公开(公告)号：US5838449A

公开(公告)日：1998-11-17

申请号：US912954

申请日：1997-08-14

申请人： Kinya Kato ,  Masaki Kato ,  Kei Nara

发明人： Kinya Kato ,  Masaki Kato ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F7/70791 ,  G03F9/70

摘要： An exposure apparatus of a large-substrate single scan-exposure type by which a mask mark and a plate mark are two-dimensionally scanned in relatively narrow respective scan areas at the same time to effect highly accurate alignment. In the present invention, a first substrate and a second substrate are relatively moved in a predetermined direction with respect to a projection optical system, while an image of a pattern formed in the first substrate projectively impinges on the second substrate by way of the projection optical system. The projection optical system comprises a plurality of projection optical units arranged in a direction orthogonal to the scanning direction in order to form, on the second substrate, a same-magnification erected image of the pattern formed on the first substrate. The exposure apparatus has an alignment means for detecting a first mark formed on the first substrate and a second mark formed on the second substrate by optical scanning so as to measure a positional deviation between the first substrate and the second substrate.

摘要翻译： 大面积单扫描曝光型的曝光装置，通过该曝光装置在相对较窄的各个扫描区域中同时二维地扫描掩码标记和印记标记，以实现高精度对准。 在本发明中，第一基板和第二基板相对于投影光学系统相对于预定方向相对移动，而形成在第一基板中的图案的图像通过投影光学投射到第二基板上 系统。 投影光学系统包括沿与扫描方向正交的方向布置的多个投影光学单元，以在第二基板上形成在第一基板上形成的图案的相同放大率的竖立图像。 曝光装置具有用于检测形成在第一基板上的第一标记的对准装置和通过光学扫描形成在第二基板上的第二标记，以便测量第一基板和第二基板之间的位置偏差。

公开(公告)号：US5565988A

公开(公告)日：1996-10-15

申请号：US384953

申请日：1995-02-07

申请人： Kei Nara ,  Nobutaka Fujimori

发明人： Kei Nara ,  Nobutaka Fujimori

IPC分类号： G01B11/00 ,  G03F9/00 ,  G06T1/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： G03F9/70

摘要： In an alignment method an apparatus for scanning an alignment mark formed on a substrate with a beam of light, and detecting the position of the alignment mark on the basis of a signal conforming to reflected light obtained from the alignment mark, a dummy mark of the same shape as the alignment mark is formed near the alignment mark formed on the substrate, the dummy mark and the alignment mark are continuously scanned by the beam of light, and during the time from after the beam of light has scanned the dummy mark until the scanning of the alignment mark is started, the intensity (signal level) of a first signal obtained in conformity with reflected light reflected by the dummy mark is found to thereby calculate the amplification factor of the signal, and during the scanning of the alignment mark, a second signal obtained in conformity with reflected Light reflected from the alignment mark is amplified with this amplification factor, and the position of the alignment mark is detected on the basis of the amplified second signal.

摘要翻译： 在对准方法中，一种用光束扫描形成在基板上的对准标记的装置，并且基于符合从对准标记获得的反射光的信号检测对准标记的位置， 在形成在基板上的对准标记附近形成与对准标记相同的形状，通过光束连续地扫描虚设标记和对准标记，并且在光束从扫描后的时间到虚拟标记直到 开始对准标记的扫描，发现根据由虚拟标记反射的反射光获得的第一信号的强度（信号电平），从而计算信号的放大系数，并且在对准标记的扫描期间， 利用该放大系数放大与从对准标记反射的反射光一致的第二信号，并检测对准标记的位置 基于放大的第二信号。

公开(公告)号：US09086585B2

公开(公告)日：2015-07-21

申请号：US12978976

申请日：2010-12-27

申请人： Tomohide Hamada ,  Kei Nara

发明人： Tomohide Hamada ,  Kei Nara

IPC分类号： G01C3/16 ,  G01C3/00 ,  G01C3/02 ,  G01C3/18 ,  G02F1/1333 ,  G02F1/13 ,  H01L51/56

CPC分类号： H01L22/20 ,  G02F1/1303 ,  G02F1/1333 ,  H01L27/3244 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/5338

摘要： The display element manufacturing apparatus has a transporting part, which transports a substrate in a first direction, a first alignment system, which detects fiducial marks, a second alignment system, which is arranged at a prescribed distance from the first alignment system in the first direction and detects fiducial marks, calculating parts, which detect the fiducial marks and calculate the expansion/contraction of the substrate in the first direction or the transport speed of the substrate, and a processing part, which processes a prescribed position of the substrate based on at least one of the expansion/contraction of the substrate in the first direction or the transport speed of the substrate and the fiducial marks.

