘要: An apparatus for heating fuel, in particular alcohol, for the operation of combustion engines. The latter can be operated with alcohol or with an alcohol/gasoline mixture. The apparatus for heating fuel is integrated into the injection system of the combustion engine operable with alcohol or with an alcohol/gasoline mixture. The apparatus comprises a thin-walled heating tube that is received in a housing and surrounds a heating element. The heating element is produced from a material that exhibits a considerable rise in its electrical resistance with increasing temperature.

    摘要翻译: 一种用于加热燃料,特别是酒精以用于内燃机的操作的装置。 后者可以用酒精或酒精/汽油混合物进行操作。 用于加热燃料的装置被集成到可用乙醇或醇/汽油混合物操作的内燃机的喷射系统中。 该装置包括容纳在壳体中并围绕加热元件的薄壁加热管。 加热元件由随着温度升高显示其电阻显着上升的材料制成。

    EXHAUST GAS SENSOR
    35.
    发明申请
    EXHAUST GAS SENSOR 有权
    排气传感器

    公开(公告)号:US20090217745A1

    公开(公告)日:2009-09-03

    申请号:US12336615

    申请日:2008-12-17

    IPC分类号: G01M15/10

    CPC分类号: G01N27/4077

    摘要: Exhaust-gas sensors that have a sensor element, which is surrounded by two protective tubes on a side facing the exhaust gas and which is additionally protected by a porous fiber package, are already known. The fiber package is disposed between the two protective tubes and is meant to protect the sensor element from thermal shock by water droplets hitting the sensor element. When the exhaust gas sensor is used as primary catalytic converter or raw emission sensor, the sensor element can get damaged by sulfur compounds contained in the exhaust gas. In the exhaust-gas sensor according to the invention, damage to the sensor element by exhaust-gas components contained in the exhaust gas is reliably prevented. According to the invention, the adsorption means is implemented in such a way that sulfur, phosphorus or silicon compounds are trapped irreversibly.

    摘要翻译: 具有传感器元件的废气传感器是已知的,该传感器元件被面向废气的一侧上的两个保护管包围,并且还被多孔纤维包装保护。 纤维包装设置在两个保护管之间,旨在保护传感器元件免受水滴撞击传感器元件的热冲击。 当废气传感器用作主催化转化器或原始排放传感器时,传感器元件可能被废气中所含的硫化合物损坏。 在根据本发明的废气传感器中,可靠地防止了废气中包含的排气成分对传感器元件的损坏。 根据本发明,吸附装置的实施方式是硫,磷或硅化合物被不可逆地捕获。

    Contamination-Resistant Gas Sensor Element
    37.
    发明申请
    Contamination-Resistant Gas Sensor Element 审中-公开
    耐污染气体传感器元件

    公开(公告)号:US20070246360A1

    公开(公告)日:2007-10-25

    申请号:US11742266

    申请日:2007-04-30

    IPC分类号: G01N27/26

    CPC分类号: G01N27/4075

    摘要: A contamination-resistant sensor element and methods for making the same are provided. A sensor element may include a contamination-resistant coating on at least a portion thereof. The coating may comprise gamma-delta alumina and lithium oxide and may have a thickness of about 100 to about 600 microns and a porosity of about 20 to about 70 percent. The method may include using gamma-delta alumina and lithium oxide to form a mixture, applying the mixture to at least a portion of a sensor element, and temperature treated the mixture to form a contamination-resistant coating on the surface of the measuring cell.

    摘要翻译: 提供了一种抗污染传感器元件及其制造方法。 传感器元件可在其至少一部分上包括耐污染涂层。 涂层可以包含γ-δ氧化铝和氧化锂,并且可以具有约100至约600微米的厚度和约20至约70%的孔隙率。 该方法可以包括使用γ-δ氧化铝和氧化锂以形成混合物,将混合物施加到传感器元件的至少一部分,并且将该混合物进行温度处理以在测量池的表面上形成耐污染的涂层。

    Method of manufacturing an exhaust gas sensor
    38.
    发明申请
    Method of manufacturing an exhaust gas sensor 审中-公开
    废气传感器的制造方法

