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公开(公告)号：US20050088635A1
公开(公告)日：2005-04-28
申请号：US10946344
申请日：2004-09-22
申请人： Christiaan Hoogendam , Erik Theodorus Bijlaart , Erik Loopstra , Johannes Hubertus Mulkens , Bob Streefkerk
发明人： Christiaan Hoogendam , Erik Theodorus Bijlaart , Erik Loopstra , Johannes Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.
摘要翻译： 公开了一种光刻投影装置，其中至少部分地将液体限制在投影系统和基板之间的空间的液体限制系统通过止动器限制其在装置的光轴方向上的运动。
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公开(公告)号：US20050263068A1
公开(公告)日：2005-12-01
申请号：US10966110
申请日：2004-10-18
申请人： Christiaan Hoogendam , Bob Streefkerk , Johannes Catharinus Mulkens , Erik Theodorus Bijlaart , Aleksey Kolesnychenko , Erik Loopstra , Jeroen Johannes Sophia Mertens , Bernardus Slaghekke , Patricius Aloysius Tinnemans , Helmar Van Santen
发明人： Christiaan Hoogendam , Bob Streefkerk , Johannes Catharinus Mulkens , Erik Theodorus Bijlaart , Aleksey Kolesnychenko , Erik Loopstra , Jeroen Johannes Sophia Mertens , Bernardus Slaghekke , Patricius Aloysius Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US20070132979A1
公开(公告)日：2007-06-14
申请号：US11482122
申请日：2006-07-07
申请人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号： G03B27/72
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US20050110973A1
公开(公告)日：2005-05-26
申请号：US10719683
申请日：2003-11-24
申请人： Bob Streefkerk , Johannes Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Hoogendam , Erik Loopstra , Johannes Hubertus Mulkens , Bernard Gellrich
发明人： Bob Streefkerk , Johannes Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Hoogendam , Erik Loopstra , Johannes Hubertus Mulkens , Bernard Gellrich
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
摘要翻译： 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑件由石英制成。
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公开(公告)号：US20060121209A1
公开(公告)日：2006-06-08
申请号：US11005219
申请日：2004-12-07
申请人： Johannes Matheus Baselmans , Sjoerd Lambertus Donders , Christiaan Hoogendam , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Matheus Baselmans , Sjoerd Lambertus Donders , Christiaan Hoogendam , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Bob Streefkerk
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.
摘要翻译： 光刻投影装置包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 光刻设备还包括被配置为保持衬底的衬底台。 衬底具有至少部分地涂覆有辐射敏感材料层的表面。 光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。 液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。
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公开(公告)号：US20060176458A1
公开(公告)日：2006-08-10
申请号：US11375039
申请日：2006-03-15
申请人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
摘要翻译： 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。
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公开(公告)号：US20050264778A1
公开(公告)日：2005-12-01
申请号：US10857614
申请日：2004-06-01
申请人： Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Meijer , Jeroen Maria Mertens , Johannes Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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公开(公告)号：US20050036121A1
公开(公告)日：2005-02-17
申请号：US10831370
申请日：2004-04-26
申请人： Christiaan Hoogendam , Sjoerd Donders , Hans Jansen , Jacobus Johannus Leonardus Verspay , Antonius Theodorus Derksen , Joeri Lof , Erik Loopstra , Johannes Catharinus Mulkens , Alexander Straaijer , Bob Streefkerk
发明人： Christiaan Hoogendam , Sjoerd Donders , Hans Jansen , Jacobus Johannus Leonardus Verspay , Antonius Theodorus Derksen , Joeri Lof , Erik Loopstra , Johannes Catharinus Mulkens , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
摘要翻译： 在光刻投影设备中，提供了一种液体供应系统，其包括至少部分地限定投影系统和基板之间的空间的容器，该容器在其中具有可选择的可开启和关闭的孔，以及关闭构造成选择性地关闭和打开 光圈。 在一个实施例中，快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。 此外，在光刻设备中，提供了一种液体供应系统，其配置为在投影系统和基板之间的空间中提供待投射的光束的液体，以及被配置为控制对投影系统的应用的控制器 与由液体供给系统的构件产生的重量传递有关的力。
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公开(公告)号：US20070132970A1
公开(公告)日：2007-06-14
申请号：US11448990
申请日：2006-06-08
申请人： Joeri Lof , Erik Bijlaart , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Roelof Ritsema , Frank Van Schaik , Thimotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Bijlaart , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Roelof Ritsema , Frank Van Schaik , Thimotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号：US20060023189A1
公开(公告)日：2006-02-02
申请号：US11239493
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人： Joeri Lof , Antonius Theodorus Derksen , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Theodorus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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