摘要翻译： 显示元件制造装置具有沿第一方向输送基板的输送部，检测基准标记的第一对准系统，与第一对准系统沿第一方向以规定距离配置的第二对准系统 检测检测基准标记的基准标记，计算部分，并计算基板在基板的第一方向或输送速度上的膨胀/收缩;以及处理部，其基于a处理基板的规定位置 基板在第一方向上的扩张/收缩或基板的传送速度和基准标记中的至少一个。

公开(公告)号：US08917378B2

公开(公告)日：2014-12-23

申请号：US12261741

申请日：2008-10-30

申请人： Kei Nara

发明人： Kei Nara

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70791 ,  G03F7/70275

摘要： A method for exposing a substrate includes arranging, in a direction, pattern areas to projection systems respectively arranged at an interval and each having a magnifying magnification, the pattern areas having area widths each smaller than the interval and greater than a width obtained by dividing an exposure width of the projection system by the magnifying magnification; and successively transferring onto the substrate an image, projected by an associated projection system, of a first pattern provided in a first partial pattern area in each pattern area and an image, projected by the associated projection system, of a second pattern provided in a second partial pattern area in each pattern area and having at least a partial area different from the first partial pattern area in the direction in each pattern area. The occurrence of any stitch error is suppressed and the transfer accuracy is improved.

摘要翻译： 一种用于曝光衬底的方法包括在一个方向上将图案区域布置成分别以间隔布置并且各具有放大倍率的投影系统，所述图案区域的面积宽度各自小于所述间隔，并且大于通过将 投影系统的放大倍数的曝光宽度; 并且依次将由相关联的投影系统投影的图像转移到设置在每个图案区域中的第一部分图案区域中的第一图案和由相关联的投影系统投影的第二图案的图像，所述第二图案设置在第二图案区域中 每个图案区域中的部分图案区域并且具有与每个图案区域中的方向上的第一部分图案区域不同的至少部分区域。 任何针迹误差的发生被抑制，并且转印精度提高。

公开(公告)号：US20090257033A1

公开(公告)日：2009-10-15

申请号：US12261741

申请日：2008-10-30

申请人： Kei Nara

发明人： Kei Nara

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70791 ,  G03F7/70275

摘要： A method for exposing a substrate includes arranging, in a direction, pattern areas to projection systems respectively arranged at an interval and each having a magnifying magnification, the pattern areas having area widths each smaller than the interval and greater than a width obtained by dividing an exposure width of the projection system by the magnifying magnification; and successively transferring onto the substrate an image, projected by an associated projection system, of a first pattern provided in a first partial pattern area in each pattern area and an image, projected by the associated projection system, of a second pattern provided in a second partial pattern area in each pattern area and having at least a partial area different from the first partial pattern area in the direction in each pattern area. The occurrence of any stitch error is suppressed and the transfer accuracy is improved.

摘要翻译： 一种用于曝光衬底的方法包括在一个方向上将图案区域布置成分别以间隔布置并且各具有放大倍率的投影系统，所述图案区域的面积宽度各自小于所述间隔，并且大于通过将 投影系统的放大倍数的曝光宽度; 并且依次将由相关联的投影系统投影的图像转移到设置在每个图案区域中的第一部分图案区域中的第一图案和由相关联的投影系统投影的第二图案的图像，所述第二图案设置在第二图案区域中 每个图案区域中的部分图案区域并且具有与每个图案区域中的方向上的第一部分图案区域不同的至少部分区域。 任何针迹误差的发生被抑制，并且转印精度提高。

公开(公告)号：US20080254704A1

公开(公告)日：2008-10-16

申请号：US12102509

申请日：2008-04-14

申请人： Tomohide HAMADA ,  Kei Nara

发明人： Tomohide HAMADA ,  Kei Nara

IPC分类号： H01J9/24 ,  H01J9/00 ,  H01J1/62

CPC分类号： H01L51/56 ,  G02F1/1303 ,  G02F2001/133302 ,  G02F2001/133325 ,  H01J9/241 ,  H01J9/242 ,  H01L27/3246 ,  H01L51/0005 ,  H01L51/0022

摘要： A method for fabricating a display device including forming a standard mark in a flexible substrate fed in a first direction, forming a partition wall in the flexible substrate, and forming an electrode by applying a conductive member at a predetermined position between the partition walls by an applicator based on the standard mark. An apparatus is provided that includes a transportation unit to transport a flexible substrate in a first direction, a mark formation unit to form a standard mark in the flexible substrate, a partition wall formation unit to form a partition wall in the flexible substrate, and an application unit to apply a conductive member to a predetermined position between the partition walls based on the standard mark. A display device is provided that includes a flexible substrate, a partition wall formed by pressing the flexible substrate, and an electrode formed by application between the partition walls.