    公开(公告)号:US20060228495A1

    公开(公告)日:2006-10-12

    申请号:US11104325

    申请日:2005-04-12

    IPC分类号: B05D3/00 B05D5/12 B05D5/00

    CPC分类号: G01N27/4075

    摘要: A method of manufacturing an exhaust gas sensor includes providing a sensor element having an open end, a closed end, and an inner surface defining a chamber between the open and closed ends. The method further includes inserting a nozzle into the chamber, supplying an electrode material to the nozzle, and without substantially any relative movement between the nozzle and the sensor element, atomizing the electrode material to form a mist of electrode material that substantially surrounds the tip of the nozzle and deposits onto the inner surface of the sensor element to form an inner electrode.

    摘要翻译: 制造废气传感器的方法包括提供具有开口端,闭合端和限定在开放端和封闭端之间的室的内表面的传感器元件。 该方法还包括将喷嘴插入室中,将电极材料供应到喷嘴,并且在喷嘴和传感器元件之间基本上没有任何相对运动,使电极材料雾化以形成基本上围绕喷嘴的尖端的电极材料雾 喷嘴并沉积到传感器元件的内表面上以形成内部电极。

    Chronograph
    39.
    发明授权
    Chronograph 有权
    计时码表

    公开(公告)号:US07014356B2

    公开(公告)日:2006-03-21

    申请号:US11099920

    申请日:2005-04-06

    IPC分类号: G04F7/00

    CPC分类号: G04F7/0876

    摘要: A chronograph has a clock movement for driving a second chronograph hand and a minute chronograph hand and a control apparatus for stopping the second chronograph hand and the minute chronograph hand and for setting in motion a rattrapante mechanism of a second rattrapante indicator and a minute rattrapante indicator. The rattrapante mechanism has a common trip element for starting and stopping the second rattrapante indicator and the minute rattrapante indicator. A catch is triggered by the common trip element for engaging or disengaging from a ratchet recess of a plurality of ratchet recesses that are distributed evenly on the periphery of a minute rattrapante wheel. The minute rattrapante wheel is connected to a minute rattrapante shaft of a minute rattrapante indicator. The number of ratchet recesses on the minute rattrapante wheel corresponds to the number of increments of the minute chronograph hand per revolution.

    摘要翻译: 计时码表具有时钟运动,用于驱动第二计时指针和分钟计时手和用于停止第二计时指针和分钟计时手的控制装置,并且用于设置运动中的第二鼠标指针和分钟鼠标指针的鼠标移动机构 。 鼠标器机构具有用于启动和停止第二鼠标指示器和分钟鼠标指示器的公共跳闸元件。 通过共同跳闸元件触发卡扣,用于与均匀地分布在分钟齿轮的周边上的多个棘轮凹槽的棘轮凹槽接合或脱离啮合。 分钟鼠标轮连接到分钟鼠标指针的分钟rattrapante轴。 分针轮上棘轮凹槽的数量对应于每分钟计时秒针的增量数。

    Method for correcting local loading effects in the etching of photomasks
    40.
    发明申请
    Method for correcting local loading effects in the etching of photomasks 有权
    校正光掩模蚀刻中的局部负载效应的方法

    公开(公告)号:US20050079425A1

    公开(公告)日:2005-04-14

    申请号:US10621535

    申请日:2003-07-17

    CPC分类号: G03F1/80 G03F1/36

    摘要: A method for correcting local loading-effects in photomask etching includes the steps of determining the location-dependent density of structures of a mask; determining the location-dependent strength of the loading effect with the aid of the structure density; and determining location-dependent correction values for the mask structures with the aid of the strength of the loading effect for the purpose of compensating the loading effect. It is recognized that the strength of location-dependent loading effects can be predicted with the aid of the location-dependent structure density and therefore compensated.

    摘要翻译: 用于校正光掩模蚀刻中的局部负载效应的方法包括确定掩模的结构的位置依赖密度的步骤; 借助于结构密度确定负载效应的位置相关强度; 并且为了补偿负载效应,借助负载效应的强度来确定掩模结构的位置相关校正值。 可以认识到,可以借助位置依赖结构密度来预测位置相关负载效应的强度,从而得到补偿。