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243 条记录 (耗时 0.054 秒)

    PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
    31.
    发明申请
    PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD 审中-公开
    等离子体蚀刻装置和等离子体蚀刻方法

    公开(公告)号：US20080110569A1

    公开(公告)日：2008-05-15

    申请号：US11682382

    申请日：2007-03-06

    申请人： Go Miya ,  Junichi Tanaka ,  Seiichiro Kanno ,  Naoshi Itabashi ,  Hiroshi Akiyama ,  Kouhei Satou

    发明人： Go Miya ,  Junichi Tanaka ,  Seiichiro Kanno ,  Naoshi Itabashi ,  Hiroshi Akiyama ,  Kouhei Satou

    IPC分类号： C23F1/00

    CPC分类号： H01L21/67069 ,  H01J37/32935 ,  H01J37/32972

    摘要： The invention provides a method and apparatus for performing plasma etching to form a gate electrode on a large-scale substrate while ensuring the in-plane uniformity of the CD shift of the gate electrode. The present invention measures a radical density distribution of plasma in the processing chamber, feeds processing gases into the processing chamber through multiple locations and controls either the flow rates or compositions of the respective processing gases or the in-plane temperature distribution of a stage on which the substrate is placed, or feeds processing gases into the processing chamber through multiple locations and controls both the flow rates or compositions of the processing gases and the in-plane temperature distribution of the stage on which the substrate is placed.

    摘要翻译： 本发明提供了一种用于在确保栅电极的CD偏移的面内均匀性的同时在大尺寸基板上进行等离子体蚀刻以形成栅电极的方法和装置。 本发明测量处理室中的等离子体的自由基密度分布，通过多个位置将处理气体进料到处理室中，并且控制各个处理气体的流速或组成或其上的平面上的温度分布 衬底被放置或者通过多个位置将处理气体进料到处理室中，并控制处理气体的流速或组成以及放置衬底的阶段的面内温度分布。

    Display device and electrical apparatus using the same
    32.
    发明申请
    Display device and electrical apparatus using the same 有权
    显示装置及使用其的电气设备

    公开(公告)号：US20080084516A1

    公开(公告)日：2008-04-10

    申请号：US11542238

    申请日：2006-10-04

    申请人： Junichi Tanaka ,  Syuichi Kouzaki ,  Masaya Hijikigawa

    发明人： Junichi Tanaka ,  Syuichi Kouzaki ,  Masaya Hijikigawa

    IPC分类号： G02F1/1333

    CPC分类号： G02B26/004

    摘要： In a display device that displays by allowing external light to be incident from outside, and reflecting the incident external light so as to output the incident external light from a display surface, a porous body having a front face that is provided on the display surface side is used. Moreover, a colorless and transparent material is used for this porous body, an one-end opening is formed on the front face side in the porous body, and plural small pores that are independent of one another are provided inside the porous body.

    摘要翻译： 在通过允许外部光从外部入射并且反射入射的外部光以便从显示表面输出入射的外部光而显示的显示装置中，具有设置在显示面侧的正面的多孔体 用来。 此外，该多孔体使用无色透明材料，在多孔体的正面侧形成有一端开口，多孔体的内部设置有多个彼此独立的小孔。

    Lens apparatus
    34.
    发明申请
    Lens apparatus 失效
    镜头设备

    公开(公告)号：US20070196093A1

    公开(公告)日：2007-08-23

    申请号：US11706273

    申请日：2007-02-15

    申请人： Junichi Tanaka

    发明人： Junichi Tanaka

    IPC分类号： G03B13/34

    CPC分类号： G02B7/08 ,  G03B3/10 ,  G03B13/34 ,  H04N5/2254 ,  H04N5/23212

    摘要： A lens apparatus which can remove a backlash positively is provided. In the lens apparatus, a drive source is controlled so as to performing: moving a focus lens from a reference position toward one end of an optical lens stroke, and moving the focus lens toward the other end of the optical lens stroke. When the focus lens reaches the other end of the optical lens stroke, the drive source is controlled so as to perform moving the focus toward the reference position, and further, when a focus point position is determined to be between the reference position and the other end of the optical lens stroke as well as when it is detected that the focus lens reaches the reference position, the drive source is controlled so as to perform moving the focus lens from the reference position toward one end of the optical lens stroke by an amount to removal of a backlash, and moving the focus lens up to the focus point position.

