公开(公告)号：US20160128171A1

公开(公告)日：2016-05-05

申请号：US14739305

申请日：2015-06-15

Applicant: KLA-Tencor Corporation

Inventor： Alexey Kuritsyn ,  Ye Liu ,  Oleg Khodykin ,  Michael P. Kanouff

IPC: H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  G03F7/70933

Abstract: Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.

Abstract translation: 公开了用于产生照明光束的方法和装置。 在一个实施例中，该设备包括被配置为保持目标材料的真空室，定位在真空室内的光学元件或者在该真空室的壁内的真空室，以及用于产生至少一个激发源的照明源系统 真空室中的目标，用于在真空室中产生等离子体，以产生照射辐射。 该装置还包括用于使气体从多个喷嘴流出并以等离子体的速度远离光学元件的碎屑保护系统，以防止碎片到达这种光学元件。

公开(公告)号：US20150076359A1

公开(公告)日：2015-03-19

申请号：US14335442

申请日：2014-07-18

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin ,  Daniel C. Wack ,  Konstantin Tsigutkin ,  Layton Hale ,  Joseph Walsh ,  Frank Chilese

IPC: H05G2/00 ,  G01N21/956 ,  G03F7/20 ,  G01J1/16

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。

公开(公告)号：US20150008335A1

公开(公告)日：2015-01-08

申请号：US14497506

申请日：2014-09-26

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Oleg Khodykin

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916

Abstract: A system for producing an exclusionary buffer gas flow in an EUV light source, comprising a vacuum chamber, a light path, a plasma generation region, at least one shield, at least one through-bore arranged in the at least one shield, at least one buffer gas injector arranged within the at least one through-bore to inject a buffer gas into the light path substantially towards the plasma generation region to prevent a flow of a target material into the light path, and a vacuum pump arranged to remove the buffer gas and the target material from the vacuum chamber.

Abstract translation: 一种用于在EUV光源中产生排除缓冲气体流的系统，包括真空室，光路，等离子体产生区域，至少一个屏蔽件，至少一个安装在所述至少一个屏蔽件中的通孔，至少 一个缓冲气体喷射器，布置在所述至少一个通孔内，以将缓冲气体基本上朝向等离子体产生区域注入到光路中，以防止目标材料流入光路;以及真空泵，其布置成移除缓冲器 气体和来自真空室的目标材料。