公开(公告)号：US20050163928A1

公开(公告)日：2005-07-28

申请号：US11080427

申请日：2005-03-16

申请人： Kenji Otsuka ,  Naoki Muranaga ,  Kikurou Takemoto

发明人： Kenji Otsuka ,  Naoki Muranaga ,  Kikurou Takemoto

IPC分类号： C23C16/44 ,  B01D53/58 ,  C30B25/02 ,  H01L21/02 ,  H01L21/205 ,  C23C16/00

CPC分类号： C30B25/02 ,  B01D53/58 ,  B01D53/77 ,  B01D2258/0216 ,  C23C14/0617 ,  C23C16/301 ,  C23C16/4401 ,  C23C16/4412 ,  C23C16/4488 ,  C30B29/406

摘要： There are disclosed a production apparatus for producing a gallium nitride film semiconductor by HVPE process, a cleaning apparatus for cleaning exhaust gas coming from the above apparatus and an overall production plant for producing a gallium nitride film semiconductor by HVPE process. Therein exhaust piping for exhaust gas in the production apparatus, introduction piping for the cleaning apparatus and exhaust gas piping which connects the production apparatus and the cleaning apparatus are each composed of an electroconductive corrosion-resistant material and are each electrically grounded, thereby surely preventing electrostatic charging due to friction between ammonium chloride powders in the exhaust gas and inside walls of exhaust gas piping, and markedly enhancing operational safety.

摘要翻译： 公开了一种通过HVPE工艺制造氮化镓膜半导体的制造装置，用于清洁从上述装置排出的废气的清洁装置和通过HVPE处理制造氮化镓膜半导体的整体生产装置。 在制造装置中的废气排气管道中，连接制造装置和清洗装置的清洗装置和排气管路的导入配管各自由导电性耐腐蚀材料构成，各自电接地，从而可靠地防止静电 由于废气中的氯化铵粉末与废气管道的内壁之间的摩擦而引起的充电，并且显着提高了操作安全性。

公开(公告)号：US06331281B1

公开(公告)日：2001-12-18

申请号：US09414348

申请日：1999-10-07

申请人： Suehachi Teru ,  Yasusada Miyano ,  Noboru Akita ,  Kenji Otsuka ,  Takashi Shimada

发明人： Suehachi Teru ,  Yasusada Miyano ,  Noboru Akita ,  Kenji Otsuka ,  Takashi Shimada

IPC分类号： B01D5358

CPC分类号： B01D53/8634 ,  Y02A50/2346

摘要： There are disclosed a process for cleaning ammonia-containing exhaust gas which comprises bringing the exhaust gas into contact with an ammonia decomposition catalyst (e.g. nickel, ruthenium) under heating to decompose most of the ammonia into nitrogen and hydrogen, subsequently bringing the resultant mixed gas into contact with an ammonia adsorbent (e.g. synthetic zeolite) for adsorbing undecomposed ammonia, and then heating regenerating the adsorbent, while bringing reproduced exhaust gas containing the ammonia desorbed from the adsorbent into contact under heating, with the ammonia decomposition catalyst or another ammonia decomposition catalyst; and an apparatus for carrying out the process. It is made possible by the process and apparatus to efficiently and completely clean ammonia-containing exhaust gas exhausted from a semiconductor manufacturing process and the like without generating useless byproduct and dispensing with secondary treatment.

摘要翻译： 公开了一种清洗含氨废气的方法，该方法包括在加热下将废气与氨分解催化剂（例如镍，钌）接触以将大部分氨分解成氮和氢，随后将所得混合气体 与用于吸附未分解氨的氨吸附剂（例如合成沸石）接触，然后加热再生吸附剂，同时使含有从吸附剂解吸的氨的再生废气与加热下的氨分解催化剂或另一种氨分解催化剂接触 ; 以及用于执行该过程的装置。 通过该方法和装置可以有效且完全地清洁从半导体制造工艺等排出的含氨废气，而不会产生无用的副产物和分配二次处理。

公开(公告)号：US5895521A

公开(公告)日：1999-04-20

申请号：US880363

申请日：1997-06-23

申请人： Kenji Otsuka ,  Hiroshi Waki ,  Yoshio Yamashita ,  Satoshi Arakawa ,  Toshiya Hatakeyama

