摘要:
There is provided a display device in a viewfinder, including a diffraction grating whose shape is determined at an interface between first and second materials, at least one of the first and second materials being adapted to have a variable refractive index for light reflected by an object to be photographed, and control means for changing the refractive index of the first and/or second materials, wherein the control means causes the light from the object to substantially pass through the diffraction grating in a first state and causes the diffraction grating to partially diffract the light from the object to display a pattern in a second state.
摘要:
This specification discloses an integrated type optical node comprising a substrate, a channel light waveguide formed on the substrate for connecting the transmission lines of an optical information system, an amplifying portion provided on the light waveguide for amplifying a light propagated through the waveguide, and a light branching-off portion provided on the light waveguide for coupling a light transmitter and/or a light receiver to the transmission lines. The specification also discloses an optical information system using such optical node.
摘要:
This specification discloses an integrated type optical node comprising a substrate, a channel light waveguide formed on the substrate for connecting the transmission lines of an optical information system, an amplifying portion provided on the light waveguide for amplifying a light propagated through the waveguide, and a light branching-off portion provided on the light waveguide for coupling a light transmitter and/or a light receiver to the transmission lines. The specification also discloses an optical information system using such optical node.
摘要:
The present invention relates to optical apparatus such as a photosensor, a semiconductor laser, an optical amplifier in which a wavelength selective photocoupler is used so as to couple two waveguides through a diffraction grating. A photosensor which is one of the optical apparatus according to the present invention comprises a substrate, a first waveguide layer formed on the substrate, a second waveguide layer formed on the first waveguide layer to be stacked in a direction of thickness and which has a guided mode difference from that of the first waveguide layer, a diffraction grating formed on an overlapping region of the guided modes of the first and second waveguide layers and which couples light components of a specific wavelength range of light propagating through the first waveguide layer to the second waveguide layer, a light absorption layer for absorbing at least some light components of the light components coupled to the second waveguide layer, and an electrode for converting the light components absorbed by the light absorption layer into an electrical signal and outputting the electrical signal.
摘要:
A process for producing a solid-state color pickup array, which comprises forming a resist mask on a wafer having a solid image pickup array; vapor-depositing a colorant on the wafer having the resist mask and on the resist mask; and removing the resist mask by dissolution, thereby eliminating selectively the colorant film vapor-deposited on the resist mask.
摘要:
A DBR semiconductor laser is controlled in an image projecting apparatus, which includes the DBR laser having a phase and DBR region, a light wavelength converting device for converting fundamental-wave light emitted from the DBR laser into second harmonic wave light, an optical deflector for scanning the second harmonic wave in a one or two-dimensional manner, and a modulating portion for modulating the DBR laser. Coefficient calculating and wavelength adjusting steps are performed within a non-drawing time. The coefficient calculating step calculates at least one coefficient in a relationship between a DBR current to be injected into the DBR region and a phase current to be injected into the phase region for continuously shifting the wavelength of the fundamental-wave light. The wavelength adjusting step changes DBR current injected into the DBR region and phase current injected into the phase region based on the relationship.
摘要:
A DBR semiconductor laser is controlled in an image projecting apparatus, which includes the DBR laser having a phase and DBR region, a light wavelength converting device for converting fundamental-wave light emitted from the DBR laser into second harmonic wave light, an optical deflector for scanning the second harmonic wave in a one or two-dimensional manner, and a modulating portion for modulating the DBR laser. Coefficient calculating and wavelength adjusting steps are performed within a non-drawing time. The coefficient calculating step calculates at least one coefficient in a relationship between a DBR current to be injected into the DBR region and a phase current to be injected into the phase region for continuously shifting the wavelength of the fundamental-wave light. The wavelength adjusting step changes DBR current injected into the DBR region and phase current injected into the phase region based on the relationship.
摘要:
An image display apparatus includes a light source having a plurality of light emitting devices, and a projection optical system capable of making lights from the light source scan in a main scanning direction and in a subscanning direction to display on a screen an image having a predetermined number of pixels. The scanning lines in the main scanning direction are formed by the lights emitted from each of the light emitting devices and controlled to be superposed one on another on the screen.
摘要:
There is provided a harmonic generator generates high power laser light and can be modulated at high modulation rate. The semiconductor laser emits a first output light when a bias current is supplied, and a second output light when a modulating current is superposed to the bias current. On of the first output lights has a wavelength inside of a wavelength tolerance of phase-matching of the wavelength-converting element. The other has a wavelength outside of the wavelength tolerance of phase-matching.
摘要:
A surface optical device apparatus includes a surface optical device capable of emitting or receiving light through a surface thereof and a thick layer formed of a radiation-curable or electron-beam-curable material, such as a polymerizable resist. In the thick layer, a guide hole for inserting an end portion of a light-transmission member, such as an optical fiber, and a plastic optical fiber with a flat end face or a lens-shaped end face, therein is formed at a position corresponding to the surface of the surface optical device such that the surface optical device can be optically coupled to the light-transmission member inserted in the guide hole. The guide hole is formed in the thick layer by performing a patterning on the thick layer using photolithography to selectively harden the thick layer and developing the thick layer.