摘要翻译： 一种制造显示装置的方法，包括在沿第一方向馈送的柔性基板中形成标准标记，在柔性基板中形成分隔壁，并通过在隔壁之间的预定位置处施加导电构件，形成电极， 涂抹器基于标准标记。 提供了一种装置，其包括：沿第一方向输送柔性基板的输送单元，在柔性基板中形成标准标记的标记形成单元，在柔性基板中形成分隔壁的分隔壁形成单元， 应用单元基于标准标记将导电构件施加到分隔壁之间的预定位置。 提供一种显示装置，其包括柔性基板，通过按压柔性基板形成的分隔壁以及通过在分隔壁之间施加形成的电极。

公开(公告)号：US06341011B1

公开(公告)日：2002-01-22

申请号：US09603299

申请日：2000-06-23

申请人： Kei Nara

发明人： Kei Nara

IPC分类号： G03B2732

CPC分类号： G03F7/70258 ,  G03F7/70275 ,  G03F7/70358

摘要： An exposure apparatus and methods for making and using the same. The exposure apparatus includes at least one projection optical system which projects illuminating light, a substrate stage which supports a substrate to be exposed by the illuminating light and which includes a first plurality of reference marks. The exposure apparatus also includes a mask stage which supports a mask that includes a mask pattern to be projected onto the substrate by at least one projection optical system. The mask further includes a second plurality of reference marks intended to correspond to the first plurality of reference marks. The second plurality of reference marks is integrally formed with the mask pattern. The projection optical system(s) project illuminating light based on the mask pattern and the second plurality of reference marks to produce a projected image corresponding to the mask pattern and a plurality of projected images corresponding to the second plurality of reference marks. The exposure apparatus also includes an adjustment mechanism which adjusts the position of the projected image on the substrate based on a plurality of positional relationships between the plurality of projected images and the first plurality of reference marks.

摘要翻译： 曝光装置及其制作及使用方法。 曝光装置包括投影照明光的至少一个投影光学系统，支撑要被照明光曝光的基板并包括第一多个参考标记的基板台。 曝光装置还包括掩模台，其通过至少一个投影光学系统支持包括要投影到基板上的掩模图案的掩模。 掩模还包括旨在对应于第一多个参考标记的第二多个参考标记。 第二多个参考标记与掩模图案一体地形成。 投影光学系统基于掩模图案和第二多个参考标记投射照明光，以产生对应于掩模图案的投影图像和对应于第二多个参考标记的多个投影图像。 曝光装置还包括调整机构，其基于多个投影图像与第一多个参考标记之间的多个位置关系来调整投影图像在基板上的位置。

公开(公告)号：US06239861B1

公开(公告)日：2001-05-29

申请号：US09479671

申请日：2000-01-10

申请人： Kei Nara ,  Tsuyoshi Naraki

发明人： Kei Nara ,  Tsuyoshi Naraki

IPC分类号： G03B2442

CPC分类号： G03F7/70466 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70808

摘要： A substrate coated with a photosensitive agent is exposed to light beams passing through a mask by projecting the light beams upon the substrate through a projection optical system, on which occasion areas having a large layer thickness of the photosensitive agent on the substrate are subjected to double exposures, i.e., the exposure through the projection optical system and an exposure through an optical system different therefrom.

摘要翻译： 用感光剂涂布的基材通过投影光学系统将光束投射到基板上而暴露于通过掩模的光束，在该情况下，基板上的感光剂层厚度大的区域经受双重 曝光，即通过投影光学系统的曝光和通过与其不同的光学系统的曝光。

公开(公告)号：US5850279A

公开(公告)日：1998-12-15

申请号：US619981

申请日：1996-03-20

申请人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Masaki Kato ,  Kinya Kato ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.

摘要翻译： 公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。 将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光， 基准标记。 具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。 基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。 具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。 基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。