发明人： Kenji Otsuka ,  Hiroshi Waki ,  Yoshio Yamashita ,  Satoshi Arakawa ,  Toshiya Hatakeyama

IPC分类号： B01D46/00 ,  B01D46/04 ,  B01D46/24 ,  B01D46/52

CPC分类号： B01D46/2411 ,  B01D46/0001 ,  B01D46/002 ,  B01D46/0058 ,  B01D46/0068 ,  B01D46/521

摘要： A dust removing apparatus equipped with a back washing mechanism and a dust removing method for removing solid silica fine powder contained in a gas discharged from a semiconductor producing step of a single-wafer processing atmospheric pressure CVD apparatus without causing problems caused by the increase of a pressure loss and by a pressure fluctuation, wherein filter elements each having a ratio of a surface area of a primary side of a filter membrane to an apparent external surface area of the filter element of from 1 to 5 is used, gas jetting nozzle(s) for back washing is formed in the secondary side of the filter element, back washing is not carried out during filtration in the filter element and at or after changing the processing of a wafer in the CVD apparatus, back washing is carried out to blow down the silica fine powder accumulated on the primary side of the filter membrane.

摘要翻译： 一种除尘装置，其具有用于除去从单晶片加工大气压CVD装置的半导体制造工序排出的气体中所含的固体二氧化硅细粉末的除尘机构和除尘方法，而不引起由于增加的 压力损失和压力波动，其中使用过滤器膜的初级侧的表面积与过滤元件的表观外表面积之比为1至5的过滤元件，气体喷射喷嘴 ）在过滤元件的次级侧形成，在过滤元件中的过滤期间和在CVD装置中改变晶片的处理之后或之后不进行反冲洗，进行反洗以进行吹扫 二氧化硅细粉末积聚在过滤膜的一次侧。

公开(公告)号：US5489327A

公开(公告)日：1996-02-06

申请号：US373032

申请日：1995-01-17

申请人： Kenji Otsuka ,  Noboru Takemasa

发明人： Kenji Otsuka ,  Noboru Takemasa

IPC分类号： B01D53/14 ,  B01D53/86 ,  C01B3/56 ,  B01D53/04

CPC分类号： C01B3/56 ,  C01B2203/042 ,  C01B2203/0465 ,  C01B2203/047 ,  C01B2203/0475 ,  C01B2203/048

摘要： There is diclosed a process for purifying hydrogen gas which comprises removing impurities such as nitrogen, oxygen, methane, carbon monoxide, carbon dioxide and moisture contained in a crude hydrogen gas by bringing the crude hydrogen gas into contact under heating with a hydride of a zirconium alloy such as Zr-V, Zr-V-Ni, Zr-V-Cr, Zr-V-Co, Zr-V-Fe, Zr-V-Cu, Zr-V-Ni-Cr, Zr-V-Ni-Co and Zr-V-Cr-Fe. By virtue of using the above Zr alloy hydride, the process enables highly advanced purification of crude hydrogen gas by removing such impurities as above to a level as low as 1 ppb or less in high safety and efficiency at low installation and running costs.

摘要翻译： 包括一种净化氢气的方法，其中包括通过使粗氢气在加热下与锆的氢化物接触来除去粗氢气中所含的氮，氧，甲烷，一氧化碳，二氧化碳和水分中的杂质 合金如Zr-V，Zr-V-Ni，Zr-V-Cr，Zr-V-Co，Zr-V-Fe，Zr-V-Cu，Zr-V-Ni-Cr，Zr-V-Ni -Co和Zr-V-Cr-Fe。 通过使用上述Zr合金氢化物，该方法能够在安装和运行成本低的情况下以高安全性和高效率除去上述这样的杂质，从而高精度地纯化粗氢气。

公开(公告)号：US08138942B2

公开(公告)日：2012-03-20

申请号：US12405339

申请日：2009-03-17

申请人： Kenji Otsuka ,  Ryuhei Noguchi ,  Noriaki Miyata

发明人： Kenji Otsuka ,  Ryuhei Noguchi ,  Noriaki Miyata

IPC分类号： G08B5/24

CPC分类号： G08C17/02 ,  H01H9/0235 ,  H01H19/005

摘要： An annular operation unit is formed as an outer shape to cover entire outline of a surface of a case, and inputting switches and displaying unit are attached inside of an opening at the center side of the annular operation unit, allowing the annular operation unit to have a size to perform fine rotational operations in case the entire size of the remote control transmitting device is miniaturized.