    摘要翻译： 提供了能够正确地消除间隙的透镜装置。 在透镜装置中，驱动源被控制成执行：将聚焦透镜从基准位置朝向光学透镜笔划的一端移动，并且使聚焦透镜朝向光学透镜笔划的另一端移动。 当聚焦透镜到达光学透镜行程的另一端时，控制驱动源以使焦点朝向基准位置移动，此外，当确定焦点位置在参考位置与另一个之间时 光学透镜行程的结束以及当检测到对焦透镜到达基准位置时，控制驱动源，以便使聚焦透镜从基准位置朝向光学透镜行程的一端移动量 以消除间隙，并将聚焦透镜移动到聚焦点位置。

    Waveguide and optical cable module
    36.
    发明申请
    Waveguide and optical cable module 失效
    波导和光缆模块

    公开(公告)号：US20070140615A1

    公开(公告)日：2007-06-21

    申请号：US11638155

    申请日：2006-12-13

    申请人： Junichi Tanaka ,  Hirokatsu Nakayama ,  Naru Yasuda ,  Hayami Hosokawa

    发明人： Junichi Tanaka ,  Hirokatsu Nakayama ,  Naru Yasuda ,  Hayami Hosokawa

    IPC分类号： G02B6/36 ,  G02B6/42

    CPC分类号： G02B6/4214 ,  G02B6/125 ,  G02B6/43 ,  G02B2006/12104

    摘要： A waveguide includes a core part, clad layer surrounding the core part about an optical axis of the core part, and an optical path conversion mirror formed at the end face of at least one of the core part or the clad layer. The optical path conversion mirror converts an optical path of a signal light. The shape of the end face of the core part and the shape of the end face of the clad layer are different in the optical path conversion mirror.

    摘要翻译： 波导包括芯部分，围绕芯部分的核心部分围绕芯部的包层，以及形成在芯部或包覆层中的至少一个的端面处的光路转换镜。 光路转换镜转换信号光的光路。 芯部的端面的形状和包层的端面的形状在光路转换镜中是不同的。

    Method and device for examination of nonuniformity defects of patterns
    37.
    发明申请
    Method and device for examination of nonuniformity defects of patterns 失效
    检查图案不均匀性缺陷的方法和装置

    公开(公告)号：US20070070338A1

    公开(公告)日：2007-03-29

    申请号：US10575378

    申请日：2004-11-17

    申请人： Junichi Tanaka ,  Noboru Yamaguchi

    发明人： Junichi Tanaka ,  Noboru Yamaguchi

    IPC分类号： G01N21/88

    CPC分类号： G03F1/84 ,  G01N21/956 ,  G01N2021/95676

    摘要： It is possible to detect with high precision a plurality of types of nonuniformity defects that occur in patterns formed on the surface of an examination object. A device (10) for examination of nonuniformity defects that has a light source (12) for emitting light to a photomask 50 whose surface is provided with a repeating pattern (51) in which unit patterns (53) are arrayed in a regular fashion, and a photodetector (13) for photodetecting and converting into photodetection data scattered light from the photomask, so that the photodetection data is observed to detect nonuniformity defects that have occurred in the repeating pattern, in the device further having a wavelength filter (14) for selecting and extracting one or a plurality of desired wavelength bands from the light of a plurality of wavelength bands, wherein nonuniformity defects of the repeating pattern are detected using the selected and extracted light of the wavelength band.

