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公开(公告)号：US08208120B2
公开(公告)日：2012-06-26
申请号：US12078997
申请日：2008-04-09
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号：US07388648B2
公开(公告)日：2008-06-17
申请号：US11239493
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.
摘要翻译： 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构。 液体限制结构位于投影系统的最终表面附近，并且包括第一入口，该第一入口构造成将待图案化的梁待投射的液体供应到该空间;以及第二入口，其构造成供应气体并形成 一个面的结构。 所述面被布置为与所述基底的表面相对，并且所述第二入口相对于所述投影系统的光轴位于所述空间的径向外侧，并且具有多孔构件以将气流均匀地分布在所述第二区域的区域上 进口。
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公开(公告)号：US06952253B2
公开(公告)日：2005-10-04
申请号：US10705783
申请日：2003-11-12
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。
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公开(公告)号：US20110001942A1
公开(公告)日：2011-01-06
申请号：US12698938
申请日：2010-02-02
申请人： Joeri Lof , Erik Theodorus Maria Butler , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Staaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Butler , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Staaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号：US07199858B2
公开(公告)日：2007-04-03
申请号：US10705804
申请日：2003-11-12
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号：US20050231694A1
公开(公告)日：2005-10-20
申请号：US10823777
申请日：2004-04-14
申请人： Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
发明人： Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译： 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号：US20050110973A1
公开(公告)日：2005-05-26
申请号：US10719683
申请日：2003-11-24
申请人： Bob Streefkerk , Johannes Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Hoogendam , Erik Loopstra , Johannes Hubertus Mulkens , Bernard Gellrich
发明人： Bob Streefkerk , Johannes Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Hoogendam , Erik Loopstra , Johannes Hubertus Mulkens , Bernard Gellrich
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
摘要翻译： 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑件由石英制成。
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公开(公告)号：US20050088635A1
公开(公告)日：2005-04-28
申请号：US10946344
申请日：2004-09-22
申请人： Christiaan Hoogendam , Erik Theodorus Bijlaart , Erik Loopstra , Johannes Hubertus Mulkens , Bob Streefkerk
发明人： Christiaan Hoogendam , Erik Theodorus Bijlaart , Erik Loopstra , Johannes Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.
摘要翻译： 公开了一种光刻投影装置，其中至少部分地将液体限制在投影系统和基板之间的空间的液体限制系统通过止动器限制其在装置的光轴方向上的运动。
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公开(公告)号：US20050263068A1
公开(公告)日：2005-12-01
申请号：US10966110
申请日：2004-10-18
申请人： Christiaan Hoogendam , Bob Streefkerk , Johannes Catharinus Mulkens , Erik Theodorus Bijlaart , Aleksey Kolesnychenko , Erik Loopstra , Jeroen Johannes Sophia Mertens , Bernardus Slaghekke , Patricius Aloysius Tinnemans , Helmar Van Santen
发明人： Christiaan Hoogendam , Bob Streefkerk , Johannes Catharinus Mulkens , Erik Theodorus Bijlaart , Aleksey Kolesnychenko , Erik Loopstra , Jeroen Johannes Sophia Mertens , Bernardus Slaghekke , Patricius Aloysius Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US09482966B2
公开(公告)日：2016-11-01
申请号：US13615190
申请日：2012-09-13
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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