摘要翻译： 环形操作单元被形成为外形以覆盖壳体的整个轮廓，并且输入开关和显示单元被安装在环形操作单元的中心侧的开口的内部，从而允许环形操作单元具有 在遥控发送装置的整体尺寸小型化的情况下进行精细旋转操作的尺寸。

公开(公告)号：US08029110B2

公开(公告)日：2011-10-04

申请号：US12264657

申请日：2008-11-04

申请人： Yasuhide Matsuo ,  Kenji Otsuka ,  Kazuo Higuchi ,  Kosuke Wakamatsu

发明人： Yasuhide Matsuo ,  Kenji Otsuka ,  Kazuo Higuchi ,  Kosuke Wakamatsu

IPC分类号： B41J2/045

CPC分类号： B41J2/14274 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1629

摘要： A droplet ejection head comprises: a substrate having first through-holes forming reservoir chambers, a second through-hole forming a supply chamber, and a bonding film on one surface; a nozzle plate having nozzles for ejecting ejection liquid and a second bonding film on one surface, the first and second films being bonded together to cover the first through-holes and the second through-hole; a sealing plate on another surface of the substrate covering the first through-holes, one surface of the sealing plate contacting the substrate's another surface; and piezoelectric means on another surface of the sealing plate for driving the droplet ejection head. The bonding films contain an Si-skeleton of constituent atoms containing silicon atoms, with siloxane (Si—O) bonds and elimination groups bonded to the silicon atoms, the constituent atoms being randomly bonded together, and the elimination groups existing near a surface of the bonding films.

摘要翻译： 液滴喷射头包括：具有形成储存室的第一通孔的基板，形成供给室的第二通孔和一个表面上的接合膜; 喷嘴板，其具有用于喷射喷射液体的喷嘴和在一个表面上的第二接合膜，所述第一和第二膜被接合在一起以覆盖所述第一通孔和所述第二通孔; 在所述基板的覆盖所述第一通孔的另一表面上的密封板，所述密封板的与所述基板的另一表面接触的一个表面; 以及用于驱动液滴喷射头的密封板的另一表面上的压电装置。 接合膜包含含有硅原子的组成原子的Si骨架，硅氧烷（Si-O）键和与硅原子键合的消除基团，组成原子随机键合在一起，存在于表面附近的消除基团 粘合膜。

公开(公告)号：US20110100688A1

公开(公告)日：2011-05-05

申请号：US12986281

申请日：2011-01-07

申请人： Hongyong Zhang ,  Yoshiharu Hirakata ,  Kenji Otsuka ,  Shunpei Yamazaki ,  Hideaki Kuwabara

发明人： Hongyong Zhang ,  Yoshiharu Hirakata ,  Kenji Otsuka ,  Shunpei Yamazaki ,  Hideaki Kuwabara

IPC分类号： H05K1/09 ,  H05K1/02 ,  G03F7/20

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/136295

摘要： In a liquid crystal display device, gate lines and common lines are first concurrently formed, and after an interlayer film is formed, a pixel electrode, common electrodes, and source lines are formed at the same time. By this, a electrode pattern can be made simple and manufacturing steps are simplified. Further, wiring lines and electrode disposed in the layer closest to a liquid crystal layer are made the pixel electrode, common electrodes and source lines, and the shapes thereof are made simple.

摘要翻译： 在液晶显示装置中，首先同时形成栅极线和公共线，并且在形成层间膜之后，同时形成像素电极，公共电极和源极线。 由此，可以使电极图案简单，并且简化制造步骤。 此外，布置在最靠近液晶层的层中的布线和电极被制成像素电极，公共电极和源极线，并且其形状变得简单。

公开(公告)号：US07936142B2

公开(公告)日：2011-05-03

申请号：US12159174

申请日：2006-12-13

申请人： Kenji Otsuka ,  Osamu Asano

发明人： Kenji Otsuka ,  Osamu Asano

IPC分类号： G05B11/28

CPC分类号： B23B45/02 ,  B23B2260/062 ,  B23B2260/122 ,  B23B2270/32 ,  B25H1/0071 ,  G05B19/4062 ,  G05B2219/37285 ,  G05B2219/37342 ,  G05B2219/42286 ,  G05B2219/42289 ,  G05B2219/45127 ,  Y10S388/937 ,  Y10T408/14