    摘要翻译： 可以高精度地检测在检查对象的表面上形成的图案中出现的多种不均匀性缺陷。 一种用于检查不均匀性缺陷的装置（10），其具有用于向表面设置有以规则方式排列单位图案（53）的重复图案（51）的光掩模50发光的光源（12） 以及光检测器（13），用于光检测并转换成来自光掩模的光检测数据散射光，使得观察到光检测数据以检测在重复图案中发生的不均匀性缺陷，在还具有波长滤波器（14）的器件中， 从多个波长带的光中选择和提取一个或多个期望的波长带，其中使用所选择和提取的波长带的光来检测重复图案的不均匀性缺陷。

    Apparatus and method of inspecting mura-defect and method of fabricating photomask
    38.
    发明申请
    Apparatus and method of inspecting mura-defect and method of fabricating photomask 有权
    检查mura缺陷的装置和方法以及制造光掩模的方法

    公开(公告)号：US20060158642A1

    公开(公告)日：2006-07-20

    申请号：US11293306

    申请日：2005-12-05

    申请人： Junichi Tanaka

    发明人： Junichi Tanaka

    IPC分类号： G01N21/88

    CPC分类号： G01N21/956 ,  G01N2021/95676

    摘要： A mura-defect inspection apparatus 10 includes: a light source 12 which irradiates light onto a photomask 50 having a repeated pattern that a unit pattern is regularly arranged on a surface 52A of a transparent substrate 52; and a photoreceptor 13 which receives reflected light from the photomask to convert it to received light data, wherein an analyzer 14 analyzes the received light data to detect a mura-defect generated in the repeated pattern, wherein the light source 12 irradiates light onto a back side 52B of the transparent substrate in the photomask.

    摘要翻译： 腮腺缺陷检查装置10包括：光源12，其将光反射到具有规则排列在透明基板52的表面52A上的重复图案的光掩模50; 以及感光体13，其接收来自光掩模的反射光，将其转换为接收的光数据，其中，分析仪14分析所接收的光数据，以检测在重复图案中产生的色调缺陷，其中光源12将光照射到背面 透明基板的侧面52B。

    Plasma processing system and method
    39.
    发明申请
    Plasma processing system and method 审中-公开
    等离子体处理系统及方法

    公开(公告)号：US20060043064A1

    公开(公告)日：2006-03-02

    申请号：US10934383

    申请日：2004-09-07

    申请人： Junichi Tanaka ,  Takehisa Iwakoshi ,  Seiichiro Kanno ,  Go Miya ,  Motohiko Yoshigai

    发明人： Junichi Tanaka ,  Takehisa Iwakoshi ,  Seiichiro Kanno ,  Go Miya ,  Motohiko Yoshigai

    IPC分类号： C23F1/00 ,  G01L21/30

    CPC分类号： H01J37/32972 ,  G01N21/68 ,  G01N2021/8416 ,  H01J37/32449 ,  H01J37/32935

    摘要： A plasma processing system includes a process chamber equipped with a gas supply unit, a gas exhaust and an electromagnetic energy supply unit for generating plasma from process gasses, thereby subjecting a specimen placed on a specimen stage to a plasma process. The system includes a spectrometer detecting a spectrum of plasma emission generated in the chamber, flow controllers controlling flow rates of process gasses to be supplied, and a controller controlling the flow controllers. The controller includes a calculation unit for calculating an amount of reaction byproducts generated in the chamber, in accordance with the spectrum of the plasma emission detected with the spectrometer and an input unit for inputting a target timeline of the amount of reaction byproducts, and controls amounts of the process gasses such that a calculation result of the amount of reaction byproducts becomes coincident with the input target timeline.

    摘要翻译： 等离子体处理系统包括具有气体供给单元，排气口和用于从工艺气体产生等离子体的电磁能量供给单元的处理室，从而使放置在试样台上的试样进行等离子体处理。 该系统包括检测在室中产生的等离子体发射光谱的光谱仪，控制要供应的过程气体的流量的流量控制器和控制流量控制器的控制器。 控制器包括：计算单元，用于根据用光谱仪检测的等离子体发射光谱和用于输入反应副产物的量的目标时间线的输入单元计算室内产生的反应副产物的量，并控制量 的过程气体，使得反应副产物的量的计算结果与输入的目标时间线一致。