摘要： A drilling device prevents recurrence of an overload condition after occurrence of the overload condition, thereby improving operability and safety in the drilling device. A motor for rotating a drill is connected to an AC power source through a motor control unit, a current detector, and a power switch. A magnet is also connected to the AC power source through the power switch and a full-wave rectifier. The motor control unit rotationally drives the motor on the basis of a signal sent from a main control unit according to a state in which a motor start switch is on. The main control unit controls the motor control unit to gradually reduce a supply voltage to the motor when the motor becomes overloaded, to gradually increase the voltage to the normal power supply condition when the overload condition is vanished, and to stop power supply to the motor if the overload condition continues for a predetermined period.

摘要翻译： 钻井装置防止在发生过载状况后再次发生过载状况，从而提高钻井装置的可操作性和安全性。 用于旋转钻机的电动机通过电动机控制单元，电流检测器和电源开关连接到AC电源。 磁体也通过电源开关和全波整流器连接到交流电源。 电动机控制单元根据电动机起动开关接通的状态，根据从主控制单元发送的信号旋转驱动电动机。 主控制单元控制电机控制单元，当电机过载时逐渐减小电机的电源电压，当过载状态消失时，逐渐将电压提高到正常供电状态，并停止向电机供电 如果过载状态持续一段预定时间。

公开(公告)号：US20100187680A1

公开(公告)日：2010-07-29

申请号：US12654440

申请日：2009-12-18

申请人： Kenji Otsuka ,  Masaru Nakashima

发明人： Kenji Otsuka ,  Masaru Nakashima

IPC分类号： H01L23/367

CPC分类号： H01L23/3735 ,  H01L23/473 ,  H01L2924/0002 ,  H01L2924/00

摘要： A radiator includes: an insulating substrate, a heating element or a semiconductor chip is mounted; and a heat sink that is provided the insulating substrate through a stress relaxation member that has a stress absorbing space, in which the heat sink dissipates heat from the semiconductor chip. The insulating substrate, the stress relaxation member, and the heat sink are braze-bonded to each other. The heat sink has: a top plate that is bonded to the stress relaxation member; and a bottom plate that is bonded to the top plate, and the top plate and the bottom plate forms a passage of coolant therebetween. A thickness proportion between the top plate and the bottom plate falls within a range of 1:3 to 1:5.

摘要翻译： 散热器包括：绝缘基板，加热元件或半导体芯片; 以及通过具有应力消除空间的应力松弛部件设置绝缘基板的散热器，其中散热器散发来自半导体芯片的热量。 绝缘基板，应力松弛部件和散热器彼此钎焊。 散热器具有：结合到应力松弛部件的顶板; 以及底板，其结合到顶板，并且顶板和底板在其间形成冷却剂通道。 顶板和底板之间的厚度比例在1:3至1:5的范围内。

公开(公告)号：US20100180441A1

公开(公告)日：2010-07-22

申请号：US12591929

申请日：2009-12-04

申请人： Kenji Otsuka ,  Masaru Nakashima ,  Yoshiki Tomita

发明人： Kenji Otsuka ,  Masaru Nakashima ,  Yoshiki Tomita

IPC分类号： B23P15/26

CPC分类号： B23K1/0012 ,  Y10T29/49393

摘要： A method of brazing a heat sink includes: fitting at least a part of a bottom plate between protruding opposite ends of a top plate; fixing a jig to an outer periphery of the top plate in order to prevent the top plate that thermally expands from extending outward in a width direction of the top plate; and braze-bonding an inner side surface of the top plate to a side surface of the bottom plate, which faces the inner side surface of the top plate.

摘要翻译： 钎焊散热器的方法包括：将顶板的突出的相对端部的底板的至少一部分嵌合; 将夹具固定到顶板的外周，以防止热膨胀的顶板在顶板的宽度方向上向外延伸; 并且将顶板的内侧表面钎焊到底板的与顶板的内侧表面相对的侧表面。